Inventor · disambiguated record
Ayman Hamouda
Also filed as: HAMOUDA AYMAN · HAMOUDA AYMAN YEHIA
14 granted patents·8 pending applications·68 citations·filing 2007–2025
90Inventor score
Top patents by PatentIndex Score
22 records- 0191US8084169B2Dual metric OPCHAMOUDA AYMAN YEHIA·Filed 2010·Granted Dec 27, 2011·9 cites·41 claims
- 0290US10831977B1Curvilinear mask modelsGLOBALFOUNDRIES INC·Filed 2019·Granted Nov 10, 2020·8 cites·20 claims
- 0390US7799487B2Dual metric OPCHAMOUDA AYMAN YEHIA·Filed 2007·Granted Sep 21, 2010·16 cites·34 claims
- 0489US9747401B2Methods for modifying an integrated circuit layout designGLOBALFOUNDRIES INC·Filed 2016·Granted Aug 29, 2017·7 cites·8 claims
- 0588US2025362619A1Method for rule-based retargeting of target patternASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0685US9317645B2Methods for modifying an integrated circuit layout designGLOBALFOUNDRIES INC·Filed 2013·Granted Apr 19, 2016·8 cites·13 claims
- 0784US8881069B1Process enhancing safe SRAF printing using etch aware print avoidanceGLOBALFOUNDRIES INC·Filed 2013·Granted Nov 4, 2014·4 cites·18 claims
- 0883US9740092B2Model-based generation of dummy featuresGLOBALFOUNDRIES INC·Filed 2014·Granted Aug 22, 2017·3 cites·17 claims
- 0982US9672311B2Method and system for via retargetingGLOBALFOUNDRIES INC·Filed 2014·Granted Jun 6, 2017·6 cites·20 claims
- 1071US10262099B2Methodology for model-based self-aligned via awareness in optical proximity correctionGLOBALFOUNDRIES INC·Filed 2017·Granted Apr 16, 2019·1 cites·16 claims
- 1170US8997027B2Methods for modifying an integrated circuit layout designGLOBALFOUNDRIES INC·Filed 2013·Granted Mar 31, 2015·5 cites·19 claims
- 1269US12411422B2Method for rule-based retargeting of target patternASML NETHERLANDS BV·Filed 2020·Granted Sep 9, 2025·0 cites·20 claims
- 1363US9443055B2Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layoutsGLOBALFOUNDRIES INC·Filed 2015·Granted Sep 13, 2016·1 cites·14 claims
- 1458US2024288764A1Determining localized image prediction errors to improve a machine learning model in predicting an imageASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1557US10345694B2Model-based generation of dummy featuresGLOBALFOUNDRIES INC·Filed 2017·Granted Jul 9, 2019·0 cites·17 claims
- 1657US2024184213A1Method of pattern selection for a semiconductor manufacturing related processASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1755US2024310718A1Method for generating mask patternASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1854US2023185187A1Verifying freeform curvilinear features of a mask designASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1953US2025348641A1Training a machine learning model to generate mrc and process aware mask patternASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2049US9378323B1Methods for retargeting vias and for fabricating semiconductor devices with retargeted viasGLOBALFOUNDRIES INC·Filed 2014·Granted Jun 28, 2016·0 cites·20 claims
- 2147US2024370621A1Pattern selection systems and methodsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2236US2012054694A1Aerial Image SignaturesHAMOUDA AYMAN YEHIA·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →