Inventor · disambiguated record
Arno Jan Bleeker
Also filed as: BLEEKER ARNO · BLEEKER ARNO J · BLEEKER ARNO JAN
102 granted patents·17 pending applications·2,103 citations·filing 1989–2021
99Inventor score
Files withASML NETHERLANDS BV80ASML HOLDING NV20BLEEKER ARNO JAN3PHILIPS CORP2SMILDE HENDRIK JAN HIDDE2
Top patents by PatentIndex Score
119 records- 0199US9946167B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 17, 2018·18 cites·18 claims
- 0298US8760662B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2013·Granted Jun 24, 2014·16 cites·7 claims
- 0398US8411287B2Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrateSMILDE HENDRIK JAN HIDDE·Filed 2010·Granted Apr 2, 2013·85 cites·33 claims
- 0498US7791732B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2005·Granted Sep 7, 2010·80 cites·15 claims
- 0598US7119881B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 10, 2006·58 cites·19 claims
- 0698US7009682B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Mar 7, 2006·200 cites·41 claims
- 0797US10712667B2Optical device and associated systemASML NETHERLANDS BV·Filed 2017·Granted Jul 14, 2020·22 cites·10 claims
- 0897US9140998B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodSMILDE HENDRIK JAN HIDDE·Filed 2011·Granted Sep 22, 2015·24 cites·12 claims
- 0997US8054467B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2010·Granted Nov 8, 2011·15 cites·13 claims
- 1097US6778257B2Imaging apparatusASML NETHERLANDS BV·Filed 2002·Granted Aug 17, 2004·953 cites·28 claims
- 1197US6633366B2Lithographic apparatus, device manufacturing method, and device manufactured therebyFiled 2001·Granted Oct 14, 2003·76 cites·49 claims
- 1295US7400382B2Light patterning device using tilting mirrors in a superpixel formASML HOLDING NV·Filed 2005·Granted Jul 15, 2008·24 cites·29 claims
- 1394US7965380B2Lithographic apparatus and device manufacturing methodASML NETHERLAND BV·Filed 2007·Granted Jun 21, 2011·21 cites·24 claims
- 1493US8553230B2Method and apparatus for angular-resolved spectroscopic lithography characterizationDEN BOEF ARIE JEFFREY MARIA·Filed 2011·Granted Oct 8, 2013·10 cites·8 claims
- 1593US8018578B2Pellicle, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Sep 13, 2011·16 cites·29 claims
- 1692US10955353B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2019·Granted Mar 23, 2021·2 cites·7 claims
- 1792US7133121B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2005·Granted Nov 7, 2006·13 cites·10 claims
- 1891US7440078B2Lithographic apparatus and device manufacturing method using interferometric and maskless exposure unitsASML NETHERLANDS BV·Filed 2005·Granted Oct 21, 2008·13 cites·20 claims
- 1990US10241055B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2014·Granted Mar 26, 2019·3 cites·11 claims
- 2090US7177012B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 13, 2007·30 cites·27 claims
- 2190US6876440B1Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2003·Granted Apr 5, 2005·22 cites·15 claims
- 2289US7061591B2Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2003·Granted Jun 13, 2006·24 cites·13 claims
- 2388US7548302B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jun 16, 2009·12 cites·45 claims
- 2488US7321417B2Spatial light modulator, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jan 22, 2008·8 cites·11 claims
- 2585US7046413B2System and method for dose control in a lithographic systemASML HOLDING NV·Filed 2005·Granted May 16, 2006·6 cites·23 claims
- 2684US7894037B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Feb 22, 2011·7 cites·21 claims
- 2784US7859647B2Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2008·Granted Dec 28, 2010·7 cites·10 claims
- 2884US7053981B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 30, 2006·22 cites·18 claims
- 2983US7385677B2Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beamASML NETHERLANDS BV·Filed 2006·Granted Jun 10, 2008·5 cites·24 claims
- 3081US8792085B2Lithographic apparatus, substrate table, and method for enhancing substrate release propertiesPUYT MICHIEL·Filed 2010·Granted Jul 29, 2014·8 cites·17 claims
- 3181US7433033B2Inspection method and apparatus using sameASML NETHERLANDS BV·Filed 2006·Granted Oct 7, 2008·7 cites·15 claims
- 3280US7410736B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zonesASML HOLDING NV·Filed 2003·Granted Aug 12, 2008·15 cites·9 claims
- 3380US7388650B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jun 17, 2008·4 cites·20 claims
- 3480US6870601B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Mar 22, 2005·24 cites·8 claims
- 3579US9690210B2Lithographic apparatus and device manufacturing methodBLEEKER ARNO JAN·Filed 2012·Granted Jun 27, 2017·3 cites·19 claims
- 3678US11525786B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2021·Granted Dec 13, 2022·0 cites·4 claims
- 3778US7411652B2Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2004·Granted Aug 12, 2008·13 cites·14 claims
- 3878US7133118B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Nov 7, 2006·12 cites·17 claims
- 3978US6646274B1Lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Nov 11, 2003·16 cites·30 claims
- 4077US7894041B2Limiting a portion of a patterning device used to pattern a beamASML NETHERLANDS BV·Filed 2008·Granted Feb 22, 2011·3 cites·20 claims
- 4177US7499146B2Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cuppingASML NETHERLANDS BV·Filed 2005·Granted Mar 3, 2009·4 cites·19 claims
- 4276US7728956B2Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation dataASML NETHERLANDS BV·Filed 2005·Granted Jun 1, 2010·5 cites·20 claims
- 4376US7688423B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zonesASML HOLDING NV·Filed 2008·Granted Mar 30, 2010·3 cites·16 claims
- 4476US7460208B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Dec 2, 2008·5 cites·38 claims
- 4576US7023525B2Imaging apparatusASML NETHERLANDS BV·Filed 2004·Granted Apr 4, 2006·13 cites·39 claims
- 4675US7141340B2Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Nov 28, 2006·11 cites·28 claims
- 4773US7522266B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 21, 2009·2 cites·6 claims
- 4872US7924406B2Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channelsASML NETHERLANDS BV·Filed 2006·Granted Apr 12, 2011·3 cites·36 claims
- 4972US7791708B2Lithographic apparatus, substrate table, and method for enhancing substrate release propertiesASML NETHERLANDS BV·Filed 2006·Granted Sep 7, 2010·5 cites·25 claims
- 5072US7697128B2Method of imaging radiation from an object on a detection device and an inspection device for inspecting an objectASML NETHERLANDS BV·Filed 2007·Granted Apr 13, 2010·8 cites·19 claims
Showing the top 50 of 119 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →