Inventor · disambiguated record
Dennis De Graaf
Also filed as: DE GRAAF DENNIS
12 granted patents·4 pending applications·19 citations·filing 2006–2024
86Inventor score
Top patents by PatentIndex Score
16 records- 0196US10571800B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2016·Granted Feb 25, 2020·9 cites·27 claims
- 0288US11635681B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2021·Granted Apr 25, 2023·1 cites·13 claims
- 0387US11320731B2Membrane for EUV lithographyASML NETHERLANDS BV·Filed 2016·Granted May 3, 2022·3 cites·22 claims
- 0483US11029595B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2019·Granted Jun 8, 2021·1 cites·19 claims
- 0580US11086213B2Mask assembly and associated methodsASML NETHERLANDS BV·Filed 2020·Granted Aug 10, 2021·1 cites·8 claims
- 0679US2024369920A1Method of manufacturing a membrane assemblyASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0775US8368040B2Radiation system and lithographic apparatusASML NETHERLANDS BV·Filed 2010·Granted Feb 5, 2013·4 cites·12 claims
- 0875US2024302736A1Pellicle for euv lithographyASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0969US11567399B2EUV pelliclesASML NETHERLANDS BV·Filed 2021·Granted Jan 31, 2023·0 cites·20 claims
- 1061US12072620B2Method of manufacturing a membrane assemblyASML NETHERLANDS BV·Filed 2019·Granted Aug 27, 2024·0 cites·20 claims
- 1159US11977326B2Pellicle for EUV lithographyASML NETHERLANDS BV·Filed 2019·Granted May 7, 2024·0 cites·20 claims
- 1257US11237475B2EUV pelliclesASML NETHERLANDS BV·Filed 2018·Granted Feb 1, 2022·0 cites·20 claims
- 1348US10095119B2Radiation source and method for lithographyASML NETHERLANDS BV·Filed 2013·Granted Oct 9, 2018·0 cites·26 claims
- 1448US2025004362A1Pellicle membraneASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1539US2008305942A1Oxynitride Armour GlassTNO·Filed 2006·Application pending·0 cites
- 1635US9192039B2Radiation sourceKEMPEN ANTONIUS THEODORUS WILHELMUS·Filed 2012·Granted Nov 17, 2015·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →