Inventor · disambiguated record
Armand Eugene Albert Koolen
Also filed as: KOOLEN ARMAND EUGENE ALBERT
32 granted patents·6 pending applications·238 citations·filing 2003–2024
96Inventor score
Files withASML NETHERLANDS BV33ASML HOLDING NV2DE WIT JOHANNES MATHEUS MARIE1SHMAREV YEVGENIY KONSTANTINOVICH1SMILDE HENDRIK JAN HIDDE1
Top patents by PatentIndex Score
38 records- 0198US8411287B2Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrateSMILDE HENDRIK JAN HIDDE·Filed 2010·Granted Apr 2, 2013·85 cites·33 claims
- 0295US10816909B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·5 cites·17 claims
- 0393US6958806B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Oct 25, 2005·67 cites·19 claims
- 0492US7425397B2Method of determining an illumination profile and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 16, 2008·16 cites·18 claims
- 0591US10107761B2Method and device for focusing in an inspection systemASML NETHERLANDS BV·Filed 2016·Granted Oct 23, 2018·5 cites·22 claims
- 0690US9811003B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 7, 2017·5 cites·19 claims
- 0790US9158194B2Metrology method and apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2012·Granted Oct 13, 2015·9 cites·16 claims
- 0889US12366811B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2024·Granted Jul 22, 2025·0 cites·20 claims
- 0989US12276921B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Apr 15, 2025·2 cites·17 claims
- 1087US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 1187US10895812B2Metrology apparatus, lithographic system, and method of measuring a structureASML NETHERLANDS BV·Filed 2017·Granted Jan 19, 2021·4 cites·20 claims
- 1287US10191391B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted Jan 29, 2019·4 cites·19 claims
- 1386US11415900B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2020·Granted Aug 16, 2022·1 cites·20 claims
- 1484US10678145B2Radiation receiving systemASML NETHERLANDS BV·Filed 2018·Granted Jun 9, 2020·2 cites·20 claims
- 1584US10599047B2Metrology apparatus, lithographic system, and method of measuring a structureASML NETHERLANDS BV·Filed 2018·Granted Mar 24, 2020·2 cites·15 claims
- 1679US10317805B2Method for monitoring a characteristic of illumination from a metrology apparatusASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·2 cites·19 claims
- 1778US9535338B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jan 3, 2017·3 cites·11 claims
- 1877US12007700B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2022·Granted Jun 11, 2024·0 cites·20 claims
- 1977US10551308B2Focus control arrangement and methodASML NETHERLANDS BV·Filed 2016·Granted Feb 4, 2020·1 cites·20 claims
- 2075US11150563B2Method of measuring a parameter of a patterning process, metrology apparatus, targetASML NETHERLANDS BV·Filed 2019·Granted Oct 19, 2021·1 cites·21 claims
- 2175US10852247B2Variable corrector of a wave frontASML HOLDING NV·Filed 2017·Granted Dec 1, 2020·2 cites·23 claims
- 2275US7026082B2Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Apr 11, 2006·17 cites·16 claims
- 2373US10598483B2Metrology method, apparatus and computer programASML NETHERLANDS BV·Filed 2017·Granted Mar 24, 2020·1 cites·18 claims
- 2473US10599048B2Metrology apparatus, method of measuring a structure, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Mar 24, 2020·1 cites·15 claims
- 2563US10423077B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2018·Granted Sep 24, 2019·0 cites·18 claims
- 2660US12436470B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Oct 7, 2025·0 cites·15 claims
- 2760US12405535B2Method for filtering an image and associated metrology apparatusASML HOLDING NV·Filed 2020·Granted Sep 2, 2025·0 cites·15 claims
- 2856US11099489B2Method of measuring a parameter of a lithographic process, metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 2956US2024036484A1Method of metrology and associated apparatusesASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 3055US10788757B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2019·Granted Sep 29, 2020·0 cites·20 claims
- 3155US10495889B2Beam homogenizer, illumination system and metrology systemASML NETHERLANDS BV·Filed 2017·Granted Dec 3, 2019·0 cites·21 claims
- 3254US2025147437A1Metrology method and associated metrology deviceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3354US2024184215A1Metrology tool calibration method and associated metrology toolASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3452US10866526B2Metrology method and deviceSHMAREV YEVGENIY KONSTANTINOVICH·Filed 2018·Granted Dec 15, 2020·0 cites·22 claims
- 3552US2025138436A1Metrology method and deviceASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3651US2025231499A1Method and apparatus for illumination adjustmentASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3738US8497975B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodDE WIT JOHANNES MATHEUS MARIE·Filed 2010·Granted Jul 30, 2013·0 cites·15 claims
- 3837US2004257547A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →