Inventor · disambiguated record
Do-Haing Lee
Also filed as: LEE DO HAING
19 granted patents·4 pending applications·533 citations·filing 2001–2023
94Inventor score
Files withSAMSUNG ELECTRONICS CO LTD11UNIV SUNGKYUNKWAN5LEE DO-HAING2UNIV SUNGKYUNKWAN FOUND2JEONG SOO-YEON1
Top patents by PatentIndex Score
23 records- 0195US7919142B2Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the sameUNIV SUNGKYUNKWAN FOUND·Filed 2006·Granted Apr 5, 2011·426 cites·9 claims
- 0292US7564042B2Ion beam apparatus having plasma sheath controllerSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jul 21, 2009·18 cites·28 claims
- 0384US10879244B2Integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 29, 2020·3 cites·20 claims
- 0484US9401359B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jul 26, 2016·6 cites·20 claims
- 0584US8900944B2Methods of manufacturing a semiconductor deviceJEONG SOO-YEON·Filed 2011·Granted Dec 2, 2014·8 cites·20 claims
- 0684US7629589B2Apparatus and method for controlling ion beamSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Dec 8, 2009·7 cites·30 claims
- 0783US9293343B2Method of forming patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Mar 22, 2016·4 cites·20 claims
- 0882US11848364B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Dec 19, 2023·1 cites·20 claims
- 0981US7858464B2Methods of manufacturing non-volatile memory devices having insulating layers treated using neutral beam irradiationSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Dec 28, 2010·7 cites·17 claims
- 1074US6926799B2Etching apparatus using neutral beamUNIV SUNGKYUNKWAN·Filed 2002·Granted Aug 9, 2005·19 cites·11 claims
- 1169US11776962B2Method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Oct 3, 2023·0 cites·18 claims
- 1268US2024072140A1Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1365US6933495B13-grid neutral beam source used for etching semiconductor deviceUNIV SUNGKYUNKWAN·Filed 2004·Granted Aug 23, 2005·14 cites·8 claims
- 1463US11329044B2Integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 10, 2022·0 cites·20 claims
- 1560US8450680B2Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate supportLEE DO-HAING·Filed 2011·Granted May 28, 2013·1 cites·7 claims
- 1658US7094702B2Layer-by-layer etching apparatus using neutral beam and method of etching using the sameUNIV SUNGKYUNKWAN·Filed 2003·Granted Aug 22, 2006·6 cites·11 claims
- 1756US7060931B2Neutral beam source having electromagnet used for etching semiconductor deviceUNIV SUNGKYUNKWAN·Filed 2004·Granted Jun 13, 2006·7 cites·8 claims
- 1856US2011162581A1Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the sameUNIV SUNGKYUNKWAN FOUND·Filed 2011·Application pending·0 cites
- 1955US8318412B2Method of manufacturing semiconductor deviceKEN TOKASHIKI·Filed 2010·Granted Nov 27, 2012·1 cites·11 claims
- 2055US6874443B2Layer-by-layer etching apparatus using neutral beam and etching method using the sameUNIV SUNGKYUNKWAN·Filed 2002·Granted Apr 5, 2005·5 cites·7 claims
- 2155US2024355637A1Method for fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2251US8089042B2Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate supportLEE DO-HAING·Filed 2008·Granted Jan 3, 2012·0 cites·8 claims
- 2339US2002060201A1Method of etching semiconductor device using neutral beam and apparatus for etching the sameFiled 2001·Application pending·0 cites
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