Inventor · disambiguated record
Diane Scott
Also filed as: SCOTT DIANE · SCOTT DIANE B
29 granted patents·8 pending applications·330 citations·filing 2001–2018
96Inventor score
Top patents by PatentIndex Score
37 records- 0197US9296085B2Polishing pad with homogeneous body having discrete protrusions thereonBAJAJ RAJEEV·Filed 2014·Granted Mar 29, 2016·32 cites·16 claims
- 0297US9211628B2Polishing pad with concentric or approximately concentric polygon groove patternALLISON WILLIAM C·Filed 2011·Granted Dec 15, 2015·21 cites·19 claims
- 0397US9067297B2Polishing pad with foundation layer and polishing surface layerALLISON WILLIAM C·Filed 2011·Granted Jun 30, 2015·31 cites·82 claims
- 0496US9017140B2CMP pad with local area transparencyALLISON WILLIAM·Filed 2010·Granted Apr 28, 2015·43 cites·13 claims
- 0596US8968058B2Polishing pad with alignment featureKERPRICH ROBERT·Filed 2011·Granted Mar 3, 2015·20 cites·16 claims
- 0696US8702479B2Polishing pad with multi-modal distribution of pore diametersHUANG PING·Filed 2010·Granted Apr 22, 2014·30 cites·42 claims
- 0795US9156124B2Soft polishing pad for polishing a semiconductor substrateALLISON WILLIAM·Filed 2010·Granted Oct 13, 2015·38 cites·28 claims
- 0895US9067298B2Polishing pad with grooved foundation layer and polishing surface layerLEFEVRE PAUL ANDRE·Filed 2011·Granted Jun 30, 2015·21 cites·28 claims
- 0994US8920219B2Polishing pad with alignment apertureALLISON WILLIAM C·Filed 2011·Granted Dec 30, 2014·13 cites·17 claims
- 1091US9649742B2Polishing pad having polishing surface with continuous protrusionsNEXPLANAR CORP·Filed 2013·Granted May 16, 2017·13 cites·22 claims
- 1191US9180570B2Grooved CMP padKERPRICH ROBERT·Filed 2009·Granted Nov 10, 2015·18 cites·19 claims
- 1288US9868185B2Polishing pad with foundation layer and window attached theretoCABOT MICROELECTRONICS CORP·Filed 2015·Granted Jan 16, 2018·3 cites·28 claims
- 1388US8439994B2Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detectionALLISON WILLIAM C·Filed 2010·Granted May 14, 2013·8 cites·24 claims
- 1483US6623337B2Base-pad for a polishing padRODEL INC·Filed 2001·Granted Sep 23, 2003·27 cites·10 claims
- 1582US10160092B2Polishing pad having polishing surface with continuous protrusions having tapered sidewallsNEXPLANAR CORP·Filed 2013·Granted Dec 25, 2018·5 cites·37 claims
- 1679US8628384B2Polishing pad for eddy current end-point detectionALLISON WILLIAM C·Filed 2010·Granted Jan 14, 2014·3 cites·11 claims
- 1772US9375823B2Grooved CMP padsKERPRICH ROBERT·Filed 2015·Granted Jun 28, 2016·1 cites·6 claims
- 1869US9597769B2Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layerLEFEVRE PAUL ANDRE·Filed 2012·Granted Mar 21, 2017·2 cites·59 claims
- 1966US8657653B2Homogeneous polishing pad for eddy current end-point detectionALLISON WILLIAM C·Filed 2010·Granted Feb 25, 2014·1 cites·12 claims
- 2062US9597770B2Method of fabricating a polishingNEXPLANAR CORP·Filed 2014·Granted Mar 21, 2017·0 cites·12 claims
- 2162US9028302B2Polishing pad for eddy current end-point detectionALLISON WILLIAM C·Filed 2013·Granted May 12, 2015·0 cites·10 claims
- 2261US9931728B2Polishing pad with foundation layer and polishing surface layerNEXPLANAR CORP·Filed 2015·Granted Apr 3, 2018·0 cites·23 claims
- 2360US9931729B2Polishing pad with grooved foundation layer and polishing surface layerNEXPLANAR CORP·Filed 2015·Granted Apr 3, 2018·0 cites·23 claims
- 2459US9249273B2Polishing pad with alignment featureKERPRICH ROBERT·Filed 2015·Granted Feb 2, 2016·0 cites·17 claims
- 2559US2015273656A1Polishing pad with foundation layer and polishing surface layerALLISON WILLIAM C·Filed 2015·Application pending·0 cites
- 2658US9597777B2Homogeneous polishing pad for eddy current end-point detectionNEXPLANAR CORP·Filed 2014·Granted Mar 21, 2017·0 cites·6 claims
- 2758US2016023322A1Polishing pad with concentric or approximately concentric polygon groove patternALLISON WILLIAM C·Filed 2015·Application pending·0 cites
- 2857US9555518B2Polishing pad with multi-modal distribution of pore diametersNEXPLANAR CORP·Filed 2014·Granted Jan 31, 2017·0 cites·13 claims
- 2957US2016144477A1Coated compressive subpad for chemical mechanical polishingSCOTT DIANE·Filed 2015·Application pending·0 cites
- 3056US11440158B2Coated compressive subpad for chemical mechanical polishingCABOT MICROELECTRONICS CORP·Filed 2018·Granted Sep 13, 2022·0 cites·10 claims
- 3154US10946495B2Low density polishing padNEXPLANAR CORP·Filed 2015·Granted Mar 16, 2021·0 cites·11 claims
- 3252US10293459B2Polishing pad having polishing surface with continuous protrusionsNEXPLANAR CORP·Filed 2017·Granted May 21, 2019·0 cites·23 claims
- 3352US2012302148A1Polishing pad with homogeneous body having discrete protrusions thereonBAJAJ RAJEEV·Filed 2011·Application pending·0 cites
- 3447US2015038066A1Low density polishing padNEXPLANAR CORP·Filed 2013·Application pending·0 cites
- 3545US2015343595A1Soft polishing pad for polishing a semiconductor substrateALLISON WILLIAM C·Filed 2015·Application pending·0 cites
- 3644US2014308261A1HLA-DR7 HY epitope and method for treating leukaemiaFRANÇAIS DU SANG ETS·Filed 2012·Application pending·0 cites
- 3739US2001031612A1Retention of a polishing pad on a platenFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →