Inventor · disambiguated record
Dongqing Li
Also filed as: LI DONGQING · LI DONGQING KAREN
27 granted patents·8 pending applications·2,145 citations·filing 2001–2020
97Inventor score
Files withAPPLIED MATERIALS INC22BOE TECHNOLOGY GROUP CO LTD3LI DONGQING3INSTANTLABS MEDICAL DIAGNOSTIC2UNIV VANDERBILT2
Top patents by PatentIndex Score
35 records- 0198US6929700B2Hydrogen assisted undoped silicon oxide deposition process for HDP-CVDAPPLIED MATERIALS INC·Filed 2003·Granted Aug 16, 2005·482 cites·18 claims
- 0298US6908862B2HDP-CVD dep/etch/dep process for improved deposition into high aspect ratio featuresAPPLIED MATERIALS INC·Filed 2002·Granted Jun 21, 2005·277 cites·23 claims
- 0398US6596653B2Hydrogen assisted undoped silicon oxide deposition process for HDP-CVDAPPLIED MATERIALS INC·Filed 2001·Granted Jul 22, 2003·542 cites·29 claims
- 0497US8318584B2Oxide-rich liner layer for flowable CVD gapfillLI DONGQING·Filed 2011·Granted Nov 27, 2012·365 cites·15 claims
- 0596US8563445B2Conformal layers by radical-component CVDLIANG JINGMEI·Filed 2011·Granted Oct 22, 2013·49 cites·22 claims
- 0696US7081414B2Deposition-selective etch-deposition process for dielectric film gapfillAPPLIED MATERIALS INC·Filed 2003·Granted Jul 25, 2006·98 cites·9 claims
- 0796US6903031B2In-situ-etch-assisted HDP deposition using SiF4 and hydrogenAPPLIED MATERIALS INC·Filed 2003·Granted Jun 7, 2005·111 cites·26 claims
- 0894US7465680B2Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2APPLIED MATERIALS INC·Filed 2005·Granted Dec 16, 2008·28 cites·24 claims
- 0994US6740601B2HDP-CVD deposition process for filling high aspect ratio gapsAPPLIED MATERIALS INC·Filed 2001·Granted May 25, 2004·53 cites·39 claims
- 1093US7569382B2Disposable reactor module and detection systemINSTANTLABS MEDICAL DIAGNOSTIC·Filed 2006·Granted Aug 4, 2009·42 cites·34 claims
- 1192US10428426B2Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetimeAPPLIED MATERIALS INC·Filed 2017·Granted Oct 1, 2019·9 cites·20 claims
- 1292US8188438B2Electrokinetic microfluidic flow cytometer apparatuses with differential resistive particle counting and optical sortingLI DONGQING·Filed 2010·Granted May 29, 2012·26 cites·34 claims
- 1386US7196021B2HDP-CVD deposition process for filling high aspect ratio gapsAPPLIED MATERIALS INC·Filed 2005·Granted Mar 27, 2007·5 cites·14 claims
- 1482US7049211B2In-situ-etch-assisted HDP deposition using SiF4APPLIED MATERIALS INC·Filed 2005·Granted May 23, 2006·6 cites·12 claims
- 1579US7294588B2In-situ-etch-assisted HDP depositionAPPLIED MATERIALS INC·Filed 2006·Granted Nov 13, 2007·5 cites·13 claims
- 1678US8963095B2Electrokinetic microfluidic flow cytometer apparatuses with differential resistive particle counting and optical sortingDIAGNOSTIC CHIPS LLC·Filed 2013·Granted Feb 24, 2015·4 cites·26 claims
- 1777US7799698B2Deposition-selective etch-deposition process for dielectric film gapfillAPPLIED MATERIALS INC·Filed 2006·Granted Sep 21, 2010·4 cites·19 claims
- 1876US7745351B2Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2APPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·4 cites·20 claims
- 1976US6682603B2Substrate support with extended radio frequency electrode upper surfaceAPPLIED MATERIALS INC·Filed 2002·Granted Jan 27, 2004·21 cites·17 claims
- 2074US7691753B2Deposition-selective etch-deposition process for dielectric film gapfillAPPLIED MATERIALS INC·Filed 2006·Granted Apr 6, 2010·3 cites·18 claims
- 2171US6914016B2HDP-CVD deposition process for filling high aspect ratio gapsAPPLIED MATERIALS INC·Filed 2004·Granted Jul 5, 2005·8 cites·31 claims
- 2270US7795014B2Disposable reactor module and detection systemINSTANTLABS MEDICAL DIAGNOSTIC·Filed 2009·Granted Sep 14, 2010·2 cites·18 claims
- 2362US10120215B2Apparatus for carrying substrate by off-line vacuum suction and method for transporting substrateBOE TECHNOLOGY GROUP CO LTD·Filed 2015·Granted Nov 6, 2018·1 cites·12 claims
- 2458US11469100B2Methods of post treating dielectric films with microwave radiationAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·0 cites·8 claims
- 2555US10934620B2Integration of dual remote plasmas sources for flowable CVDAPPLIED MATERIALS INC·Filed 2017·Granted Mar 2, 2021·0 cites·15 claims
- 2652US2014329027A1Low temperature flowable curing for stress accommodationAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2751US10138547B2Substrate carrying apparatus and sputtering device comprising the sameBOE TECHNOLOGY GROUP CO LTD·Filed 2016·Granted Nov 27, 2018·0 cites·14 claims
- 2849US2012177846A1Radical steam cvdLI DONGQING·Filed 2011·Application pending·0 cites
- 2947US2008070311A1Microfluidic flow cytometer and applications of sameUNIV VANDERBILT·Filed 2006·Application pending·0 cites
- 3047US2008067068A1DC-dielectrophoresis microfluidic apparatus, and applications of sameUNIV VANDERBILT·Filed 2006·Application pending·0 cites
- 3145US2016079034A1Flowable film properties tuning using implantationAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3244US10072051B2Anti-inflammatory lipopeptide and preparing method and application thereofUNIV EAST CHINA NORMAL·Filed 2012·Granted Sep 11, 2018·0 cites·6 claims
- 3337US2018230597A1Method and apparatus of remote plasmas flowable cvd chamberAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 3436US2005136684A1Gap-fill techniquesAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 3531US2018158715A1Substrate supporting pin, substrate supporting device and substrate access systemBOE TECHNOLOGY GROUP CO LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →