Inventor · disambiguated record
Anantha K. Subramani
Also filed as: SUBRAMANI ANANTHA · SUBRAMANI ANANTHA K
87 granted patents·29 pending applications·668 citations·filing 1997–2025
99Inventor score
Files withAPPLIED MATERIALS INC101GOEL ASHISH3RIKER MARTIN LEE2SUBRAMANI ANANTHA K2BHATNAGAR YASHRAJ K1
Top patents by PatentIndex Score
116 records- 0197USD665491SDeposition chamber cover ringGOEL ASHISH·Filed 2012·Granted Aug 14, 2012·118 cites·1 claims
- 0294US8696878B2Wafer processing deposition shielding componentsRIKER MARTIN LEE·Filed 2012·Granted Apr 15, 2014·19 cites·6 claims
- 0393US11081623B2Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2019·Granted Aug 3, 2021·2 cites·8 claims
- 0493US9376752B2Edge ring for a deposition chamberAPPLIED MATERIALS INC·Filed 2013·Granted Jun 28, 2016·15 cites·18 claims
- 0593US6406599B1Magnetron with a rotating center magnet for a vault shaped sputtering targetAPPLIED MATERIALS INC·Filed 2000·Granted Jun 18, 2002·45 cites·24 claims
- 0692US11289312B2Physical vapor deposition (PVD) chamber with in situ chamber cleaning capabilityAPPLIED MATERIALS INC·Filed 2019·Granted Mar 29, 2022·4 cites·18 claims
- 0791US11189502B2Showerhead with interlaced gas feed and removal and methods of useAPPLIED MATERIALS INC·Filed 2019·Granted Nov 30, 2021·5 cites·20 claims
- 0891US10763085B2Shaped electrodes for improved plasma exposure from vertical plasma sourceAPPLIED MATERIALS INC·Filed 2018·Granted Sep 1, 2020·5 cites·20 claims
- 0991US10577689B2Sputtering showerheadAPPLIED MATERIALS INC·Filed 2017·Granted Mar 3, 2020·3 cites·20 claims
- 1090US10879042B2Symmetric plasma source to generate pie shaped treatmentAPPLIED MATERIALS INC·Filed 2017·Granted Dec 29, 2020·5 cites·16 claims
- 1190US10236412B2Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2018·Granted Mar 19, 2019·3 cites·11 claims
- 1290US8524600B2Post deposition treatments for CVD cobalt filmsLEI YU·Filed 2011·Granted Sep 3, 2013·12 cites·20 claims
- 1390US7736473B2Magnetron having continuously variable radial positionAPPLIED MATERIALS INC·Filed 2005·Granted Jun 15, 2010·11 cites·8 claims
- 1489US9853579B2Rotatable heated electrostatic chuckAPPLIED MATERIALS INC·Filed 2014·Granted Dec 26, 2017·9 cites·20 claims
- 1588US10490434B2Biasable rotatable electrostatic chuckAPPLIED MATERIALS INC·Filed 2016·Granted Nov 26, 2019·5 cites·20 claims
- 1688US9476122B2Wafer processing deposition shielding componentsAPPLIED MATERIALS INC·Filed 2014·Granted Oct 25, 2016·6 cites·9 claims
- 1788US8404048B2Off-angled heating of the underside of a substrate using a lamp assemblyEWERT MAURICE E·Filed 2011·Granted Mar 26, 2013·12 cites·16 claims
- 1888US7018515B2Selectable dual position magnetronAPPLIED MATERIALS INC·Filed 2004·Granted Mar 28, 2006·21 cites·40 claims
- 1988US6254746B1Recessed coil for generating a plasmaAPPLIED MATERIALS INC·Filed 1997·Granted Jul 3, 2001·47 cites·60 claims
- 2087US8765601B2Post deposition treatments for CVD cobalt filmsAPPLIED MATERIALS INC·Filed 2013·Granted Jul 1, 2014·6 cites·20 claims
- 2186US10249522B2In-situ temperature measurement in a noisy environmentAPPLIED MATERIALS INC·Filed 2017·Granted Apr 2, 2019·3 cites·12 claims
- 2285US10903056B2Plasma source for rotating susceptorAPPLIED MATERIALS INC·Filed 2018·Granted Jan 26, 2021·3 cites·19 claims
- 2384US9396933B2PVD buffer layers for LED fabricationZHU MINGWEI·Filed 2013·Granted Jul 19, 2016·6 cites·7 claims
- 2484US8685215B2Mechanism for continuously varying radial position of a magnetronMILLER KEITH A·Filed 2010·Granted Apr 1, 2014·5 cites·12 claims
- 2584US6723214B2Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Apr 20, 2004·22 cites·22 claims
- 2683US10546973B2Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2019·Granted Jan 28, 2020·1 cites·14 claims
- 2783US9062379B2Wafer processing deposition shielding componentsRIKER MARTIN LEE·Filed 2012·Granted Jun 23, 2015·6 cites·19 claims
- 2883US6162297AEmbossed semiconductor fabrication partsAPPLIED MATERIALS INC·Filed 1997·Granted Dec 19, 2000·59 cites·13 claims
- 2981USD665071SDeposition chamber linerGOEL ASHISH·Filed 2012·Granted Aug 7, 2012·26 cites·1 claims
- 3080US10121655B2Lateral plasma/radical sourceAPPLIED MATERIALS INC·Filed 2016·Granted Nov 6, 2018·3 cites·14 claims
- 3179US11823871B2Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing toolAPPLIED MATERIALS INC·Filed 2019·Granted Nov 21, 2023·2 cites·20 claims
- 3279US9818587B2Off-angled heating of the underside of a substrate using a lamp assemblyAPPLIED MATERIALS INC·Filed 2013·Granted Nov 14, 2017·3 cites·21 claims
- 3379US6589407B1Aluminum deposition shieldAPPLIED MATERIALS INC·Filed 1997·Granted Jul 8, 2003·37 cites·20 claims
- 3479US6219219B1Cathode assembly containing an electrostatic chuck for retaining a wafer in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Apr 17, 2001·63 cites·20 claims
- 3578US11575071B2Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2021·Granted Feb 7, 2023·0 cites·15 claims
- 3678US9620339B2Sputter source for semiconductor process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Apr 11, 2017·1 cites·8 claims
- 3777US11101117B2Methods and apparatus for co-sputtering multiple targetsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 3877US7718045B2Ground shield with reentrant featureAPPLIED MATERIALS INC·Filed 2006·Granted May 18, 2010·4 cites·18 claims
- 3976US11600476B2Deposition system with multi-cathode and method of manufacture thereofAPPLIED MATERIALS INC·Filed 2021·Granted Mar 7, 2023·0 cites·18 claims
- 4076US10504719B2Cooled reflective adapter plate for a deposition chamberGOEL ASHISH·Filed 2013·Granted Dec 10, 2019·3 cites·19 claims
- 4175US10109481B2Aluminum-nitride buffer and active layers by physical vapor depositionAPPLIED MATERIALS INC·Filed 2013·Granted Oct 23, 2018·3 cites·16 claims
- 4275US9673074B2In-situ temperature measurement in a noisy environmentAPPLIED MATERIALS INC·Filed 2014·Granted Jun 6, 2017·2 cites·15 claims
- 4374US7297247B2Electroformed sputtering targetAPPLIED MATERIALS INC·Filed 2003·Granted Nov 20, 2007·11 cites·20 claims
- 4474US7163607B2Process kit for improved power coupling through a workpiece in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2004·Granted Jan 16, 2007·10 cites·20 claims
- 4572US11830710B2Internally divisible process chamber using a shutter disk assemblyAPPLIED MATERIALS INC·Filed 2022·Granted Nov 28, 2023·0 cites·19 claims
- 4672US11011357B2Methods and apparatus for multi-cathode substrate processingAPPLIED MATERIALS INC·Filed 2018·Granted May 18, 2021·1 cites·20 claims
- 4771US9929310B2Oxygen controlled PVD aluminum nitride buffer for gallium nitride-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2013·Granted Mar 27, 2018·1 cites·20 claims
- 4871US9905443B2Reflective deposition rings and substrate processing chambers incorporating sameSUBRAMANI ANANTHA K·Filed 2012·Granted Feb 27, 2018·3 cites·18 claims
- 4971US9466524B2Method of depositing metals using high frequency plasmaAPPLIED MATERIALS INC·Filed 2013·Granted Oct 11, 2016·2 cites·15 claims
- 5071US2025224678A1Photoresist deposition using independent multichannel showerheadAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
Showing the top 50 of 116 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →