Inventor · disambiguated record
Daniel J. Hoffman
Also filed as: HOFFMAN DANIEL · HOFFMAN DANIEL J · HOFFMAN DANIEL JOHN
117 granted patents·34 pending applications·4,833 citations·filing 1986–2024
99Inventor score
Files withAPPLIED MATERIALS INC75ADVANCED ENERGY IND INC19HOFFMAN DANIEL J16BUCHBERGER JR DOUGLAS A6BRILLHART PAUL LUKAS5
Top patents by PatentIndex Score
151 records- 0199US6900596B2Capacitively coupled plasma reactor with uniform radial distribution of plasmaAPPLIED MATERIALS INC·Filed 2002·Granted May 31, 2005·224 cites·53 claims
- 0299US6528751B1Plasma reactor with overhead RF electrode tuned to the plasmaAPPLIED MATERIALS INC·Filed 2000·Granted Mar 4, 2003·266 cites·94 claims
- 0398US11011349B2System, method, and apparatus for controlling ion energy distribution in plasma processing systemsADVANCED ENERGY IND INC·Filed 2017·Granted May 18, 2021·49 cites·12 claims
- 0498US9767988B2Method of controlling the switched mode ion energy distribution systemBROUK VICTOR·Filed 2012·Granted Sep 19, 2017·124 cites·20 claims
- 0598US9435029B2Wafer chucking system for advanced plasma ion energy processing systemsBROUK VICTOR·Filed 2011·Granted Sep 6, 2016·106 cites·10 claims
- 0698US8231799B2Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zoneBERA KALLOL·Filed 2006·Granted Jul 31, 2012·557 cites·18 claims
- 0798US8018164B2Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sourcesAPPLIED MATERIALS INC·Filed 2008·Granted Sep 13, 2011·47 cites·18 claims
- 0898US7967944B2Method of plasma load impedance tuning by modulation of an unmatched low power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Jun 28, 2011·57 cites·16 claims
- 0998US7955986B2Capacitively coupled plasma reactor with magnetic plasma controlAPPLIED MATERIALS INC·Filed 2006·Granted Jun 7, 2011·70 cites·13 claims
- 1098US7521370B2Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias powerAPPLIED MATERIALS INC·Filed 2006·Granted Apr 21, 2009·36 cites·18 claims
- 1198US7196283B2Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surfaceAPPLIED MATERIALS INC·Filed 2005·Granted Mar 27, 2007·118 cites·48 claims
- 1297US12154759B2Apparatus to control a waveformADVANCED ENERGY IND INC·Filed 2023·Granted Nov 26, 2024·2 cites·12 claims
- 1397US11978611B2Apparatus with switches to produce a waveformADVANCED ENERGY IND INC·Filed 2023·Granted May 7, 2024·6 cites·20 claims
- 1497US9685297B2Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution systemCARTER DANIEL·Filed 2012·Granted Jun 20, 2017·113 cites·19 claims
- 1597US9362089B2Method of controlling the switched mode ion energy distribution systemBROUK VICTOR·Filed 2012·Granted Jun 7, 2016·72 cites·20 claims
- 1697US9309594B2System, method and apparatus for controlling ion energy distribution of a projected plasmaHOFFMAN DANIEL J·Filed 2011·Granted Apr 12, 2016·79 cites·7 claims
- 1797US9208992B2Method for controlling ion energy distributionADVANCED ENERGY IND INC·Filed 2015·Granted Dec 8, 2015·107 cites·10 claims
- 1897US9105447B2Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panelADVANCED ENERGY IND INC·Filed 2013·Granted Aug 11, 2015·100 cites·25 claims
- 1997US8884525B2Remote plasma source generating a disc-shaped plasmaHOFFMAN DANIEL J·Filed 2012·Granted Nov 11, 2014·91 cites·10 claims
- 2097US8723423B2Electrostatic remote plasma sourceHOFFMAN DANIEL J·Filed 2012·Granted May 13, 2014·56 cites·12 claims
- 2197US7359177B2Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply outputAPPLIED MATERIALS INC·Filed 2005·Granted Apr 15, 2008·42 cites·16 claims
- 2297US6853141B2Capacitively coupled plasma reactor with magnetic plasma controlFiled 2002·Granted Feb 8, 2005·140 cites·30 claims
- 2396US11189454B2Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution systemADVANCED ENERGY IND INC·Filed 2017·Granted Nov 30, 2021·20 cites·22 claims
- 2496US9524854B2Electrostatic remote plasma source system and methodADVANCED ENERGY IND INC·Filed 2015·Granted Dec 20, 2016·28 cites·14 claims
- 2596US9287086B2System, method and apparatus for controlling ion energy distributionBROUK VICTOR·Filed 2010·Granted Mar 15, 2016·152 cites·7 claims
- 2696US8357264B2Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Jan 22, 2013·33 cites·8 claims
- 2796US8092639B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Jan 10, 2012·20 cites·7 claims
- 2896US8070925B2Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter targetHOFFMAN DANIEL J·Filed 2008·Granted Dec 6, 2011·36 cites·18 claims
- 2996US8012304B2Plasma reactor with a multiple zone thermal control feed forward control apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·27 cites·11 claims
- 3096US7780866B2Method of plasma confinement for enhancing magnetic control of plasma radial distributionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·40 cites·20 claims
- 3196US7553679B2Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and currentAPPLIED MATERIALS INC·Filed 2006·Granted Jun 30, 2009·22 cites·9 claims
- 3296US7030335B2Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2001·Granted Apr 18, 2006·72 cites·125 claims
- 3396US6894245B2Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2001·Granted May 17, 2005·108 cites·31 claims
- 3496US6326597B1Temperature control system for process chamberAPPLIED MATERIALS INC·Filed 1999·Granted Dec 4, 2001·659 cites·56 claims
- 3595US11615941B2System, method, and apparatus for controlling ion energy distribution in plasma processing systemsADVANCED ENERGY IND INC·Filed 2019·Granted Mar 28, 2023·14 cites·9 claims
- 3695US9589767B2Systems, methods, and apparatus for minimizing cross coupled wafer surface potentialsADVANCED ENERGY IND INC·Filed 2014·Granted Mar 7, 2017·26 cites·20 claims
- 3795US9210790B2Systems and methods for calibrating a switched mode ion energy distribution systemHOFFMAN DANIEL J·Filed 2012·Granted Dec 8, 2015·104 cites·28 claims
- 3895US9142388B2Capacitively coupled remote plasma sourceADVANCED ENERGY IND INC·Filed 2014·Granted Sep 22, 2015·25 cites·13 claims
- 3994US8617351B2Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reductionHOFFMAN DANIEL J·Filed 2005·Granted Dec 31, 2013·26 cites·10 claims
- 4094US8608900B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Dec 17, 2013·18 cites·20 claims
- 4193US8329586B2Method of processing a workpiece in a plasma reactor using feed forward thermal controlBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Dec 11, 2012·11 cites·18 claims
- 4293US8221580B2Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loopsBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Jul 17, 2012·14 cites·18 claims
- 4393US8002945B2Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Aug 23, 2011·17 cites·19 claims
- 4493US7247218B2Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias powerAPPLIED MATERIALS INC·Filed 2003·Granted Jul 24, 2007·32 cites·26 claims
- 4592US10648074B2Physical vapor deposition with isotropic neutral and non-isotropic ion velocity distribution at the wafer surfaceAPPLIED MATERIALS INC·Filed 2019·Granted May 12, 2020·2 cites·18 claims
- 4692US8980044B2Plasma reactor with a multiple zone thermal control feed forward control apparatusBRILLHART PAUL LUKAS·Filed 2010·Granted Mar 17, 2015·10 cites·19 claims
- 4792US8337660B2Capacitively coupled plasma reactor having very agile wafer temperature controlBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Dec 25, 2012·12 cites·13 claims
- 4892US8021521B2Method for agile workpiece temperature control in a plasma reactor using a thermal modelAPPLIED MATERIALS INC·Filed 2006·Granted Sep 20, 2011·13 cites·19 claims
- 4992US7510665B2Plasma generation and control using dual frequency RF signalsAPPLIED MATERIALS INC·Filed 2006·Granted Mar 31, 2009·17 cites·19 claims
- 5092US6838635B2Plasma reactor with overhead RF electrode tuned to the plasmaHOFFMAN DANIEL J·Filed 2002·Granted Jan 4, 2005·36 cites·16 claims
Showing the top 50 of 151 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →