Inventor · disambiguated record
Chien-Hao Chen
Also filed as: CHEN CHIEN-HAO
156 granted patents·61 pending applications·1,002 citations·filing 2002–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD72TAIWAN SEMICONDUCTOR MFG51UNITED MICROELECTRONICS CORP28CHEN CHIEN HAO18REALTEK SEMICONDUCTOR CORP10
Top patents by PatentIndex Score
217 records- 0197US11610818B2Semiconductor structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 21, 2023·4 cites·20 claims
- 0296US7164163B2Strained transistor with hybrid-strain inducing layerTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jan 16, 2007·47 cites·20 claims
- 0396US6656764B1Process for integration of a high dielectric constant gate insulator layer in a CMOS deviceTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Dec 2, 2003·111 cites·29 claims
- 0495US10690336B1Illumination fan connectable with at least one illumination fan for a computerCHEN CHIEN HAO·Filed 2019·Granted Jun 23, 2020·18 cites·5 claims
- 0595US7052946B2Method for selectively stressing MOSFETs to improve charge carrier mobilityTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 30, 2006·84 cites·36 claims
- 0694US12255104B2Semiconductor device and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 18, 2025·1 cites·20 claims
- 0794US7871915B2Method for forming metal gates in a gate last processTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Jan 18, 2011·38 cites·15 claims
- 0893US10332746B1Post UV cure for gapfill improvementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 25, 2019·9 cites·20 claims
- 0993US8383502B2Integrated high-K/metal gate in CMOS process flowTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Feb 26, 2013·11 cites·15 claims
- 1093US7259050B2Semiconductor device and method of making the sameTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Aug 21, 2007·75 cites·25 claims
- 1193US7232730B2Method of forming a locally strained transistorTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jun 19, 2007·29 cites·14 claims
- 1292US12422904B2Graphics card lifting deviceCHEN CHIEN HAO·Filed 2023·Granted Sep 23, 2025·2 cites·5 claims
- 1392US9601388B2Integrated high-K/metal gate in CMOS process flowTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 21, 2017·6 cites·20 claims
- 1492US8836049B2Semiconductor structure and process thereofTSAI MIN-CHUAN·Filed 2012·Granted Sep 16, 2014·29 cites·12 claims
- 1592US8796695B2Multi-gate field-effect transistor and process thereofLIAO CHIN-I·Filed 2012·Granted Aug 5, 2014·18 cites·10 claims
- 1691US9812451B2Field effect transistor contact with reduced contact resistanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 7, 2017·5 cites·20 claims
- 1791US7528028B2Super anneal for process induced strain modulationTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted May 5, 2009·22 cites·18 claims
- 1890US8679962B2Integrated circuit metal gate structure and method of fabricationHOU YONG-TIAN·Filed 2008·Granted Mar 25, 2014·17 cites·15 claims
- 1990US6759302B1Method of generating multiple oxides by plasma nitridation on oxideTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Jul 6, 2004·35 cites·10 claims
- 2089US7482211B2Junction leakage reduction in SiGe process by implantationTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jan 27, 2009·16 cites·19 claims
- 2188US10741674B2Selective silicon growth for gapfill improvementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 11, 2020·2 cites·20 claims
- 2288US6566205B1Method to neutralize fixed charges in high K dielectricTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted May 20, 2003·41 cites·27 claims
- 2387US11532509B2Selective hybrid capping layer for metal gates of transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 20, 2022·2 cites·20 claims
- 2487US10079185B1Semiconductor pattern for monitoring overlay and critical dimension at post-etching stage and metrology method of the sameUNITED MICROELECTRONICS CORP·Filed 2017·Granted Sep 18, 2018·4 cites·3 claims
- 2587US9018086B2Semiconductor device having a metal gate and fabricating method thereofUNITED MICROELECTRONICS CORP·Filed 2013·Granted Apr 28, 2015·7 cites·5 claims
- 2687US8450161B2Method of fabricating a sealing structure for high-k metal gateCHEN CHIEN-HAO·Filed 2012·Granted May 28, 2013·9 cites·20 claims
- 2786US12142530B2Semiconductor device and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 12, 2024·1 cites·20 claims
- 2886US8003507B2Method of integrating high-K/metal gate in CMOS process flowTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Aug 23, 2011·8 cites·8 claims
- 2986US6767847B1Method of forming a silicon nitride-silicon dioxide gate stackTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Jul 27, 2004·37 cites·15 claims
- 3086US6624090B1Method of forming plasma nitrided gate dielectric layersTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Sep 23, 2003·38 cites·19 claims
- 3185US11538805B2Method of tuning threshold voltages of transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 27, 2022·1 cites·20 claims
- 3285US10515963B2Field effect transistor contact with reduced contact resistanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 24, 2019·2 cites·20 claims
- 3385US8841731B2Integrated high-k/metal gate in CMOS process flowTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 23, 2014·5 cites·17 claims
- 3485US8735269B1Method for forming semiconductor structure having TiN layerUNITED MICROELECTRONICS CORP·Filed 2013·Granted May 27, 2014·7 cites·14 claims
- 3585US2024379811A1Integrated circuit metal gate structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3684US12396244B2Semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Aug 19, 2025·0 cites·20 claims
- 3784US10269799B2Field effect transistor contact with reduced contact resistanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 23, 2019·2 cites·20 claims
- 3884US9472414B2Self-aligned multiple spacer patterning processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 18, 2016·4 cites·20 claims
- 3984US9007571B2Measurement method of overlay markUNITED MICROELECTRONICS CORP·Filed 2013·Granted Apr 14, 2015·5 cites·19 claims
- 4084US8537140B2Illuminated touch sensitive surface module and illuminated device thereofTSAI MING-CHIEH·Filed 2009·Granted Sep 17, 2013·19 cites·26 claims
- 4184US7498642B2Profile confinement to improve transistor performanceTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Mar 3, 2009·11 cites·15 claims
- 4284US7118974B2Method of generating multiple oxides by plasma nitridation on oxideTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Oct 10, 2006·22 cites·12 claims
- 4383US11302818B2Gate resistance reduction through low-resistivity conductive layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 12, 2022·2 cites·20 claims
- 4483US8674433B2Semiconductor processLIAO CHIN-I·Filed 2011·Granted Mar 18, 2014·8 cites·13 claims
- 4582US12237228B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 4682US10868140B2Gap-filling germanium through selective bottom-up growthTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·2 cites·20 claims
- 4782US10504747B2Method of gap filling using conformal deposition-annealing-etching cycle for reducing seam void and bendingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 10, 2019·2 cites·20 claims
- 4881US12183590B2Method of performing gap filling including filling trenches between dummy gate stacks on semiconductor fins/strips with semiconductor materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 4981US11887967B2Semiconductor device package and method of manufacturing the sameADVANCED SEMICONDUCTOR ENG·Filed 2021·Granted Jan 30, 2024·1 cites·14 claims
- 5081US7223647B2Method for forming integrated advanced semiconductor device using sacrificial stress layerTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 29, 2007·28 cites·15 claims
Showing the top 50 of 217 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →