Inventor · disambiguated record
Vladan Blahnik
Also filed as: BLAHNIK VLADAN
15 granted patents·4 pending applications·67 citations·filing 2005–2023
91Inventor score
Top patents by PatentIndex Score
19 records- 0192US8687290B2Variable filter compensation for high-aperture camera lensesJAHN DIRK·Filed 2012·Granted Apr 1, 2014·22 cites·17 claims
- 0292US7463423B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·9 cites·40 claims
- 0389US7692868B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2008·Granted Apr 6, 2010·6 cites·39 claims
- 0489US7684013B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·12 cites·15 claims
- 0587US8054557B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2010·Granted Nov 8, 2011·3 cites·20 claims
- 0682US10746975B2Objective lens for a still or film camera and method for selective damping of specific spatial frequency ranges of the modulation transfer function of such an objective lensZEISS CARL AG·Filed 2017·Granted Aug 18, 2020·3 cites·24 claims
- 0782US8879159B2Lithography projection objective, and a method for correcting image defects of the sameLOERING ULRICH·Filed 2011·Granted Nov 4, 2014·2 cites·64 claims
- 0880US12008708B2Method and data processing system for creating or adapting individual images based on properties of a light ray within a lensZEISS CARL AG·Filed 2021·Granted Jun 11, 2024·1 cites·14 claims
- 0979US9316922B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2014·Granted Apr 19, 2016·1 cites·28 claims
- 1072US8858099B2Anamorphic objectiveDODOC AURELIAN·Filed 2012·Granted Oct 14, 2014·4 cites·24 claims
- 1172US2024029342A1Method and data processing system for synthesizing imagesZEISS CARL AG·Filed 2023·Application pending·0 cites
- 1266US2019072861A1Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1364US8126669B2Optimization and matching of optical systems by use of orientation Zernike polynomialsTOTZECK MICHAEL·Filed 2009·Granted Feb 28, 2012·4 cites·20 claims
- 1463US9964859B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2016·Granted May 8, 2018·0 cites·32 claims
- 1562US12405104B2Measurement apparatus, method for measuring by interferometry, processing method, optical element and lithography systemZEISS CARL SMT GMBH·Filed 2023·Granted Sep 2, 2025·0 cites·23 claims
- 1647US2025093592A1Lidar device for scanning measurement of a distance to an objectScantinel Photonics GmbH·Filed 2022·Application pending·0 cites
- 1742US10606032B2Optical lens-element system for a supplementary lens in front of a camera module of an electronic deviceZEISS CARL AG·Filed 2018·Granted Mar 31, 2020·0 cites·27 claims
- 1842US8319945B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 27, 2012·0 cites·20 claims
- 1941US2011134403A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →