Inventor · disambiguated record
Audunn Ludviksson
Also filed as: LUDVIKSSON AUDUNN
16 granted patents·6 pending applications·918 citations·filing 1998–2014
95Inventor score
Top patents by PatentIndex Score
22 records- 0198US8974868B2Post deposition plasma cleaning system and methodISHIZAKA TADAHIRO·Filed 2005·Granted Mar 10, 2015·466 cites·24 claims
- 0296US6586330B1Method for depositing conformal nitrified tantalum silicide films by thermal CVDTOKYO ELECTRON LTD·Filed 2002·Granted Jul 1, 2003·127 cites·55 claims
- 0395US7591923B2Apparatus and method for use of optical system with a plasma processing systemTOKYO ELECTRON LTD·Filed 2005·Granted Sep 22, 2009·31 cites·24 claims
- 0495US6894769B2Monitoring erosion of system components by optical emissionTOKYO ELECTRON LTD·Filed 2002·Granted May 17, 2005·60 cites·43 claims
- 0594US6806949B2Monitoring material buildup on system components by optical emissionTOKYO ELECTRON LTD·Filed 2002·Granted Oct 19, 2004·64 cites·47 claims
- 0689US7781340B2Method and system for etching high-k dielectric materialsTOKYO ELECTRON LTD·Filed 2007·Granted Aug 24, 2010·12 cites·23 claims
- 0787US6866929B2Glass powders, methods for producing glass powders and devices fabricated from sameCABOT CORP·Filed 2001·Granted Mar 15, 2005·22 cites·28 claims
- 0886US6360562B1Methods for producing glass powdersSUPERIOR MICROPOWDERS LLC·Filed 1998·Granted Mar 26, 2002·49 cites·20 claims
- 0981US7064812B2Method of using a sensor gas to determine erosion level of consumable system componentsTOKYO ELECTRON LTD·Filed 2003·Granted Jun 20, 2006·24 cites·51 claims
- 1080US7102132B2Process monitoring using infrared optical diagnosticsTOKYO ELECTRON LTD·Filed 2003·Granted Sep 5, 2006·15 cites·37 claims
- 1177US7631518B2Glass powders, methods for producing glass powders and devices fabricated from sameCABOT CORP·Filed 2004·Granted Dec 15, 2009·11 cites·36 claims
- 1275US7202169B2Method and system for etching high-k dielectric materialsTOKYO ELECTRON LTD·Filed 2003·Granted Apr 10, 2007·14 cites·30 claims
- 1368US10147613B2Neutral beam etching of Cu-containing layers in an organic compound gas environmentTOKYO ELECTRON LTD·Filed 2014·Granted Dec 4, 2018·2 cites·19 claims
- 1466US7355171B2Method and apparatus for process monitoring and controlTOKYO ELECTRON LTD·Filed 2003·Granted Apr 8, 2008·7 cites·47 claims
- 1563US7214327B2Anisotropic dry etching of Cu-containing layersTOKYO ELECTRON LTD·Filed 2003·Granted May 8, 2007·8 cites·8 claims
- 1661US2010236288A1Glass powders, methods for producing glass powders and devices fabricated from sameCABOT CORP·Filed 2009·Application pending·0 cites
- 1758US7553427B2Plasma etching of Cu-containing layersTOKYO ELECTRON LTD·Filed 2003·Granted Jun 30, 2009·6 cites·19 claims
- 1846US2005069640A1Compositions comprising glass particles and methods of depositing the sameCABOT CORP·Filed 2004·Application pending·0 cites
- 1944US2005189069A1Plasma processing system and methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2038US2004221957A1Method system and computer readable medium for monitoring the status of a chamber processTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 2134US2003211736A1Method for depositing tantalum silicide films by thermal chemical vapor depositionTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 2232US2003183337A1Apparatus and method for use of optical diagnostic system with a plasma processing systemFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →