Inventor · disambiguated record
David Bessems
Also filed as: BESSEMS DAVID
21 granted patents·1 pending application·32 citations·filing 2008–2021
91Inventor score
Files withASML NETHERLANDS BV12BESSEMS DAVID3STAVENGA MARCO KOERT2VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS2DIRECKS DANIEL JOZEF MARIA1
Top patents by PatentIndex Score
22 records- 0187US8836912B2Fluid handling structure, a lithographic apparatus and a device manufacturing methodBESSEMS DAVID·Filed 2011·Granted Sep 16, 2014·6 cites·20 claims
- 0286US8114568B2Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatusVAN DER HEIJDEN MARCUS THEODOOR WILHELMUS·Filed 2008·Granted Feb 14, 2012·12 cites·31 claims
- 0385US9059228B2Substrate table, immersion lithographic apparatus and device manufacturing methodSTAVENGA MARCO KOERT·Filed 2010·Granted Jun 16, 2015·6 cites·22 claims
- 0484US10551748B2Fluid handling structure, a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Feb 4, 2020·3 cites·20 claims
- 0578US8405817B2Lithographic apparatus, a method of controlling the apparatus and a device manufacturing methodSTAVENGA MARCO KOERT·Filed 2010·Granted Mar 26, 2013·4 cites·20 claims
- 0677US12197140B2Substrate table, immersion lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2021·Granted Jan 14, 2025·0 cites·20 claims
- 0767US10859919B2Fluid handling structure, a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Dec 8, 2020·0 cites·20 claims
- 0866US11215933B2Substrate table, immersion lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Jan 4, 2022·0 cites·19 claims
- 0966US2021088912A1Fluid handling structure, a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1059US10451980B2Substrate table, immersion lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Oct 22, 2019·0 cites·21 claims
- 1159US9291914B2Fluid handling structure, a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Mar 22, 2016·0 cites·20 claims
- 1256US9625829B2Fluid handling structure, a lithographic apparatus and a device manufacturing methodBESSEMS DAVID·Filed 2012·Granted Apr 18, 2017·1 cites·19 claims
- 1355US11500297B2Anti-rotation couplingASML NETHERLANDS BV·Filed 2019·Granted Nov 15, 2022·0 cites·14 claims
- 1455US9625833B2Substrate table, immersion lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 18, 2017·0 cites·20 claims
- 1552US11774012B2Apparatus for high pressure connectionASML NETHERLANDS BV·Filed 2019·Granted Oct 3, 2023·0 cites·15 claims
- 1650US10437162B2Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography systemASML NETHERLANDS BV·Filed 2017·Granted Oct 8, 2019·0 cites·27 claims
- 1750US8394572B2Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatusVAN DER HEIJDEN MARCUS THEODOOR WILHELMUS·Filed 2012·Granted Mar 12, 2013·0 cites·20 claims
- 1846US8508712B2Fluid handling structure, lithographic apparatus and device manufacturing methodVAN DEN DUNGEN CLEMENS JOHANNES GERARDUS·Filed 2009·Granted Aug 13, 2013·0 cites·18 claims
- 1944US9625828B2Fluid handling structure, lithographic apparatus and device manufacturing methodRIEPEN MICHEL·Filed 2011·Granted Apr 18, 2017·0 cites·20 claims
- 2041US9563132B2Fluid handling structure, a lithographic apparatus and a device manufacturing methodBESSEMS DAVID·Filed 2012·Granted Feb 7, 2017·0 cites·20 claims
- 2139US9618835B2Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressureDIRECKS DANIEL JOZEF MARIA·Filed 2011·Granted Apr 11, 2017·0 cites·20 claims
- 2235US11963285B2Target material control in an EUV light sourceASML NETHERLANDS BV·Filed 2020·Granted Apr 16, 2024·0 cites·40 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →