Inventor · disambiguated record
David W. Myers
Also filed as: MYERS DAVID · MYERS DAVID W · MYERS DAVID WAYNE
20 granted patents·1 pending application·1,355 citations·filing 1976–2024
96Inventor score
Top patents by PatentIndex Score
21 records- 0199US6567450B2Very narrow band, two chamber, high rep rate gas discharge laser systemCYMER INC·Filed 2001·Granted May 20, 2003·265 cites·52 claims
- 0298US6625191B2Very narrow band, two chamber, high rep rate gas discharge laser systemCYMER INC·Filed 2001·Granted Sep 23, 2003·236 cites·78 claims
- 0398US6128323AReliable modular production quality narrow-band high REP rate excimer laserCYMER INC·Filed 1998·Granted Oct 3, 2000·284 cites·56 claims
- 0496US7164144B2EUV light sourceCYMER INC·Filed 2004·Granted Jan 16, 2007·113 cites·49 claims
- 0594US4909631AMethod for film thickness and refractive index determinationTAN RAUL Y·Filed 1987·Granted Mar 20, 1990·208 cites·7 claims
- 0693US7567607B2Very narrow band, two chamber, high rep-rate gas discharge laser systemCYMER INC·Filed 2006·Granted Jul 28, 2009·14 cites·3 claims
- 0793US7317196B2LPP EUV light sourceCYMER INC·Filed 2004·Granted Jan 8, 2008·54 cites·28 claims
- 0888USD246541SGolf club headMYERS DAVID W·Filed 1976·Granted Nov 29, 1977·26 cites·1 claims
- 0987US5525799APortable gas chromatograph-mass spectrometerUS ARMY·Filed 1994·Granted Jun 11, 1996·58 cites·20 claims
- 1085US6801560B2Line selected F2 two chamber laser systemCYMER INC·Filed 2002·Granted Oct 5, 2004·18 cites·77 claims
- 1183US7323703B2EUV light sourceCYMER INC·Filed 2006·Granted Jan 29, 2008·10 cites·31 claims
- 1282US9239269B1Calibration of photoelectromagnetic sensor in a laser sourceASML NETHERLANDS BV·Filed 2014·Granted Jan 19, 2016·6 cites·11 claims
- 1382US7061961B2Very narrow band, two chamber, high rep-rate gas discharge laser systemCYMER INC·Filed 2005·Granted Jun 13, 2006·5 cites·20 claims
- 1467US9239268B1Calibration of photoelectromagnetic sensor in a laser sourceASML NETHERLANDS BV·Filed 2014·Granted Jan 19, 2016·2 cites·13 claims
- 1563US7058107B2Line selected F2 two chamber laser systemCYMER INC·Filed 2004·Granted Jun 6, 2006·5 cites·77 claims
- 1662US7141806B1EUV light source collector erosion mitigationCYMER INC·Filed 2005·Granted Nov 28, 2006·5 cites·44 claims
- 1761US4857738AAbsorption measurements of materialsGEN SIGNAL CORP·Filed 1987·Granted Aug 15, 1989·22 cites·19 claims
- 1860US7218661B2Line selected F2 two chamber laser systemCYMER INC·Filed 2004·Granted May 15, 2007·4 cites·77 claims
- 1960US2025083300A1Golf course grabber deviceMYERS DAVID·Filed 2024·Application pending·0 cites
- 2057US5153433APortable mass spectrometer with one or more mechanically adjustable electrostatic sectors and a mechanically adjustable magnetic sector all mounted in a vacuum chamberUS ENERGY·Filed 1991·Granted Oct 6, 1992·14 cites·20 claims
- 2140US4874240ACharacterization of semiconductor resist material during processingHOECHST CELANESE·Filed 1988·Granted Oct 17, 1989·6 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →