Inventor · disambiguated record
David Thompson
Also filed as: THOMPSON DAVID · THOMPSON DAVID M · THOMPSON DAVID MICHAEL
115 granted patents·38 pending applications·922 citations·filing 1980–2025
99Inventor score
Files withAPPLIED MATERIALS INC89XEROX CORP16THOMPSON DAVID M12PRAXAIR TECHNOLOGY INC9THOMPSON DAVID9
Top patents by PatentIndex Score
153 records- 0198US10083834B2Methods of forming self-aligned viasAPPLIED MATERIALS INC·Filed 2017·Granted Sep 25, 2018·64 cites·15 claims
- 0298US9449843B1Selectively etching metals and metal nitrides conformallyAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·399 cites·15 claims
- 0397US11028480B2Methods of protecting metallic components against corrosion using chromium-containing thin filmsAPPLIED MATERIALS INC·Filed 2019·Granted Jun 8, 2021·12 cites·20 claims
- 0496US9434155B1Method and system for printhead alignment based on print medium widthXEROX CORP·Filed 2015·Granted Sep 6, 2016·11 cites·24 claims
- 0595US11848229B2Selective blocking of metal surfaces using bifunctional self-assembled monolayersAPPLIED MATERIALS INC·Filed 2022·Granted Dec 19, 2023·3 cites·18 claims
- 0695US8821986B2Activated silicon precursors for low temperature depositionWEIDMAN TIMOTHY W·Filed 2012·Granted Sep 2, 2014·19 cites·20 claims
- 0794US10738008B2Nitrogen-containing ligands and their use in atomic layer deposition methodsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 11, 2020·3 cites·7 claims
- 0894US8628187B2Methods of forming images on substrates with ink partial-curing and contact leveling and apparatuses useful in forming images on substratesROOF BRYAN J·Filed 2010·Granted Jan 14, 2014·13 cites·16 claims
- 0993US9716012B2Methods of selective layer depositionAPPLIED MATERIALS INC·Filed 2014·Granted Jul 25, 2017·15 cites·18 claims
- 1093US9390940B2Methods of etching films comprising transition metalsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·13 cites·17 claims
- 1193US7538299B2Media conditioner moduleXEROX CORP·Filed 2006·Granted May 26, 2009·16 cites·20 claims
- 1291US10906925B2Ruthenium precursors for ALD and CVD thin film deposition and uses thereofAPPLIED MATERIALS INC·Filed 2020·Granted Feb 2, 2021·2 cites·8 claims
- 1391US10023958B2Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursorsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 17, 2018·4 cites·6 claims
- 1491US8153831B2Organometallic compounds, processes for the preparation thereof and methods of use thereofTHOMPSON DAVID M·Filed 2007·Granted Apr 10, 2012·13 cites·29 claims
- 1590US10577386B2Ruthenium precursors for ALD and CVD thin film deposition and uses thereofAPPLIED MATERIALS INC·Filed 2017·Granted Mar 3, 2020·2 cites·11 claims
- 1688US7956207B2Heteroleptic organometallic compoundsPRAXAIR TECHNOLOGY INC·Filed 2007·Granted Jun 7, 2011·9 cites·33 claims
- 1788US4411515AVery high speed duplicator with limitless finishing functionXEROX CORP·Filed 1982·Granted Oct 25, 1983·35 cites·4 claims
- 1887US11946135B2Low temperature deposition of iridium containing filmsAPPLIED MATERIALS INC·Filed 2023·Granted Apr 2, 2024·0 cites·14 claims
- 1987US9580799B2Nitrogen-containing ligands and their use in atomic layer deposition methodsAPPLIED MATERIALS INC·Filed 2013·Granted Feb 28, 2017·2 cites·7 claims
- 2087US8778816B2In situ vapor phase surface activation of SiO2SATO TATSUYA E·Filed 2011·Granted Jul 15, 2014·9 cites·19 claims
- 2187US2024200188A1Low temperature deposition of iridium containing filmsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2286US11028477B2Bottom-up gap-fill by surface poisoning treatmentAPPLIED MATERIALS INC·Filed 2016·Granted Jun 8, 2021·4 cites·15 claims
- 2386US9145612B2Deposition of N-metal films comprising aluminum alloysAPPLIED MATERIALS INC·Filed 2013·Granted Sep 29, 2015·3 cites·18 claims
- 2486US8408689B2Methods of adjusting gloss of images on substrates using ink partial-curing and contact leveling and apparatuses useful in forming images on substratesROOF BRYAN J·Filed 2010·Granted Apr 2, 2013·5 cites·24 claims
- 2585US11886120B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·1 cites·20 claims
- 2685US8927059B2Deposition of metal films using alane-based precursorsAPPLIED MATERIALS INC·Filed 2012·Granted Jan 6, 2015·6 cites·19 claims
- 2785US4358197AVery high speed duplicator with limitless finishing functionXEROX CORP·Filed 1980·Granted Nov 9, 1982·31 cites·5 claims
- 2884US12291779B2Methods of selective atomic layer depositionAPPLIED MATERIALS INC·Filed 2023·Granted May 6, 2025·0 cites·11 claims
- 2984US6884901B2Methods for making metallocene compoundsPRAXAIR TECHNOLOGY INC·Filed 2003·Granted Apr 26, 2005·26 cites·19 claims
- 3083US11562904B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·1 cites·6 claims
- 3183US8734902B2Precursors and methods for the atomic layer deposition of manganeseTHOMPSON DAVID·Filed 2012·Granted May 27, 2014·2 cites·20 claims
- 3282US7851360B2Organometallic precursors for seed/barrier processes and methods thereofINTEL CORP·Filed 2007·Granted Dec 14, 2010·9 cites·30 claims
- 3382US6985690B2Fuser and fixing members containing PEI-PDMS block copolymersXEROX CORP·Filed 2003·Granted Jan 10, 2006·20 cites·14 claims
- 3481US9048294B2Methods for depositing manganese and manganese nitridesAPPLIED MATERIALS INC·Filed 2013·Granted Jun 2, 2015·6 cites·18 claims
- 3581US7816550B2Processes for the production of organometallic compoundsPRAXAIR TECHNOLOGY INC·Filed 2005·Granted Oct 19, 2010·3 cites·9 claims
- 3681US2025230545A1Methods of selective atomic layer depositionAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3780US9328415B2Methods for the deposition of manganese-containing films using diazabutadiene-based precursorsAPPLIED MATERIALS INC·Filed 2014·Granted May 3, 2016·4 cites·20 claims
- 3880US8534824B2Methods of adjusting gloss of images locally on substrates using ink partial-curing and contact leveling and apparatuses useful in forming images on substratesROOF BRYAN J·Filed 2010·Granted Sep 17, 2013·3 cites·29 claims
- 3980US7667065B2High nucleation density organometallic compoundsPRAXAIR TECHNOLOGY INC·Filed 2006·Granted Feb 23, 2010·3 cites·20 claims
- 4080US5353107ARelease agent management controlXEROX CORP·Filed 1993·Granted Oct 4, 1994·27 cites·22 claims
- 4179US7973188B2Processes for the production of organometallic compoundsPRAXAIR TECHNOLOGY INC·Filed 2010·Granted Jul 5, 2011·1 cites·12 claims
- 4278US12281387B2Method of depositing metal filmsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 22, 2025·0 cites·5 claims
- 4378US7550385B2Amine-free deposition of metal-nitride filmsINTEL CORP·Filed 2005·Granted Jun 23, 2009·6 cites·10 claims
- 4478US2025250675A1Method of depositing metal filmsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4577US2023184119A1Methods of protecting metallic components against corrosion using chromium-containing thin filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4676US11894233B2Electronic device having an oxygen free platinum group metal filmAPPLIED MATERIALS INC·Filed 2022·Granted Feb 6, 2024·0 cites·9 claims
- 4776US11643721B2Low temperature deposition of iridium containing filmsAPPLIED MATERIALS INC·Filed 2018·Granted May 9, 2023·0 cites·10 claims
- 4876US2024047193A1Methods of Depositing SiCON with C, O, and N Compositional ControlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4976US2019316256A1Methods Of Selective Atomic Layer DepositionAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 5075US6919468B2Asymmetric group 8 (VIII) metallocene compoundsPRAXAIR TECHNOLOGY INC·Filed 2003·Granted Jul 19, 2005·14 cites·21 claims
Showing the top 50 of 153 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →