Lithography projection objective, and a method for correcting image defects of the same

Abstract

A system includes a microlithography projection objective configured to image radiation from an object plane to an image plane along a radiation path. The microlithography projection objective has an optical axis. The microlithography projection objective includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes an optical element. During use of the system, a liquid is present. The system is configured so that, during use of the system, a distance between the optical element and the image plane is varied to reduce at least one aberration induced by a change in a temperature in the system.

1 . (canceled) 
     
     
         2 . A system, comprising:
 a projection objective configured to image radiation from an object plane to an image plane along a radiation path, the projection objective having an optical axis, the projection objective comprising a plurality of optical elements along the optical axis of the projection objective, the plurality of optical elements comprising an optical element,   wherein:
 during use of the system, a liquid is present; 
 the system is configured so that, during use of the system, a distance between the optical element and the image plane is varied to reduce at least one aberration induced by a change in a temperature in the system; and 
 the projection objective is a microlithography projection objective. 
   
     
     
         3 . The system of  claim 2 , wherein the at least one aberration comprises a spherical aberration. 
     
     
         4 . The system of  claim 2 , wherein, during use of the system, the position of the optical element is varied to compensate for a change in temperature of the liquid. 
     
     
         5 . The system of  claim 2 , wherein, during use of the system, the position of the optical element is varied to compensate for a change in a volume of the liquid. 
     
     
         6 . The system of  claim 2 , further comprising the liquid. 
     
     
         7 . The system of  claim 2 , further comprising a positioning device configured to move the optical relative to the image plane. 
     
     
         8 . The system of  claim 7 , wherein the positioning device is configured to move the optical element along the optical axis of the projection objective. 
     
     
         9 . The system of  claim 2 , wherein at least one of the plurality of optical elements is exchangeable. 
     
     
         10 . The system of  claim 2 , wherein the system is configured so that, during use of the projection objective, at least some aberrations in the projection objective are compensated by optical elements other than the optical element. 
     
     
         11 . The system of  claim 2 , wherein at least one of the optical elements has an aspheric surface. 
     
     
         12 . The system of  claim 2 , wherein at least one of the optical elements has a surface with a surface curvature that can be varied. 
     
     
         13 . The system of  claim 2 , wherein the projection objective is a catadioptric projection projective. 
     
     
         14 . The system of  claim 2 , wherein the projection objective has at least one real intermediate image. 
     
     
         15 . The system of  claim 2 , wherein the optical element comprises a number of mutually detachable components that are spaced from one another or that are interconnected in an optically neutral fashion. 
     
     
         16 . The system of  claim 15 , wherein components of the optical element comprise different optical materials. 
     
     
         17 . The system of  claim 16 , wherein at least one component of the optical element comprises fluoride crystal.