Inventor · disambiguated record
Earl Jensen
Also filed as: JENSEN EARL · JENSEN EARL M
35 granted patents·4 pending applications·1,011 citations·filing 1984–2024
98Inventor score
Top patents by PatentIndex Score
39 records- 0194US10460966B2Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applicationsKLA TENCOR CORP·Filed 2016·Granted Oct 29, 2019·13 cites·46 claims
- 0294US6010538AIn situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication linkLUXTRON CORP·Filed 1996·Granted Jan 4, 2000·216 cites·44 claims
- 0393US7855549B2Integrated process condition sensing wafer and data analysis systemKLA TENCOR CORP·Filed 2006·Granted Dec 21, 2010·23 cites·4 claims
- 0493US7135852B2Integrated process condition sensing wafer and data analysis systemSENSARRAY CORP·Filed 2004·Granted Nov 14, 2006·79 cites·31 claims
- 0593US4926227ASensor devices with internal packaged coolersNANOMETRICS INC·Filed 1986·Granted May 15, 1990·112 cites·2 claims
- 0692US5107445AModular luminescence-based measuring system using fast digital signal processingLUXTRON CORP·Filed 1990·Granted Apr 21, 1992·89 cites·22 claims
- 0790US7540188B2Process condition measuring device with shieldingWIESE LYNN KARL·Filed 2006·Granted Jun 2, 2009·18 cites·11 claims
- 0890US7151366B2Integrated process condition sensing wafer and data analysis systemSENSARRAY CORP·Filed 2003·Granted Dec 19, 2006·54 cites·25 claims
- 0987US7149643B2Integrated process condition sensing wafer and data analysis systemSENSARRAY CORP·Filed 2005·Granted Dec 12, 2006·15 cites·12 claims
- 1086US9222842B2High temperature sensor wafer for in-situ measurements in active plasmaSUN MEI·Filed 2013·Granted Dec 29, 2015·9 cites·57 claims
- 1185US8889021B2Process condition sensing device and method for plasma chamberJENSEN EARL·Filed 2010·Granted Nov 18, 2014·6 cites·11 claims
- 1284US5351268AModular luminescence-based measuring system using fast digital signal processingLUXTRON CORP·Filed 1991·Granted Sep 27, 1994·51 cites·17 claims
- 1382US9823121B2Method and system for measuring radiation and temperature exposure of wafers along a fabrication process lineKLA TENCOR CORP·Filed 2015·Granted Nov 21, 2017·3 cites·52 claims
- 1482US5717608AElectro-optical board assembly for measuring the temperature of an object surface from infra-red emissions thereof, including an automatic gain control thereforeLUXTRON CORP·Filed 1994·Granted Feb 10, 1998·47 cites·23 claims
- 1580US9964440B2Wafer level spectrometerKLA TENCOR CORP·Filed 2015·Granted May 8, 2018·2 cites·32 claims
- 1680US7555948B2Process condition measuring device with shieldingWIESE LYNN KARL·Filed 2006·Granted Jul 7, 2009·10 cites·9 claims
- 1779US9356822B2Automated interface apparatus and method for use in semiconductor wafer handling systemsJENSEN EARL·Filed 2012·Granted May 31, 2016·10 cites·31 claims
- 1878US9304160B1Defect inspection apparatus, system, and methodJENSEN EARL·Filed 2013·Granted Apr 5, 2016·4 cites·23 claims
- 1977US9719867B2Method and system for measuring heat fluxKLA TENCOR CORP·Filed 2014·Granted Aug 1, 2017·5 cites·25 claims
- 2074US10777393B2Process condition sensing device and method for plasma chamberKLA TENCOR CORP·Filed 2017·Granted Sep 15, 2020·1 cites·13 claims
- 2173US10215626B2Method and system for measuring radiation and temperature exposure of wafers along a fabrication process lineKLA TENCOR CORP·Filed 2017·Granted Feb 26, 2019·1 cites·23 claims
- 2272US9620400B2Position sensitive substrate deviceKLA TENCOR CORP·Filed 2014·Granted Apr 11, 2017·2 cites·43 claims
- 2372US5897610AElectro optical board assembly for measuring the temperature of an object surface from infra red emissions thereof including an automatic gain control thereforeLUXTRON CORP·Filed 1997·Granted Apr 27, 1999·35 cites·1 claims
- 2471US6729394B1Method of producing a communicating horizontal well networkBP CORP NORTH AMERICA INC·Filed 1997·Granted May 4, 2004·73 cites·17 claims
- 2570US9360302B2Film thickness monitorJENSEN EARL·Filed 2012·Granted Jun 7, 2016·3 cites·18 claims
- 2669US9140604B2Wafer level spectrometerJENSEN EARL·Filed 2012·Granted Sep 22, 2015·2 cites·32 claims
- 2768US2025137844A1Metrology method of calibrating and monitoring radiation in euv lithographic systemsKLA CORP·Filed 2024·Application pending·0 cites
- 2867US5470155AApparatus and method for measuring temperatures at a plurality of locations using luminescent-type temperature sensors which are excited in a time sequenceLUXTRON CORP·Filed 1993·Granted Nov 28, 1995·25 cites·9 claims
- 2966US9134186B2Process condition measuring device (PCMD) and method for measuring process conditions in a workpiece processing tool configured to process production workpiecesSUN MEI·Filed 2011·Granted Sep 15, 2015·2 cites·52 claims
- 3066US5771973ASingle well vapor extraction processAMOCO CORP·Filed 1996·Granted Jun 30, 1998·64 cites·48 claims
- 3160US9305753B2Thickness change monitor wafer for in situ film thickness monitoringKLA TENCOR CORP·Filed 2014·Granted Apr 5, 2016·1 cites·26 claims
- 3258US11823925B2Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applicationsKLA TENCOR CORP·Filed 2019·Granted Nov 21, 2023·0 cites·38 claims
- 3357US4604020AIntegrated circuit wafer handling systemNANOMETRICS INC·Filed 1984·Granted Aug 5, 1986·21 cites·3 claims
- 3455US2015020972A1Process condition sensing device and method for plasma chamberKLA TENCOR CORP·Filed 2014·Application pending·0 cites
- 3554US11668601B2Instrumented substrate apparatusKLA CORP·Filed 2021·Granted Jun 6, 2023·0 cites·35 claims
- 3654US10900843B2In-situ temperature sensing substrate, system, and methodKLA TENCOR CORP·Filed 2018·Granted Jan 26, 2021·0 cites·27 claims
- 3754US2025087450A1Optics for In-Situ Scanning Electron Microscope RepairKLA CORP·Filed 2023·Application pending·0 cites
- 3854US2024274401A1Substrate position monitoring devicesKLA CORP·Filed 2024·Application pending·0 cites
- 3949US5600147ATemperature measuring system having improved signal processing and multiple optical sensorsLUXTRON CORP·Filed 1995·Granted Feb 4, 1997·15 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →