Inventor · disambiguated record
Dongjiang Wang
Also filed as: WANG DONGJIANG
8 granted patents·1 pending application·21 citations·filing 2011–2024
80Inventor score
Files withSEMICONDUCTOR MFG INT SHANGHAI2ZHANG HAIYANG2APPLIED MATERIALS INC1HU MINDA1SEMICONDUCTOR MFG INT BEIJING1
Top patents by PatentIndex Score
9 records- 0183US9111874B2Semiconductor structures and fabrication method thereofSEMICONDUCTOR MFG INT BEIJING·Filed 2014·Granted Aug 18, 2015·7 cites·20 claims
- 0282US8716151B2Method of fabricating semiconductor devicesZHANG HAIYANG·Filed 2011·Granted May 6, 2014·7 cites·25 claims
- 0377US8859358B2CMOS transistors, fin field-effect transistors and fabrication methods thereofSEMICONDUCTOR MFG INT CORP·Filed 2013·Granted Oct 14, 2014·5 cites·20 claims
- 0463US2025391644A1Insulated Dual Liner for Plasma Processing ChamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0561US8664122B2Method of fabricating a semiconductor deviceHU MINDA·Filed 2011·Granted Mar 4, 2014·2 cites·22 claims
- 0646US9087788B2Shallow trench and fabrication methodSEMICONDUCTOR MFG INT SHANGHAI·Filed 2013·Granted Jul 21, 2015·0 cites·18 claims
- 0740US9111942B2Local interconnect structure and fabrication methodSEMICONDUCTOR MFG INT SHANGHAI·Filed 2013·Granted Aug 18, 2015·0 cites·20 claims
- 0837US9064819B2Post-etch treating methodZHANG HAIYANG·Filed 2011·Granted Jun 23, 2015·0 cites·20 claims
- 0930US8445376B2Post-etching treatment process for copper interconnecting wiresWANG DONGJIANG·Filed 2011·Granted May 21, 2013·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →