Inventor · disambiguated record
Ulrich Loering
Also filed as: BROTSACK MARKUS · LOERING ULRICH
30 granted patents·7 pending applications·143 citations·filing 2004–2025
96Inventor score
Top patents by PatentIndex Score
37 records- 0193US7570343B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Aug 4, 2009·14 cites·8 claims
- 0293US7460206B2Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 2, 2008·71 cites·3 claims
- 0392US7463423B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·9 cites·40 claims
- 0491US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 0590US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 0689US7692868B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2008·Granted Apr 6, 2010·6 cites·39 claims
- 0787US9442381B2Method of operating a projection exposure tool for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Sep 13, 2016·4 cites·36 claims
- 0887US8054557B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2010·Granted Nov 8, 2011·3 cites·20 claims
- 0982US8879159B2Lithography projection objective, and a method for correcting image defects of the sameLOERING ULRICH·Filed 2011·Granted Nov 4, 2014·2 cites·64 claims
- 1079US9316922B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2014·Granted Apr 19, 2016·1 cites·28 claims
- 1178US8228483B2Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plateLOERING ULRICH·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 1275US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 1374US9671703B2Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 6, 2017·2 cites·24 claims
- 1472US2025389927A1Optical modules for the ultraviolet wavelength rangeZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1570US8330935B2Exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2010·Granted Dec 11, 2012·2 cites·24 claims
- 1668US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 1766US9081310B2Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in sameEXLER MATTHIAS·Filed 2012·Granted Jul 14, 2015·2 cites·28 claims
- 1866US2019072861A1Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1965US9921483B2Surface correction of mirrors with decoupling coatingZEISS CARL SMT GMBH·Filed 2015·Granted Mar 20, 2018·1 cites·20 claims
- 2065US8659745B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsZEISS CARL SMT GMBH·Filed 2013·Granted Feb 25, 2014·1 cites·32 claims
- 2163US10317802B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 11, 2019·0 cites·21 claims
- 2263US9964859B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2016·Granted May 8, 2018·0 cites·32 claims
- 2362US12405108B2Production method and measurement methodZEISS CARL SMT GMBH·Filed 2023·Granted Sep 2, 2025·0 cites·13 claims
- 2462US8339576B2Projection objective of a microlithographic projection exposure apparatusLOERING ULRICH·Filed 2012·Granted Dec 25, 2012·1 cites·20 claims
- 2561US10345710B2Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Jul 9, 2019·0 cites·22 claims
- 2661US8488104B2Projection objective with diaphragmsDIECKMANN NILS·Filed 2011·Granted Jul 16, 2013·1 cites·20 claims
- 2759US7697211B2Symmetrical objective having four lens groups for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Apr 13, 2010·2 cites·26 claims
- 2858US12222655B2Stop, optical system and lithography apparatusZEISS CARL SMT GMBH·Filed 2021·Granted Feb 11, 2025·0 cites·20 claims
- 2958US9746778B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2016·Granted Aug 29, 2017·0 cites·14 claims
- 3057US2008309894A1Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3155US10241423B2Method of operating a projection exposure tool for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Mar 26, 2019·0 cites·20 claims
- 3254US2008297745A1Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3354US2008291419A1Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3453US2022373899A1Projection exposure apparatus with a thermal manipulatorZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 3548US2007070316A1Microlithographic projection exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2006·Application pending·0 cites
- 3647US9201226B2Imaging opticsLOERING ULRICH·Filed 2012·Granted Dec 1, 2015·0 cites·20 claims
- 3745US8542346B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsLIMBACH GUIDO·Filed 2009·Granted Sep 24, 2013·0 cites·33 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →