Inventor · disambiguated record
Christopher Heinz Clifford
Also filed as: CLIFFORD CHRISTOPHER · CLIFFORD CHRISTOPHER H · CLIFFORD CHRISTOPHER HEINZ
11 granted patents·106 citations·filing 2011–2023
88Inventor score
Files withGLOBALFOUNDRIES INC3ACCEPTTO CORP2MENTOR GRAPHICS CORP2CLIFFORD CHRISTOPHER HEINZ1PANG LINYONG1
Top patents by PatentIndex Score
11 records- 0197US10951606B1Continuous authentication through orchestration and risk calculation post-authorization system and methodACCEPTTO CORP·Filed 2020·Granted Mar 16, 2021·72 cites·8 claims
- 0296US11552940B1System and method for continuous authentication of user entity identity using context and behavior for real-time modeling and anomaly detectionACCEPTTO CORP·Filed 2021·Granted Jan 10, 2023·6 cites·11 claims
- 0392US11023644B1Optical proximity correction modeling with density-based gauge weightingMENTOR GRAPHICS CORP·Filed 2020·Granted Jun 1, 2021·4 cites·20 claims
- 0491US8739098B1EUV mask defect reconstruction and compensation repairGLOBALFOUNDRIES INC·Filed 2013·Granted May 27, 2014·9 cites·20 claims
- 0584US11888839B1Continuous authentication through orchestration and risk calculation post-authentication system and methodSECUREAUTH CORP·Filed 2023·Granted Jan 30, 2024·1 cites·9 claims
- 0682US8612903B2Technique for repairing a reflective photo-maskPANG LINYONG·Filed 2011·Granted Dec 17, 2013·4 cites·20 claims
- 0781US10496780B1Dynamic model generation for lithographic simulationMENTOR GRAPHICS CORP·Filed 2017·Granted Dec 3, 2019·3 cites·21 claims
- 0876US8555214B2Technique for analyzing a reflective photo-maskCLIFFORD CHRISTOPHER HEINZ·Filed 2011·Granted Oct 8, 2013·4 cites·22 claims
- 0975US8975195B2Methods for optical proximity correction in the design and fabrication of integrated circuitsGLOBALFOUNDRIES INC·Filed 2013·Granted Mar 10, 2015·3 cites·20 claims
- 1051US11699017B2Die yield assessment based on pattern-failure rate simulationSIEMENS IND SOFTWARE INC·Filed 2019·Granted Jul 11, 2023·0 cites·17 claims
- 1145US8775981B1Correcting for overexposure due to overlapping exposures in lithographyGLOBALFOUNDRIES INC·Filed 2013·Granted Jul 8, 2014·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →