Inventor · disambiguated record
Ayako Nakano
Also filed as: NAKANO AYAKO
11 granted patents·2 pending applications·44 citations·filing 2003–2010
87Inventor score
Files withTOSHIBA KK13
Top patents by PatentIndex Score
13 records- 0186US7700997B2Semiconductor memory deviceTOSHIBA KK·Filed 2006·Granted Apr 20, 2010·15 cites·9 claims
- 0284US7770145B2Semiconductor device pattern creation method, pattern data processing program, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted Aug 3, 2010·6 cites·11 claims
- 0377US7534533B2Polarization analyzing system, exposure method, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted May 19, 2009·4 cites·8 claims
- 0475US7716617B2Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted May 11, 2010·7 cites·9 claims
- 0562US7984390B2Data processing method in semiconductor device, program of the same, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2006·Granted Jul 19, 2011·2 cites·16 claims
- 0662US7000215B2Method of and computer program product for designing patterns, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2003·Granted Feb 14, 2006·6 cites·18 claims
- 0757US7859665B2Polarization analyzing system, exposure method, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2009·Granted Dec 28, 2010·0 cites·6 claims
- 0856US8042067B2Pattern forming method and system, and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2008·Granted Oct 18, 2011·0 cites·12 claims
- 0954US7002665B2Lithography simulation method, mask pattern correction method, and substrate topography correction methodTOSHIBA KK·Filed 2004·Granted Feb 21, 2006·3 cites·18 claims
- 1048US2010275174A1Semiconductor device pattern creation method, pattern data processing method, pattern data processing program, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2010·Application pending·0 cites
- 1147US7402363B2Pattern forming method and system, and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2004·Granted Jul 22, 2008·1 cites·13 claims
- 1246US7463347B2Simulator of optical intensity distribution, computer implemented method for simulating the optical intensity distribution, method for collecting mask pattern, and computer program product for the simulatorTOSHIBA KK·Filed 2006·Granted Dec 9, 2008·0 cites·20 claims
- 1346US2010193960A1Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Ayako Nakano files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →