Inventor · disambiguated record
Bangching Ho
Also filed as: HO BANGCHING
9 granted patents·3 pending applications·23 citations·filing 2009–2018
82Inventor score
Top patents by PatentIndex Score
12 records- 0191US9005873B2Composition for forming resist underlayer film for EUV lithographyNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 14, 2015·11 cites·8 claims
- 0287US8722840B2Resist underlayer film forming composition, and method for forming resist pattern using the sameSAKAMOTO RIKIMARU·Filed 2011·Granted May 13, 2014·6 cites·8 claims
- 0370US9627217B2Silicon-containing EUV resist underlayer film-forming composition including additiveNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 18, 2017·2 cites·14 claims
- 0466US10437150B2Composition for forming resist underlayer film with reduced outgassingSAKAMOTO RIKIMARU·Filed 2009·Granted Oct 8, 2019·2 cites·1 claims
- 0563US9494864B2Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the sameNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 15, 2016·1 cites·12 claims
- 0660US9240327B2Resist underlayer film-forming composition for EUV lithography containing condensation polymerSAKAMOTO RIKIMARU·Filed 2012·Granted Jan 19, 2016·1 cites·8 claims
- 0748US2011117746A1Coating composition and pattern forming methodNISSAN CHEMICAL IND LTD·Filed 2009·Application pending·0 cites
- 0845US11130855B2Composition for forming release layer, and release layerNISSAN CHEMICAL CORP·Filed 2018·Granted Sep 28, 2021·0 cites·13 claims
- 0944US2012040291A1Composition for forming resist underlayer film for euv lithographySAKAMOTO RIKIMARU·Filed 2010·Application pending·0 cites
- 1043US11675269B2Composition for forming resist overlayer film for EUV lithographySAKAMOTO RIKIMARU·Filed 2011·Granted Jun 13, 2023·0 cites·13 claims
- 1141US9753369B2Polymer-containing developerSAKAMOTO RIKIMARU·Filed 2012·Granted Sep 5, 2017·0 cites·14 claims
- 1241US2012251955A1Composition for formation of resist underlayer filmSAKAMOTO RIKIMARU·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →