Inventor · disambiguated record
Daniel N. Galburt
Also filed as: GALBURT DANIEL · GALBURT DANIEL N · GALBURT DANIEL NICHOLAS
52 granted patents·1,156 citations·filing 1983–2017
99Inventor score
Files withASML HOLDING NV37SVG LITHOGRAPHY SYSTEMS INC5PERKIN ELMER CORP4SILICON VALLEY GROUP2ASML HODING N V1
Top patents by PatentIndex Score
52 records- 0195US4506205AElectro-magnetic alignment apparatusPERKIN ELMER CORP·Filed 1983·Granted Mar 19, 1985·83 cites·10 claims
- 0293US4952858AMicrolithographic apparatusGALBURT DANIEL N·Filed 1988·Granted Aug 28, 1990·169 cites·17 claims
- 0393US4506204AElectro-magnetic apparatusPERKIN ELMER CORP·Filed 1983·Granted Mar 19, 1985·69 cites·7 claims
- 0492US7053990B2System to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2005·Granted May 30, 2006·17 cites·4 claims
- 0592US6912043B2Removable reticle window and support frame using magnetic forceASML HOLDING NV·Filed 2003·Granted Jun 28, 2005·35 cites·30 claims
- 0691US6538720B2Lithographic tool with dual isolation system and method for configuring the sameSILICON VALLEY GROUP·Filed 2001·Granted Mar 25, 2003·42 cites·24 claims
- 0790US6013401AMethod of controlling illumination field to reduce line width variationSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Jan 11, 2000·78 cites·4 claims
- 0889US6760167B2Apparatus, system, and method for precision positioning and alignment of a lens in an optical systemASML HOLDING NV·Filed 2003·Granted Jul 6, 2004·42 cites·19 claims
- 0988US9632434B2Reticle cooling system in a lithographic apparatusASML HOLDING NV·Filed 2015·Granted Apr 25, 2017·3 cites·20 claims
- 1088US7124624B2High-resolution gas gauge proximity sensorASML HOLDING NV·Filed 2005·Granted Oct 24, 2006·10 cites·19 claims
- 1188US6556364B2Apparatus, system, and method for precision positioning and alignment of a lens in an optical systemFiled 2001·Granted Apr 29, 2003·46 cites·22 claims
- 1288US4907035AUniversal edged-based wafer alignment apparatusPERKIN ELMER CORP·Filed 1986·Granted Mar 6, 1990·59 cites·5 claims
- 1387US6906789B2Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motionASML HOLDING NV·Filed 2003·Granted Jun 14, 2005·24 cites·61 claims
- 1486US7292308B2System and method for patterning a flexible substrate in a lithography toolASML HOLDING NV·Filed 2005·Granted Nov 6, 2007·11 cites·14 claims
- 1586US6784978B2Method, system, and apparatus for management of reaction loads in a lithography systemASML HOLDING NV·Filed 2002·Granted Aug 31, 2004·19 cites·34 claims
- 1685US6097474ADynamically adjustable high resolution adjustable slitSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Aug 1, 2000·55 cites·8 claims
- 1784US6307619B1Scanning framing blade apparatusSILICON VALLEY GROUP·Filed 2000·Granted Oct 23, 2001·38 cites·14 claims
- 1884US5285142AWafer stage with reference surfaceSVG LITHOGRAPHY SYSTEMS INC·Filed 1993·Granted Feb 8, 1994·92 cites·11 claims
- 1983US7369214B2Lithographic apparatus and device manufacturing method utilizing a metrology system with sensorsASML HOLDING NV·Filed 2005·Granted May 6, 2008·6 cites·23 claims
- 2083US7359037B2Drive for reticle-masking blade stageASML HODING N V·Filed 2005·Granted Apr 15, 2008·8 cites·14 claims
- 2183US6853440B1Position correction in Y of mask object shift due to Z offset and non-perpendicular illuminationASML NETHERLANDS BV·Filed 2003·Granted Feb 8, 2005·20 cites·20 claims
- 2282US7372548B2Levitated reticle-masking blade stageASML HOLDING NV·Filed 2005·Granted May 13, 2008·5 cites·19 claims
- 2381US9632433B2Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureASML HOLDING NV·Filed 2013·Granted Apr 25, 2017·2 cites·9 claims
- 2479US6876439B2Method to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2003·Granted Apr 5, 2005·15 cites·2 claims
- 2578US9766557B2Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureASML HOLDING NV·Filed 2017·Granted Sep 19, 2017·1 cites·13 claims
- 2678US6781674B1System and method to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2003·Granted Aug 24, 2004·11 cites·2 claims
- 2778US5966216AOn-axix mask and wafer alignment systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1994·Granted Oct 12, 1999·32 cites·17 claims
- 2876US6885435B2Method, system, and apparatus for management of reaction loads in a lithography systemASML HOLDING NV·Filed 2004·Granted Apr 26, 2005·10 cites·18 claims
- 2974US7042554B2Removable reticle window and support frame using magnetic forceASML HOLDING NV·Filed 2005·Granted May 9, 2006·9 cites·20 claims
- 3073US7134321B2Fluid gauge proximity sensor and method of operating same using a modulated fluid flowASML HOLDING NV·Filed 2004·Granted Nov 14, 2006·15 cites·14 claims
- 3172US7010958B2High-resolution gas gauge proximity sensorASML HOLDING NV·Filed 2002·Granted Mar 14, 2006·21 cites·18 claims
- 3270US7797985B2Method and system for operating an air gauge at programmable or constant standoffASML HOLDING NV·Filed 2008·Granted Sep 21, 2010·2 cites·11 claims
- 3370US7158213B2Lithographic tool with dual isolation system and method for configuring the sameASML HOLDING NV·Filed 2005·Granted Jan 2, 2007·2 cites·30 claims
- 3469US7196775B2Patterned mask holding device and method using two holding systemsASML HOLDING NV·Filed 2004·Granted Mar 27, 2007·11 cites·25 claims
- 3568US7050156B2Method to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2005·Granted May 23, 2006·2 cites·9 claims
- 3667US7176593B2Actuator coil cooling systemASML HOLDING NV·Filed 2005·Granted Feb 13, 2007·3 cites·18 claims
- 3766US7105836B2Method and apparatus for cooling a reticle during lithographic exposureASML HOLDING NV·Filed 2002·Granted Sep 12, 2006·10 cites·8 claims
- 3866US6989889B2Method, system, and apparatus for management of reaction loads in a lithography systemASML HOLDING NV·Filed 2005·Granted Jan 24, 2006·1 cites·34 claims
- 3965US4933714AApparatus and method for reproducing a pattern in an annular areaPERKIN ELMER CORP·Filed 1989·Granted Jun 12, 1990·19 cites·4 claims
- 4062US5352962ABrushless polyphase reduced force variation motorSVG LITHOGRAPHY SYSTEMS INC·Filed 1993·Granted Oct 4, 1994·22 cites·1 claims
- 4161US9977351B2Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureASML HOLDING NV·Filed 2017·Granted May 22, 2018·0 cites·14 claims
- 4261US7437911B2Method and system for operating an air gauge at programmable or constant standoffASML HOLDING NV·Filed 2004·Granted Oct 21, 2008·8 cites·10 claims
- 4359US7075623B2Flexure-supported split reaction massASML HOLDING NV·Filed 2003·Granted Jul 11, 2006·5 cites·20 claims
- 4459US6845287B2Method, system, and computer program product for improved trajectory planning and executionASML HOLDING NV·Filed 2002·Granted Jan 18, 2005·6 cites·29 claims
- 4557US7021121B2Gas gauge proximity sensor with a modulated gas flowASML HOLDING NV·Filed 2004·Granted Apr 4, 2006·7 cites·47 claims
- 4657US6950175B2System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanismASML HOLDING NV·Filed 2003·Granted Sep 27, 2005·5 cites·40 claims
- 4752US7164463B2Lithographic tool with dual isolation system and method for configuring the sameASML HOLDING NV·Filed 2003·Granted Jan 16, 2007·2 cites·39 claims
- 4852US6965427B2System to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2004·Granted Nov 15, 2005·2 cites·6 claims
- 4947US6946761B2Actuator coil cooling systemASML HOLDING NV·Filed 2003·Granted Sep 20, 2005·2 cites·23 claims
- 5045USRE42650EFluid gauge proximity sensor and method of operating same using a modulated fluid flowASML HOLDING NV·Filed 2007·Granted Aug 30, 2011·0 cites·14 claims
Showing the top 50 of 52 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Daniel N. Galburt files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →