Inventor · disambiguated record
Bon-Woong Koo
Also filed as: KOO BON-WOONG
78 granted patents·19 pending applications·441 citations·filing 2002–2024
99Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT32VARIAN SEMICONDUCTOR EQUIPMENT ASS INC25APPLIED MATERIALS INC18KOO BON-WOONG6BENVENISTE VICTOR2
Top patents by PatentIndex Score
97 records- 0197US11127557B1Ion source with single-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2020·Granted Sep 21, 2021·5 cites·20 claims
- 0297US8916056B2Biasing system for a plasma processing apparatusKOO BON-WOONG·Filed 2012·Granted Dec 23, 2014·57 cites·10 claims
- 0396US9230773B1Ion beam uniformity controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Jan 5, 2016·20 cites·11 claims
- 0495US8698107B2Technique and apparatus for monitoring ion mass, energy, and angle in processing systemsGODET LUDOVIC·Filed 2011·Granted Apr 15, 2014·26 cites·14 claims
- 0593US9978554B1Dual cathode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 22, 2018·9 cites·19 claims
- 0693US7453059B2Technique for monitoring and controlling a plasma processVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Nov 18, 2008·21 cites·31 claims
- 0792US8436318B2Apparatus for controlling the temperature of an RF ion source windowSINCLAIR FRANK·Filed 2010·Granted May 7, 2013·16 cites·18 claims
- 0891US7700925B2Techniques for providing a multimode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Apr 20, 2010·11 cites·14 claims
- 0991US7126808B2Wafer platen equipped with electrostatic clamp, wafer backside gas cooling, and high voltage operation capability for plasma dopingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Oct 24, 2006·69 cites·20 claims
- 1090US9840772B2Method of improving ion beam quality in a non-mass-analyzed ion implantation systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Dec 12, 2017·2 cites·20 claims
- 1189US9232628B2Method and system for plasma-assisted ion beam processingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jan 5, 2016·4 cites·11 claims
- 1289US9064795B2Technique for processing a substrateVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jun 23, 2015·8 cites·3 claims
- 1389US8809800B2Ion source and a method for in-situ cleaning thereofKOO BON-WOONG·Filed 2009·Granted Aug 19, 2014·11 cites·16 claims
- 1488US9899193B1RF ion source with dynamic volume controlVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Feb 20, 2018·8 cites·19 claims
- 1588US9142379B2Ion source and a method for in-situ cleaning thereofVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Sep 22, 2015·7 cites·11 claims
- 1687US10748738B1Ion source with tubular cathodeAPPLIED MATERIALS INC·Filed 2019·Granted Aug 18, 2020·4 cites·20 claims
- 1787US9859098B2Temperature controlled ion sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jan 2, 2018·5 cites·17 claims
- 1887US8501624B2Excited gas injection for ion implant controlKOO BON-WOONG·Filed 2008·Granted Aug 6, 2013·11 cites·6 claims
- 1987US8357912B2Techniques for providing a multimode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2010·Granted Jan 22, 2013·6 cites·17 claims
- 2086US9865430B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jan 9, 2018·3 cites·12 claims
- 2186US9677171B2Method of improving ion beam quality in a non-mass-analyzed ion implantation systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Jun 13, 2017·2 cites·16 claims
- 2286US9288889B2Apparatus and techniques for energetic neutral beam processingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 15, 2016·7 cites·19 claims
- 2386US9093372B2Technique for processing a substrateVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jul 28, 2015·6 cites·13 claims
- 2485US8188448B2Temperature controlled ion sourceBENVENISTE VICTOR·Filed 2010·Granted May 29, 2012·8 cites·12 claims
- 2585US7692139B2Techniques for commensurate cusp-field for effective ion beam neutralizationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Apr 6, 2010·8 cites·16 claims
- 2685US7675730B2Techniques for detecting wafer charging in a plasma processing systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Mar 9, 2010·8 cites·44 claims
- 2785US7476849B2Technique for monitoring and controlling a plasma processVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Jan 13, 2009·10 cites·21 claims
- 2884US7888662B2Ion source cleaning method and apparatusVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Feb 15, 2011·9 cites·20 claims
- 2983US10446372B2Dual cathode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Oct 15, 2019·2 cites·13 claims
- 3083US9297063B2Plasma potential modulated ion implantation systemRADOVANOV SVETLANA B·Filed 2012·Granted Mar 29, 2016·4 cites·20 claims
- 3182US9524849B2Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2013·Granted Dec 20, 2016·4 cites·11 claims
- 3281US10923306B2Ion source with biased extraction plateAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·2 cites·18 claims
- 3380US9887067B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Feb 6, 2018·2 cites·13 claims
- 3479US9922795B2High brightness ion beam extraction using bias electrodes and magnets proximate the extraction apertureVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Mar 20, 2018·2 cites·18 claims
- 3578US10290466B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·1 cites·19 claims
- 3677US8669538B1Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 11, 2014·3 cites·20 claims
- 3777US8072149B2Unbalanced ion sourceCHO JEONG-HA·Filed 2008·Granted Dec 6, 2011·10 cites·24 claims
- 3876US7132672B2Faraday dose and uniformity monitor for plasma based ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Nov 7, 2006·21 cites·37 claims
- 3975USD1051838SSingle-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2021·Granted Nov 19, 2024·0 cites·1 claims
- 4075US8481960B2Deceleration lensRADOVANOV SVETLANA·Filed 2011·Granted Jul 9, 2013·4 cites·20 claims
- 4174US11631567B2Ion source with single-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2021·Granted Apr 18, 2023·0 cites·18 claims
- 4274US9062377B2Reducing glitching in an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jun 23, 2015·3 cites·18 claims
- 4374US9034743B2Method for implant productivity enhancementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted May 19, 2015·3 cites·14 claims
- 4473US9018829B2Excited gas injection for ion implant controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Apr 28, 2015·2 cites·12 claims
- 4571US11114277B2Dual cathode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Sep 7, 2021·0 cites·18 claims
- 4670US7723707B2Techniques for plasma injectionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted May 25, 2010·2 cites·15 claims
- 4769US11049691B2Ion beam quality control using a movable mass resolving deviceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jun 29, 2021·1 cites·11 claims
- 4869US8183542B2Temperature controlled ion sourceBENVENISTE VICTOR·Filed 2010·Granted May 22, 2012·2 cites·19 claims
- 4968US11424097B2Ion source with tubular cathodeAPPLIED MATERIALS INC·Filed 2020·Granted Aug 23, 2022·0 cites·20 claims
- 5068US8466431B2Techniques for improving extracted ion beam quality using high-transparency electrodesBUFF JAMES S·Filed 2009·Granted Jun 18, 2013·3 cites·20 claims
Showing the top 50 of 97 patent records by PatentIndex Score.
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