Inventor · disambiguated record
Daisuke Kori
Also filed as: KORI DAISUKE
90 granted patents·68 pending applications·275 citations·filing 2007–2025
99Inventor score
Top patents by PatentIndex Score
158 records- 0196US7847456B2Permanent magnet electrical rotating machine, wind power generating system, and a method of magnetizing a permanent magnetHITACHI LTD·Filed 2010·Granted Dec 7, 2010·29 cites·20 claims
- 0294US8846846B2Naphthalene derivative, resist bottom layer material, and patterning processKINSHO TAKESHI·Filed 2011·Granted Sep 30, 2014·8 cites·2 claims
- 0394US8835697B2Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning processKORI DAISUKE·Filed 2012·Granted Sep 16, 2014·9 cites·5 claims
- 0493US10444628B2Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 15, 2019·8 cites·17 claims
- 0592US9893593B2Rotating electric machine having a cooling frame with a plurality of coolantsHITACHI LTD·Filed 2015·Granted Feb 13, 2018·8 cites·17 claims
- 0692US9203277B2Permanent magnet pump motorHITACHI LTD·Filed 2013·Granted Dec 1, 2015·12 cites·8 claims
- 0791US9136121B2Underlayer film-forming composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Sep 15, 2015·10 cites·18 claims
- 0891US8653703B2Permanent magnetic rotating electric machine and wind power generating systemKORI DAISUKE·Filed 2011·Granted Feb 18, 2014·15 cites·2 claims
- 0991US7994666B2Permanent magnet electrical rotating machine, wind power generating system, and a method of magnetizing a permanent magnetHITACHI LTD·Filed 2007·Granted Aug 9, 2011·16 cites·20 claims
- 1090US9785049B2Method for forming multi-layer film and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 10, 2017·6 cites·20 claims
- 1190US8846303B2Resist top coat composition and patterning processSHINETSU CHEMICAL CO·Filed 2012·Granted Sep 30, 2014·6 cites·11 claims
- 1290US8663898B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Mar 4, 2014·7 cites·28 claims
- 1389US8760095B2Rotator control device, rotator system, vehicle, electric car and electric generation systemIWAJI YOSHITAKA·Filed 2011·Granted Jun 24, 2014·10 cites·22 claims
- 1487US12147160B2Resist underlayer film material, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2021·Granted Nov 19, 2024·1 cites·11 claims
- 1587US9728420B2Organic film composition, process for forming organic film, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 8, 2017·5 cites·15 claims
- 1687US8853031B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Oct 7, 2014·5 cites·28 claims
- 1786US10416563B2Resist underlayer film composition, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 17, 2019·4 cites·21 claims
- 1885US10177621B2Rotating electric machine or wind power generation systemHITACHI LTD·Filed 2014·Granted Jan 8, 2019·8 cites·15 claims
- 1985US9857686B2Composition for forming resist underlayer film and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Jan 2, 2018·4 cites·20 claims
- 2084US9977330B2Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted May 22, 2018·3 cites·24 claims
- 2184US7952249B2Permanent-magnet type electric rotating machine and permanent-magnet type electric rotating machine system for automobile or trainHITACHI LTD·Filed 2009·Granted May 31, 2011·23 cites·12 claims
- 2283US10241412B2Resist underlayer film composition, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2018·Granted Mar 26, 2019·3 cites·20 claims
- 2383US9312127B2Method for producing semiconductor apparatus substrateSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 12, 2016·4 cites·20 claims
- 2483US8795955B2Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning processKINSHO TAKESHI·Filed 2011·Granted Aug 5, 2014·3 cites·14 claims
- 2581US10429739B2Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 1, 2019·3 cites·18 claims
- 2681US9984878B2Resist under layer film composition and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted May 29, 2018·3 cites·16 claims
- 2780US9230827B2Method for forming a resist under layer film and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 5, 2016·4 cites·20 claims
- 2880US9045587B2Naphthalene derivative, resist bottom layer material, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 2, 2015·2 cites·10 claims
- 2980US8877422B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Nov 4, 2014·3 cites·20 claims
- 3079US8835092B2Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivativeWATANABE TAKERU·Filed 2011·Granted Sep 16, 2014·3 cites·13 claims
- 3178US9146468B2Resist underlayer film composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2012·Granted Sep 29, 2015·4 cites·22 claims
- 3278US8350434B2Permanent magnet type rotary electric machineHITACHI LTD·Filed 2009·Granted Jan 8, 2013·8 cites·14 claims
- 3376US10156788B2Resist underlayer film composition, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2016·Granted Dec 18, 2018·2 cites·8 claims
- 3475US9261788B2Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 16, 2016·2 cites·1 claims
- 3575US9054568B2Permanent magnet rotating electric machineHITACHI LTD·Filed 2013·Granted Jun 9, 2015·3 cites·20 claims
- 3675US2025370335A1Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3774US9046764B2Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film compositionSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 2, 2015·2 cites·24 claims
- 3874US8592956B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Nov 26, 2013·2 cites·26 claims
- 3973US12379663B2Material for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2021·Granted Aug 5, 2025·0 cites·20 claims
- 4073US9524863B2Method for cleaning and drying semiconductor substrateSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 20, 2016·2 cites·20 claims
- 4172US11018015B2Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 25, 2021·1 cites·22 claims
- 4272US8421285B2Permanent magnet type electric power generatorKORI DAISUKE·Filed 2009·Granted Apr 16, 2013·6 cites·21 claims
- 4371US10811247B2Method of cleaning and drying semiconductor substrateSHINETSU CHEMICAL CO·Filed 2018·Granted Oct 20, 2020·1 cites·17 claims
- 4471US10228621B2Underlayer film-forming composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Mar 12, 2019·2 cites·13 claims
- 4571US9136122B2Underlayer film-forming composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Sep 15, 2015·2 cites·18 claims
- 4671US8883379B2Resist-protective film-forming composition and patterning processSHINETSU CHEMICAL CO·Filed 2012·Granted Nov 11, 2014·1 cites·3 claims
- 4771US2025388711A1Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 4870US10615045B2Composition for forming organic film, patterning process, and resin for forming organic filmSHINETSU CHEMICAL CO·Filed 2018·Granted Apr 7, 2020·1 cites·19 claims
- 4970US8994245B2Permanent magnet type electrical rotating machine and permanent magnet type electrical rotating machine system for vehicleKORI DAISUKE·Filed 2009·Granted Mar 31, 2015·6 cites·16 claims
- 5070US2024402605A1Material For Forming Organic Film, Patterning Process, And Organic Film CompoundSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
Showing the top 50 of 158 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →