Inventor · disambiguated record
Dongyue Yang
Also filed as: YANG DONGYUE
9 granted patents·1 pending application·26 citations·filing 2018–2024
83Inventor score
Files withGLOBALFOUNDRIES INC7BEIJING ZITIAO NETWORK TECHNOLOGY CO LTD1GLOBALFOUNDRIES US INC1KLA CORP1
Top patents by PatentIndex Score
10 records- 0193US10705435B2Self-referencing and self-calibrating interference pattern overlay measurementGLOBALFOUNDRIES INC·Filed 2018·Granted Jul 7, 2020·8 cites·18 claims
- 0292US11675277B2Self-referencing and self-calibrating interference pattern overlay measurementKLA CORP·Filed 2021·Granted Jun 13, 2023·2 cites·40 claims
- 0391US10635007B1Apparatus and method for aligning integrated circuit layers using multiple grating materialsGLOBALFOUNDRIES INC·Filed 2018·Granted Apr 28, 2020·11 cites·16 claims
- 0479US10707175B2Asymmetric overlay mark for overlay measurementGLOBALFOUNDRIES INC·Filed 2018·Granted Jul 7, 2020·3 cites·19 claims
- 0575US10733354B2System and method employing three-dimensional (3D) emulation of in-kerf optical macrosGLOBALFOUNDRIES INC·Filed 2018·Granted Aug 4, 2020·2 cites·20 claims
- 0668US11231654B2Self-referencing and self-calibrating interference pattern overlay measurementGLOBALFOUNDRIES US INC·Filed 2020·Granted Jan 25, 2022·0 cites·19 claims
- 0753US10833022B2Structure and method to improve overlay performance in semiconductor devicesGLOBALFOUNDRIES INC·Filed 2019·Granted Nov 10, 2020·0 cites·6 claims
- 0851US10809633B1Overlay control with corrections for lens aberrationsGLOBALFOUNDRIES INC·Filed 2019·Granted Oct 20, 2020·0 cites·4 claims
- 0950US10504851B2Structure and method to improve overlay performance in semiconductor devicesGLOBALFOUNDRIES INC·Filed 2018·Granted Dec 10, 2019·0 cites·20 claims
- 1047US2025039553A1Method, apparatus, electronic device, and storage medium for determining exposure parameterBEIJING ZITIAO NETWORK TECHNOLOGY CO LTD·Filed 2024·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →