Inventor · disambiguated record
Daiju Shiono
Also filed as: SHIONO DAIJU
64 granted patents·6 pending applications·206 citations·filing 2005–2016
98Inventor score
Top patents by PatentIndex Score
70 records- 0194US8192915B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted Jun 5, 2012·21 cites·14 claims
- 0293US8221956B2Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compoundSHIONO DAIJU·Filed 2009·Granted Jul 17, 2012·20 cites·9 claims
- 0391US9169421B2Method of producing structure containing phase-separated structure, method of forming pattern, and top coat materialTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Oct 27, 2015·7 cites·12 claims
- 0491US8685620B2Resist composition, method of forming resist pattern and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Apr 1, 2014·8 cites·5 claims
- 0591US8394578B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2011·Granted Mar 12, 2013·9 cites·3 claims
- 0691US8227170B2Resist composition, method of forming resist pattern, polymeric compound, and compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 24, 2012·11 cites·20 claims
- 0790US9023581B2Resist composition, method of forming resist pattern, polymeric compound, and compoundKAWAUE AKIYA·Filed 2011·Granted May 5, 2015·8 cites·14 claims
- 0890US8329378B2Positive resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted Dec 11, 2012·9 cites·12 claims
- 0990US8268529B2Positive resist composition, method of forming resist pattern using the same, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Sep 18, 2012·9 cites·11 claims
- 1090US8182976B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted May 22, 2012·13 cites·16 claims
- 1187US9442371B2Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Sep 13, 2016·2 cites·17 claims
- 1287US8440385B2Positive resist composition, method of forming resist pattern and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted May 14, 2013·5 cites·16 claims
- 1385US8236477B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2009·Granted Aug 7, 2012·7 cites·8 claims
- 1482US8541529B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2012·Granted Sep 24, 2013·3 cites·6 claims
- 1581US8927191B2Resist composition, method of forming resist pattern and polymeric compoundTSUCHIYA JUNICHI·Filed 2012·Granted Jan 6, 2015·5 cites·9 claims
- 1681US8404428B2Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compoundMATSUMIYA TASUKU·Filed 2010·Granted Mar 26, 2013·3 cites·7 claims
- 1780US9366960B2Negative resist composition, method of forming resist pattern, and complexTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jun 14, 2016·2 cites·10 claims
- 1880US8642244B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2011·Granted Feb 4, 2014·3 cites·7 claims
- 1980US8232041B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 31, 2012·12 cites·10 claims
- 2079US7723007B2Polymer compound, photoresist composition including the polymer compound, and resist pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted May 25, 2010·5 cites·13 claims
- 2178US8846838B2Fluorine-containing block copolymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Sep 30, 2014·2 cites·1 claims
- 2276US9816003B2Method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Nov 14, 2017·2 cites·2 claims
- 2376US8475997B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compoundSHIONO DAIJU·Filed 2011·Granted Jul 2, 2013·2 cites·17 claims
- 2476US8088553B2Positive resist composition, method of forming resist pattern, and polymeric compoundSHIMIZU HIROAKI·Filed 2009·Granted Jan 3, 2012·4 cites·8 claims
- 2575US9499646B2Negative resist composition, method of forming resist pattern and complexTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Nov 22, 2016·1 cites·20 claims
- 2675US8778595B2Resist composition, method of forming resist pattern, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jul 15, 2014·2 cites·7 claims
- 2774US7604920B2Positive resist composition, method of forming resist pattern, polymeric compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Oct 20, 2009·10 cites·8 claims
- 2873US8980524B2Positive resist composition and method of forming resist patternHIRANO TOMOYUKI·Filed 2010·Granted Mar 17, 2015·2 cites·10 claims
- 2973US8632960B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2011·Granted Jan 21, 2014·2 cites·12 claims
- 3070US7919651B2Positive resist composition, method of forming resist pattern, polymeric compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Apr 5, 2011·0 cites·8 claims
- 3169US7862981B2Compound, positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 4, 2011·1 cites·8 claims
- 3267US8986919B2Resist composition, method of forming resist pattern and polymeric compoundTAKAKI DAICHI·Filed 2012·Granted Mar 24, 2015·2 cites·8 claims
- 3367US8487056B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2012·Granted Jul 16, 2013·4 cites·6 claims
- 3467US7851129B2Resist composition, resist pattern forming method and compoundTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 14, 2010·2 cites·5 claims
- 3563US9834696B2Undercoat agent and method of forming pattern of layer containing block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Dec 5, 2017·0 cites·7 claims
- 3662US8742038B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2009·Granted Jun 3, 2014·0 cites·28 claims
- 3762US8404426B2Negative resist composition, method of forming resist pattern and polymeric compoundABE SHO·Filed 2009·Granted Mar 26, 2013·1 cites·17 claims
- 3862US7923192B2Base material for pattern-forming material, positive resist composition and method of resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Apr 12, 2011·1 cites·20 claims
- 3961US9133102B2Resist composition, method of forming resist pattern and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Sep 15, 2015·0 cites·1 claims
- 4061US7901865B2Resist composition and process for formation of resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 8, 2011·1 cites·15 claims
- 4158US8021823B2Positive resist composition, method of forming resist pattern, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Sep 20, 2011·5 cites·6 claims
- 4258US2013243958A1Undercoat agent and method of forming pattern of layer containing block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 4355US9475088B2Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer compositionTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Oct 25, 2016·0 cites·2 claims
- 4453US8367296B2Positive resist composition, method of forming resist pattern, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Feb 5, 2013·0 cites·16 claims
- 4552US2015093507A1Method of producing structure containing phase-separated structure, and block copolymer compositionTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 4651US7943284B2Compound, dissolution inhibitor, positive type resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted May 17, 2011·0 cites·5 claims
- 4750US9023580B2Method of forming polymeric compound, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted May 5, 2015·0 cites·3 claims
- 4849US8304163B2Compound, dissolution inhibitor, positive type resist composition, and method of forming resist patternSHIONO DAIJU·Filed 2010·Granted Nov 6, 2012·0 cites·1 claims
- 4948US10066096B2Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Sep 4, 2018·0 cites·4 claims
- 5047US8911928B2Resist composition, method of forming resist pattern, polymeric compound and method of producing the sameHIRANO TOMOYUKI·Filed 2012·Granted Dec 16, 2014·0 cites·6 claims
Showing the top 50 of 70 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Daiju Shiono files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →