Inventor · disambiguated record
Daniel Kraehmer
Also filed as: KRAEHMER DANIEL
41 granted patents·17 pending applications·247 citations·filing 2003–2018
97Inventor score
Files withZEISS CARL SMT AG26ZEISS CARL SMT GMBH19KAMENOV VLADIMIR2KRAEHMER DANIEL2MANN HANS-JUERGEN2
Top patents by PatentIndex Score
58 records- 0195US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0295US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0393US7463422B2Projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·19 cites·23 claims
- 0492US7463423B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·9 cites·40 claims
- 0590US9535332B2Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a maskZEISS CARL SMT GMBH·Filed 2012·Granted Jan 3, 2017·6 cites·30 claims
- 0689US9551941B2Illumination system for an EUV lithography device and facet mirror thereforZEISS CARL SMT GMBH·Filed 2015·Granted Jan 24, 2017·4 cites·24 claims
- 0789US7692868B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2008·Granted Apr 6, 2010·6 cites·39 claims
- 0888US9645503B2CollectorZEISS CARL SMT GMBH·Filed 2014·Granted May 9, 2017·5 cites·22 claims
- 0987US8054557B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2010·Granted Nov 8, 2011·3 cites·20 claims
- 1086US7728975B1Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Jun 1, 2010·8 cites·27 claims
- 1186US7239450B2Method of determining lens materials for a projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jul 3, 2007·16 cites·48 claims
- 1285US6806942B2Projection exposure systemZEISS CARL SMT AG·Filed 2003·Granted Oct 19, 2004·32 cites·39 claims
- 1382US8879159B2Lithography projection objective, and a method for correcting image defects of the sameLOERING ULRICH·Filed 2011·Granted Nov 4, 2014·2 cites·64 claims
- 1482US6992834B2Objective with birefringent lensesZEISS CARL SMT AG·Filed 2005·Granted Jan 31, 2006·9 cites·37 claims
- 1579US9316922B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2014·Granted Apr 19, 2016·1 cites·28 claims
- 1675US9097984B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Aug 4, 2015·1 cites·30 claims
- 1770US9955563B2EUV light source for generating a usable output beam for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Apr 24, 2018·2 cites·20 claims
- 1866US9063439B2Projection objective for microlithography with stray light compensation and related methodsGOEHNERMEIER AKSEL·Filed 2009·Granted Jun 23, 2015·2 cites·40 claims
- 1966US2019072861A1Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2064US8208127B2Combination stop for catoptric projection arrangementMANN HANS-JUERGEN·Filed 2008·Granted Jun 26, 2012·1 cites·35 claims
- 2164US8126669B2Optimization and matching of optical systems by use of orientation Zernike polynomialsTOTZECK MICHAEL·Filed 2009·Granted Feb 28, 2012·4 cites·20 claims
- 2264US8031326B2Illumination system or projection lens of a microlithographic exposure systemZEISS CARL SMT GMBH·Filed 2008·Granted Oct 4, 2011·3 cites·35 claims
- 2363US9964859B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2016·Granted May 8, 2018·0 cites·32 claims
- 2461US10281824B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted May 7, 2019·0 cites·24 claims
- 2561US7903333B2Polarization-modulating optical element and method for manufacturing thereofZEISS CARL SMT GMBH·Filed 2007·Granted Mar 8, 2011·2 cites·18 claims
- 2660US7961297B2Method for determining intensity distribution in the image plane of a projection exposure arrangementZEISS CARL SMS GMBH·Filed 2006·Granted Jun 14, 2011·1 cites·25 claims
- 2760US2014293256A1Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 2859US7808615B2Projection exposure apparatus and method for operating the sameZEISS CARL SMT AG·Filed 2006·Granted Oct 5, 2010·2 cites·18 claims
- 2959US7697211B2Symmetrical objective having four lens groups for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Apr 13, 2010·2 cites·26 claims
- 3057US7982969B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2008·Granted Jul 19, 2011·1 cites·47 claims
- 3157US2018164474A1Projection objective for microlithographyZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 3256US7483121B2Microlithograph systemZEISS CARL SMT AG·Filed 2007·Granted Jan 27, 2009·0 cites·28 claims
- 3355US8436985B2Combination stop for catoptric projection arrangementMANN HANS-JUERGEN·Filed 2012·Granted May 7, 2013·0 cites·36 claims
- 3455US2017322343A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 3555US2014320955A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 3654US7239447B2Objective with crystal lensesZEISS CARL SMT AG·Filed 2004·Granted Jul 3, 2007·4 cites·33 claims
- 3753US2008297754A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3852US7317508B2Optical system and method for the production of micro-structured components by microlithographyZEISS CARL SMT AG·Filed 2004·Granted Jan 8, 2008·2 cites·29 claims
- 3952US2009115986A1Microlithography projection objectiveZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 4051US8767181B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodGRUNER TORALF·Filed 2010·Granted Jul 1, 2014·0 cites·19 claims
- 4151US8325426B2Projection objective of a microlithographic projection exposure apparatusSCHUSTER KARL-HEINZ·Filed 2011·Granted Dec 4, 2012·0 cites·24 claims
- 4248US8345222B2High transmission, high aperture catadioptric projection objective and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2009·Granted Jan 1, 2013·0 cites·22 claims
- 4348US7710640B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted May 4, 2010·0 cites·24 claims
- 4448US2010208225A1Projection objective for micrlolithography having an obscurated pupilZEISS CARL SMT AG·Filed 2010·Application pending·0 cites
- 4547US8922753B2Optical system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Dec 30, 2014·0 cites·22 claims
- 4647US2009021830A1Projection lens of a microlithographic exposure systemZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4746US8213079B2Polarization-modulating optical element and method for manufacturing thereofKRAEHMER DANIEL·Filed 2011·Granted Jul 3, 2012·0 cites·26 claims
- 4846US7679831B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Mar 16, 2010·0 cites·20 claims
- 4946US2007242250A1Objective with crystal lensesZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 5046US2009195876A1Method for describing a retardation distribution in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
Showing the top 50 of 58 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →