Inventor · disambiguated record
Bing Ji
Also filed as: JI BING · JI BING QING
26 granted patents·25 pending applications·1,158 citations·filing 2000–2025
96Inventor score
Top patents by PatentIndex Score
51 records- 0198US7357138B2Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materialsAIR PROD & CHEM·Filed 2003·Granted Apr 15, 2008·559 cites·14 claims
- 0297US11935726B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2021·Granted Mar 19, 2024·6 cites·31 claims
- 0397US7055263B2Method for cleaning deposition chambers for high dielectric constant materialsAIR PROD & CHEM·Filed 2003·Granted Jun 6, 2006·385 cites·21 claims
- 0496US12387909B2Low frequency RF generator and associated electrostatic chuckLAM RES CORP·Filed 2021·Granted Aug 12, 2025·3 cites·20 claims
- 0596US11908660B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2022·Granted Feb 20, 2024·2 cites·20 claims
- 0695US12165844B2Uniformity control circuit for impedance matchLAM RES CORP·Filed 2021·Granted Dec 10, 2024·3 cites·20 claims
- 0794US11158488B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2019·Granted Oct 26, 2021·13 cites·36 claims
- 0894US7977390B2Method for plasma etching performance enhancementLAM RES CORP·Filed 2006·Granted Jul 12, 2011·29 cites·18 claims
- 0992US11335539B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2018·Granted May 17, 2022·6 cites·29 claims
- 1092US6686594B2On-line UV-Visible light halogen gas analyzer for semiconductor processing effluent monitoringAIR PROD & CHEM·Filed 2001·Granted Feb 3, 2004·53 cites·43 claims
- 1190US7581549B2Method for removing carbon-containing residues from a substrateAIR PROD & CHEM·Filed 2005·Granted Sep 1, 2009·18 cites·20 claims
- 1287US7285154B2Xenon recovery systemAIR PROD & CHEM·Filed 2004·Granted Oct 23, 2007·42 cites·24 claims
- 1386US12354840B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2024·Granted Jul 8, 2025·0 cites·20 claims
- 1481US12080518B2Impedance match with an elongated RF strapLAM RES CORP·Filed 2021·Granted Sep 3, 2024·1 cites·22 claims
- 1578US2025062102A1Uniformity control circuit for impedance matchLAM RES CORP·Filed 2024·Application pending·0 cites
- 1677US10916409B2Active control of radial etch uniformityLAM RES CORP·Filed 2018·Granted Feb 9, 2021·2 cites·29 claims
- 1777US2024395504A1Impedance match with an elongated rf strapLAM RES CORP·Filed 2024·Application pending·0 cites
- 1876US7119032B2Method to protect internal components of semiconductor processing equipment using layered superlattice materialsAIR PROD & CHEM·Filed 2004·Granted Oct 10, 2006·14 cites·19 claims
- 1976US2025273433A1Systems and methods for using binning to increase power during a low frequency cycleLAM RES CORP·Filed 2025·Application pending·0 cites
- 2075US6392068B1Carborane containing cholesterol, a new type of molecule for targeted boron drug deliveryUNIV GEORGIA RES FOUND·Filed 2000·Granted May 21, 2002·11 cites·38 claims
- 2169US12476082B2Radiofrequency signal filter arrangement for plasma processing systemLAM RES CORP·Filed 2021·Granted Nov 18, 2025·0 cites·20 claims
- 2269US12266505B2Systems and methods for using binning to increase power during a low frequency cycleLAM RES CORP·Filed 2021·Granted Apr 1, 2025·0 cites·22 claims
- 2367US8236188B2Method for low-K dielectric etch with reduced damageJI BING·Filed 2010·Granted Aug 7, 2012·2 cites·18 claims
- 2462US12362159B2Systems and methods for controlling a plasma sheath characteristicLAM RES CORP·Filed 2022·Granted Jul 15, 2025·0 cites·19 claims
- 2558US7267842B2Method for removing titanium dioxide deposits from a reactorAIR PROD & CHEM·Filed 2004·Granted Sep 11, 2007·3 cites·20 claims
- 2657US8691701B2Strip with reduced low-K dielectric damageJI BING·Filed 2009·Granted Apr 8, 2014·1 cites·16 claims
- 2757US2025140526A1Systems and methods for reducing reflected power associated with an hf rf generator efficientlyLAM RES CORP·Filed 2022·Application pending·0 cites
- 2856US2025006470A1Edge capacitively coupled plasma chamber structureLAM RES CORP·Filed 2022·Application pending·0 cites
- 2953US7371688B2Removal of transition metal ternary and/or quaternary barrier materials from a substrateAIR PROD & CHEM·Filed 2004·Granted May 13, 2008·5 cites·19 claims
- 3053US2023215694A1Duty cycle control to achieve uniformityLAM RES CORP·Filed 2021·Application pending·0 cites
- 3151US12387916B2Magnetic field control systemLAM RES CORP·Filed 2022·Granted Aug 12, 2025·0 cites·24 claims
- 3251US2023298866A1Plasma uniformity control using a static magnetic fieldLAM RES CORP·Filed 2021·Application pending·0 cites
- 3350US2023260768A1Plasma discharge uniformity control using magnetic fieldsLAM RES CORP·Filed 2021·Application pending·0 cites
- 3449US2008119055A1Reducing twisting in ultra-high aspect ratio dielectric etchLAM RES CORP·Filed 2006·Application pending·0 cites
- 3548US2023059495A1Optimization of Radiofrequency Signal Ground Return in Plasma Processing SystemLAM RES CORP·Filed 2021·Application pending·0 cites
- 3648US2007224829A1Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch PlasmasAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 3746US8741165B2Reducing twisting in ultra-high aspect ratio dielectric etchJI BING·Filed 2010·Granted Jun 3, 2014·0 cites·19 claims
- 3846US2007006893A1Free radical initiator in remote plasma chamber cleanJI BING·Filed 2005·Application pending·0 cites
- 3945US2008047579A1Detecting the endpoint of a cleaning processJI BING·Filed 2006·Application pending·0 cites
- 4044US2006040054A1Passivating ALD reactor chamber internal surfaces to prevent residue buildupPEARLSTEIN RONALD M·Filed 2004·Application pending·0 cites
- 4144US2005241670A1Method for cleaning a reactor using electron attachmentDONG CHUN C·Filed 2004·Application pending·0 cites
- 4243US2006254613A1Method and process for reactive gas cleaning of tool partsWU DINGJUN·Filed 2005·Application pending·0 cites
- 4342US2004011380A1Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materialsFiled 2003·Application pending·0 cites
- 4440US2005241671A1Method for removing a substance from a substrate using electron attachmentDONG CHUN C·Filed 2005·Application pending·0 cites
- 4539US2005252529A1Low temperature CVD chamber cleaning using dilute NF3RIDGEWAY ROBERT G·Filed 2004·Application pending·0 cites
- 4638US2005014383A1Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmasFiled 2003·Application pending·0 cites
- 4738US2004045577A1Cleaning of processing chambers with dilute NF3 plasmasFiled 2002·Application pending·0 cites
- 4837US2004014327A1Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materialsFiled 2002·Application pending·0 cites
- 4935US2005011859A1Unsaturated oxygenated fluorocarbons for selective aniostropic etch applicationsFiled 2003·Application pending·0 cites
- 5034US2006016783A1Process for titanium nitride removalWU DINGJUN·Filed 2004·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →