Inventor · disambiguated record
Arjan Hubrecht Josef Anna Martens
Also filed as: MARTENS ARJAN HUBRECHT JOSEF ANNA
6 granted patents·2 pending applications·7 citations·filing 2009–2012
70Inventor score
Files withMARTENS ARJAN HUBRECHT JOSEF ANNA2ASML NETHERLANDS BV1HOEKERD KORNELIS TIJMEN1JANSEN BAUKE1LAFARRE RAYMOND WILHELMUS LOUIS1
Top patents by PatentIndex Score
8 records- 0181US8432531B2Lithographic apparatus and a method of operating the apparatusHOEKERD KORNELIS TIJMEN·Filed 2010·Granted Apr 30, 2013·6 cites·20 claims
- 0249US2013077065A1Cleaning substrate for a lithography apparatus, a cleaning method for a lithography apparatus and a lithography apparatusLAFARRE RAYMOND WILHELMUS LOUIS·Filed 2012·Application pending·0 cites
- 0346US9575406B2Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing methodVAN DER GAAG MARC LÉON·Filed 2012·Granted Feb 21, 2017·1 cites·20 claims
- 0440US8508711B2Lithographic apparatus and device manufacturing methodMARTENS ARJAN HUBRECHT JOSEF ANNA·Filed 2009·Granted Aug 13, 2013·0 cites·25 claims
- 0538US8988657B2Lithographic apparatus and device manufacturing methodVAN BOXTEL FRANK JOHANNES JACOBUS·Filed 2012·Granted Mar 24, 2015·0 cites·19 claims
- 0638US8319157B2Lithographic apparatus and device manufacturing methodMARTENS ARJAN HUBRECHT JOSEF ANNA·Filed 2010·Granted Nov 27, 2012·0 cites·24 claims
- 0734US8564757B2Lithographic apparatus and a method of operating the apparatusJANSEN BAUKE·Filed 2010·Granted Oct 22, 2013·0 cites·19 claims
- 0834US2010208221A1Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing methodASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →