Inventor · disambiguated record
Daeyoun Kim
Also filed as: KIM DAEYOUN
4 granted patents·17 pending applications·18 citations·filing 2006–2025
68Inventor score
Top patents by PatentIndex Score
21 records- 0187USD990441SGas flow control plateASM IP HOLDING BV·Filed 2021·Granted Jun 27, 2023·12 cites·1 claims
- 0287US11251068B2Substrate processing apparatus and substrate processing methodASM IP HOLDING BV·Filed 2019·Granted Feb 15, 2022·6 cites·21 claims
- 0376US2025357178A1Lift pin assemblyASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0473US2024363331A1Substrate support plate, substrate processing apparatus including the same, and substrate processing methodASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0569US12406873B2Lift pin assemblyASM IP HOLDING BV·Filed 2022·Granted Sep 2, 2025·0 cites·17 claims
- 0664US2024392439A1Reactor lid and an atomic layer deposition apparatus using the sameASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0761US2025166971A1Substrate processing apparatus using plasma phase shiftASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0861US2025336652A1Substrate processing system with a positively-biased substrate and a method thereofASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0960US2025372352A1Reaction chamber with temperature control capabilities and substrate processing system equipped with the sameASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 1059US2021180188A1Substrate support plate, substrate processing apparatus including the same, and substrate processing methodASM IP HOLDING BV·Filed 2020·Application pending·0 cites
- 1157US2025019828A1Gas injection system and a wafer processing apparatus using the sameASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1257US2024404790A1Wafer processing apparatus using plasma phase shiftASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1356US2025132131A1Plasma modulation apparatus for substrate processing systemASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1455US2024105479A1Substrate processing apparatusASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1550US2023260754A1Substrate processing method and substrate processing apparatus using the sameASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1648US2022293398A1Substrate processing apparatusASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1746US2021166910A1Substrate support plate, substrate processing apparatus including the same, and substrate processing methodASM IP HOLDING BV·Filed 2020·Application pending·0 cites
- 1846US2023080970A1Substrate processing apparatusASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1946US2021319982A1Gas supply unit and substrate processing apparatus including the sameASM IP HOLDING BV·Filed 2021·Application pending·0 cites
- 2038US11664199B2Substrate processing apparatus and substrate processing methodASM IP HOLDING BV·Filed 2019·Granted May 30, 2023·0 cites·15 claims
- 2136US2006249077A1Multiple inlet atomic layer deposition reactorKIM DAEYOUN·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →