Inventor · disambiguated record
Christopher A. Spence
Also filed as: SPENCE CHRISTOPHER · SPENCE CHRISTOPHER A · SPENCE CHRISTOPHER ALAN
42 granted patents·3 pending applications·1,867 citations·filing 1994–2025
98Inventor score
Files withADVANCED MICRO DEVICES INC35ASML NETHERLANDS BV6GLOBALFOUNDRIES INC3ADVANCED MICRODEVICES INC1
Top patents by PatentIndex Score
45 records- 0198US6994939B1Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature typesADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 7, 2006·228 cites·28 claims
- 0298US6492066B1Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansionADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 10, 2002·232 cites·21 claims
- 0397US10670973B2Coloring aware optimizationASML NETHERLANDS BV·Filed 2016·Granted Jun 2, 2020·16 cites·20 claims
- 0496US6187483B1Mask quality measurements by fourier space analysisADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 13, 2001·163 cites·19 claims
- 0596US5766806AMethod of optical lithography using phase shift maskingADVANCED MICRO DEVICES INC·Filed 1996·Granted Jun 16, 1998·156 cites·27 claims
- 0695US5702848AMask for optical lithography using phase shift masking and integrated circuit produced therefromADVANCED MICRO DEVICES INC·Filed 1996·Granted Dec 30, 1997·135 cites·31 claims
- 0794US5573890AMethod of optical lithography using phase shift maskingADVANCED MICRO DEVICES INC·Filed 1994·Granted Nov 12, 1996·147 cites·11 claims
- 0893US7207017B1Method and system for metrology recipe generation and review and analysis of design, simulation and metrology resultsADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 17, 2007·85 cites·25 claims
- 0993US7120285B1Method for evaluation of reticle image using aerial image simulatorADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 10, 2006·52 cites·19 claims
- 1092US5766804AMethod of optical lithography using phase shift maskingADVANCED MICRO DEVICES INC·Filed 1996·Granted Jun 16, 1998·94 cites·20 claims
- 1190US6562639B1Utilizing electrical performance data to predict CD variations across stepper fieldADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·65 cites·27 claims
- 1289US7194725B1System and method for design rule creation and selectionADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 20, 2007·57 cites·22 claims
- 1388US7269804B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 11, 2007·27 cites·15 claims
- 1488US6356340B1Piezo programmable reticle for EUV lithographyADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 12, 2002·67 cites·25 claims
- 1583US2025370326A1Machine learning based subresolution assist feature placementASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1682US7657864B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesGLOBALFOUNDRIES INC·Filed 2007·Granted Feb 2, 2010·5 cites·15 claims
- 1780US7313769B1Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability marginADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 25, 2007·30 cites·20 claims
- 1876US5928813AAttenuated phase shift maskADVANCED MICRO DEVICES INC·Filed 1996·Granted Jul 27, 1999·30 cites·8 claims
- 1975US6255125B1Method and apparatus for compensating for critical dimension variations in the production of a semiconductor waferADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 3, 2001·47 cites·13 claims
- 2074US6749971B2Method of enhancing clear field phase shift masks with chrome border around phase 180 regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 15, 2004·12 cites·24 claims
- 2173US6627355B2Method of and system for improving stability of photomasksADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 30, 2003·13 cites·20 claims
- 2268US7015148B1Reduce line end pull back by exposing and etching space after mask one trim and etchADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 21, 2006·12 cites·17 claims
- 2367US9250538B2Efficient optical proximity correction repair flow method and apparatusGLOBALFOUNDRIES INC·Filed 2014·Granted Feb 2, 2016·1 cites·13 claims
- 2466US12416854B2Machine learning based subresolution assist feature placementASML NETHERLANDS BV·Filed 2021·Granted Sep 16, 2025·0 cites·20 claims
- 2566US5796651AMemory device using a reduced word line voltage during read operations and a method of accessing such a memory deviceADVANCED MICRO DEVICES INC·Filed 1997·Granted Aug 18, 1998·25 cites·20 claims
- 2665US6051881AForming local interconnects in integrated circuitsADVANCED MICRO DEVICES INC·Filed 1997·Granted Apr 18, 2000·32 cites·9 claims
- 2763US7788609B2Method and apparatus for optimizing an optical proximity correction modelGLOBALFOUNDRIES INC·Filed 2008·Granted Aug 31, 2010·1 cites·21 claims
- 2863US6797438B1Method and enhancing clear field phase shift masks with border around edges of phase regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 28, 2004·6 cites·21 claims
- 2962US6675369B1Method of enhancing clear field phase shift masks by adding parallel line to phase 0 regionADVANCED MICRO DEVICES INC·Filed 2001·Granted Jan 6, 2004·6 cites·22 claims
- 3062US6171739B1Method of determining focus and coma of a lens at various locations in an imaging fieldADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 9, 2001·22 cites·27 claims
- 3161US7027130B2Device and method for determining an illumination intensity profile of an illuminator for a lithography systemADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 11, 2006·6 cites·20 claims
- 3260US7543256B1System and method for designing an integrated circuit deviceADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 2, 2009·6 cites·2 claims
- 3360US2024256976A1Method for generating assist features using machine learning modelASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3457US11953823B2Measurement method and apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 9, 2024·0 cites·20 claims
- 3557US6974652B1Lithographic photomask and method of manufacture to improve photomask test measurementADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 13, 2005·4 cites·22 claims
- 3657US6749970B2Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 15, 2004·4 cites·24 claims
- 3757US5844836AMemory cell having increased capacitance via a local interconnect to gate capacitor and a method for making such a cellADVANCED MICRO DEVICES INC·Filed 1997·Granted Dec 1, 1998·17 cites·20 claims
- 3853US7071085B1Predefined critical spaces in IC patterning to reduce line end pull backADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 4, 2006·4 cites·18 claims
- 3953US6146954AMinimizing transistor size in integrated circuitsADVANCED MICRO DEVICES INC·Filed 1998·Granted Nov 14, 2000·18 cites·20 claims
- 4053US6046088AMethod for self-aligning polysilicon gates with field isolation and the resultant structureADVANCED MICRO DEVICES INC·Filed 1997·Granted Apr 4, 2000·19 cites·10 claims
- 4150US5601954AAttenuated phase shift mask comprising phase shifting layer with parabolically shaped sidewallsADVANCED MICRO DEVICES INC·Filed 1995·Granted Feb 11, 1997·10 cites·8 claims
- 4248US2024004305A1Method for determining mask pattern and training machine learning modelASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 4342US6818358B1Method of extending the areas of clear field phase shift generationADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 16, 2004·0 cites·20 claims
- 4439US6191034B1Forming minimal size spaces in integrated circuit conductive linesADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 20, 2001·7 cites·12 claims
- 4537US5930659AForming minimal size spaces in integrated circuit conductive linesADVANCED MICRODEVICES INC·Filed 1997·Granted Jul 27, 1999·6 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →