Inventor · disambiguated record
Christoph Hennerkes
Also filed as: HENNERKES CHRISTOPH · HENNERKES CHRISTOPH RENE KONRAD CEBULLA
12 granted patents·17 citations·filing 2013–2019
85Inventor score
Top patents by PatentIndex Score
12 records- 0189US9551941B2Illumination system for an EUV lithography device and facet mirror thereforZEISS CARL SMT GMBH·Filed 2015·Granted Jan 24, 2017·4 cites·24 claims
- 0288US9645503B2CollectorZEISS CARL SMT GMBH·Filed 2014·Granted May 9, 2017·5 cites·22 claims
- 0387US11586114B2Wavefront optimization for tuning scanner based on performance matchingASML NETHERLANDS BV·Filed 2019·Granted Feb 21, 2023·2 cites·20 claims
- 0472US10078267B2Method for predicting at least one illumination parameter for evaluating an illumination settingZEISS CARL SMT GMBH·Filed 2017·Granted Sep 18, 2018·1 cites·20 claims
- 0570US9955563B2EUV light source for generating a usable output beam for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Apr 24, 2018·2 cites·20 claims
- 0670US9678432B2Optical assembly for increasing the etendueZEISS CARL SMT GMBH·Filed 2015·Granted Jun 13, 2017·2 cites·20 claims
- 0767US9507269B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Nov 29, 2016·1 cites·22 claims
- 0858US11733615B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·0 cites·12 claims
- 0957US10394128B2Method for predicting at least one illumination parameter for evaluating an illumination settingZEISS CARL SMT GMBH·Filed 2018·Granted Aug 27, 2019·0 cites·20 claims
- 1054US11422472B2Patterning process improvement involving optical aberrationASML NETHERLANDS BV·Filed 2018·Granted Aug 23, 2022·0 cites·20 claims
- 1146US9500956B2Optical system of a microlithographic projection exposure apparatus, and microlithographic exposureZEISS CARL SMT GMBH·Filed 2013·Granted Nov 22, 2016·0 cites·18 claims
- 1242US9405202B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Aug 2, 2016·0 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →