Inventor · disambiguated record
Beom Soo Park
Also filed as: PARK BEOM S · PARK BEOM SOO
68 granted patents·38 pending applications·2,626 citations·filing 2002–2023
99Inventor score
Top patents by PatentIndex Score
106 records- 0199US8173228B2Particle reduction on surfaces of chemical vapor deposition processing apparatusCHOI SOO YOUNG·Filed 2006·Granted May 8, 2012·122 cites·18 claims
- 0299US8074599B2Plasma uniformity control by gas diffuser curvatureCHOI SOO YOUNG·Filed 2005·Granted Dec 13, 2011·253 cites·33 claims
- 0399US6825134B2Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flowAPPLIED MATERIALS INC·Filed 2002·Granted Nov 30, 2004·595 cites·33 claims
- 0498US8083853B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2004·Granted Dec 27, 2011·753 cites·106 claims
- 0598US7785672B2Method of controlling the film properties of PECVD-deposited thin filmsAPPLIED MATERIALS INC·Filed 2004·Granted Aug 31, 2010·247 cites·20 claims
- 0696US8174400B2Frequency monitoring to detect plasma process abnormalityPARK BEOM SOO·Filed 2011·Granted May 8, 2012·324 cites·15 claims
- 0795US7429410B2Diffuser gravity supportAPPLIED MATERIALS INC·Filed 2005·Granted Sep 30, 2008·32 cites·15 claims
- 0894US9269923B2Barrier films for thin film encapsulationAPPLIED MATERIALS INC·Filed 2014·Granted Feb 23, 2016·12 cites·14 claims
- 0993US8075690B2Diffuser gravity supportKELLER ERNST·Filed 2008·Granted Dec 13, 2011·24 cites·12 claims
- 1092US7902991B2Frequency monitoring to detect plasma process abnormalityAPPLIED MATERIALS INC·Filed 2007·Granted Mar 8, 2011·24 cites·28 claims
- 1191US10262837B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2015·Granted Apr 16, 2019·5 cites·14 claims
- 1290US9449809B2Interface adhesion improvement methodCHOI YOUNG JIN·Filed 2013·Granted Sep 20, 2016·11 cites·22 claims
- 1390US8883269B2Thin film deposition using microwave plasmaWON TAE KYUNG·Filed 2011·Granted Nov 11, 2014·6 cites·5 claims
- 1490US8147614B2Multi-gas flow diffuserWHITE JOHN M·Filed 2010·Granted Apr 3, 2012·5 cites·12 claims
- 1590US7125758B2Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursorsAPPLIED MATERIALS INC·Filed 2004·Granted Oct 24, 2006·47 cites·23 claims
- 1688USD756502SGas diffuser assemblyAPPLIED MATERIALS INC·Filed 2013·Granted May 17, 2016·45 cites·1 claims
- 1788US9200368B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2011·Granted Dec 1, 2015·6 cites·95 claims
- 1887US9039864B2Off-center ground return for RF-powered showerheadBAEK JONGHOON·Filed 2010·Granted May 26, 2015·9 cites·7 claims
- 1987US8906813B2SiOx process chemistry development using microwave plasma CVDWON TAE KYUNG·Filed 2013·Granted Dec 9, 2014·8 cites·13 claims
- 2085US9677177B2Substrate support with quadrantsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 13, 2017·6 cites·19 claims
- 2185US8361549B2Power loading substrates to reduce particle contaminationAPPLIED MATERIALS INC·Filed 2011·Granted Jan 29, 2013·3 cites·14 claims
- 2285US7884035B2Method of controlling film uniformity and composition of a PECVD-deposited A-SiNx : H gate dielectric film deposited over a large substrate surfaceAPPLIED MATERIALS INC·Filed 2008·Granted Feb 8, 2011·8 cites·20 claims
- 2384US10312058B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·3 cites·20 claims
- 2484US8142606B2Apparatus for depositing a uniform silicon film and methods for manufacturing the sameCHOI SOO YOUNG·Filed 2007·Granted Mar 27, 2012·7 cites·12 claims
- 2584US7534301B2RF grounding of cathode in process chamberAPPLIED MATERIALS INC·Filed 2004·Granted May 19, 2009·17 cites·35 claims
- 2683US8381677B2Prevention of film deposition on PECVD process chamber wallAPPLIED MATERIALS INC·Filed 2007·Granted Feb 26, 2013·6 cites·24 claims
- 2781US9521344B2Image sensor and method of processing image data with multiple differential ramping up/down signals, and image processing device including the image sensorLEE JUNG HO·Filed 2014·Granted Dec 13, 2016·4 cites·15 claims
- 2880US9758869B2Anodized showerheadCHOI SOO YOUNG·Filed 2010·Granted Sep 12, 2017·4 cites·23 claims
- 2979US10123379B2Substrate support with quadrantsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 6, 2018·2 cites·15 claims
- 3078US8999847B2a-Si seasoning effect to improve SiN run-to-run uniformityFURUTA GAKU·Filed 2011·Granted Apr 7, 2015·4 cites·17 claims
- 3178US7732010B2Method for supporting a glass substrate to improve uniform deposition thicknessAPPLIED MATERIALS INC·Filed 2006·Granted Jun 8, 2010·1 cites·8 claims
- 3277US7589031B2Method of avoiding haze formation on surfaces of silicon-containing PECVD-deposited thin filmsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 15, 2009·6 cites·5 claims
- 3376US8875657B2Balancing RF bridge assemblyBAEK JONGHOON·Filed 2011·Granted Nov 4, 2014·1 cites·17 claims
- 3472US12237406B2Plasma treatment on metal-oxide TFTAPPLIED MATERIALS INC·Filed 2020·Granted Feb 25, 2025·0 cites·21 claims
- 3572US12224382B2Display deviceSAMSUNG DISPLAY CO LTD·Filed 2023·Granted Feb 11, 2025·0 cites·9 claims
- 3672US8853098B2Substrate support with gas introduction openingsKIM SAM H·Filed 2012·Granted Oct 7, 2014·2 cites·19 claims
- 3771US11908987B2Display device and method of manufacturing the sameSAMSUNG DISPLAY CO LTD·Filed 2022·Granted Feb 20, 2024·0 cites·10 claims
- 3870US7199061B2Pecvd silicon oxide thin film depositionAPPLIED MATERIALS INC·Filed 2003·Granted Apr 3, 2007·12 cites·19 claims
- 3969US9287137B2Methods for depositing a silicon containing layer with argon gas dilutionWANG QUNHUA·Filed 2012·Granted Mar 15, 2016·2 cites·16 claims
- 4069US8075952B2Power loading substrates to reduce particle contaminationYIM DONG-KIL·Filed 2006·Granted Dec 13, 2011·1 cites·5 claims
- 4167US8372205B2Reducing electrostatic charge by roughening the susceptorAPPLIED MATERIALS INC·Filed 2005·Granted Feb 12, 2013·2 cites·25 claims
- 4267US8026759B2Multistage amplifying circuitSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Sep 27, 2011·4 cites·16 claims
- 4367US2009283039A1Robust outlet plumbing for high power flow remote plasma sourceAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4466US8901015B2Method for depositing an inorganic encapsulating filmAPPLIED MATERIALS INC·Filed 2013·Granted Dec 2, 2014·1 cites·34 claims
- 4566US7833885B2Microcrystalline silicon thin film transistorAPPLIED MATERIALS INC·Filed 2008·Granted Nov 16, 2010·2 cites·20 claims
- 4665US11522113B2Display device and method of manufacturing the sameSAMSUNG DISPLAY CO LTD·Filed 2020·Granted Dec 6, 2022·0 cites·10 claims
- 4764US2013140009A1Robust outlet plumbing for high power flow remote plasma sourceWHITE JOHN M·Filed 2012·Application pending·0 cites
- 4863US2013068161A1Gas delivery and distribution for uniform process in linear-type large-area plasma reactorWHITE JOHN M·Filed 2012·Application pending·0 cites
- 4962US12446402B2Light emitting display deviceSAMSUNG DISPLAY CO LTD·Filed 2022·Granted Oct 14, 2025·0 cites·20 claims
- 5061US12514080B2Display deviceSAMSUNG DISPLAY CO LTD·Filed 2023·Granted Dec 30, 2025·0 cites·18 claims
Showing the top 50 of 106 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Beom Soo Park files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →