Inventor · disambiguated record
Easwar Srinivasan
Also filed as: SRINIVASAN EASWAR
34 granted patents·9 pending applications·2,367 citations·filing 2004–2024
98Inventor score
Files withLAM RES CORP24NOVELLUS SYSTEMS INC14MEINHOLD HENNER2BANDYOPADHYAY ANANDA K1HAUSMANN DENNIS1
Top patents by PatentIndex Score
43 records- 0199US10870922B2Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2020·Granted Dec 22, 2020·6 cites·13 claims
- 0299US10121689B2Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2018·Granted Nov 6, 2018·43 cites·22 claims
- 0398US11056380B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2020·Granted Jul 6, 2021·4 cites·13 claims
- 0498US9960068B1Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2016·Granted May 1, 2018·26 cites·25 claims
- 0598US9892956B1Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2016·Granted Feb 13, 2018·28 cites·6 claims
- 0698US9070555B2Method for depositing a chlorine-free conformal sin filmNOVELLUS SYSTEMS INC·Filed 2013·Granted Jun 30, 2015·31 cites·19 claims
- 0798US7906174B1PECVD methods for producing ultra low-k dielectric films using UV treatmentNOVELLUS SYSTEMS INC·Filed 2006·Granted Mar 15, 2011·507 cites·23 claims
- 0898US7265061B1Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical propertiesNOVELLUS SYSTEMS INC·Filed 2004·Granted Sep 4, 2007·632 cites·38 claims
- 0997US9670579B2Method for depositing a chlorine-free conformal SiN filmNOVELLUS SYSTEMS INC·Filed 2015·Granted Jun 6, 2017·18 cites·20 claims
- 1097US8728956B2Plasma activated conformal film depositionLAVOIE ADRIEN·Filed 2011·Granted May 20, 2014·541 cites·39 claims
- 1196US10699937B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2019·Granted Jun 30, 2020·8 cites·20 claims
- 1296US10221484B2Temperature controlled showerheadNOVELLUS SYSTEMS INC·Filed 2016·Granted Mar 5, 2019·9 cites·20 claims
- 1396US10020220B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2017·Granted Jul 10, 2018·9 cites·19 claims
- 1496US9476120B2Temperature controlled showerheadNOVELLUS SYSTEMS INC·Filed 2014·Granted Oct 25, 2016·17 cites·20 claims
- 1596US9230800B2Plasma activated conformal film depositionNOVELLUS SYSTEMS INC·Filed 2014·Granted Jan 5, 2016·41 cites·22 claims
- 1696US8592328B2Method for depositing a chlorine-free conformal sin filmHAUSMANN DENNIS·Filed 2012·Granted Nov 26, 2013·111 cites·20 claims
- 1796US7611757B1Method to improve mechanical strength of low-K dielectric film using modulated UV exposureNOVELLUS SYSTEMS INC·Filed 2007·Granted Nov 3, 2009·39 cites·20 claims
- 1895US11387136B2Pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2020·Granted Jul 12, 2022·3 cites·16 claims
- 1995US10584415B2Temperature controlled showerheadNOVELLUS SYSTEMS INC·Filed 2019·Granted Mar 10, 2020·5 cites·20 claims
- 2095US8137467B2Temperature controlled showerheadMEINHOLD HENNER·Filed 2007·Granted Mar 20, 2012·60 cites·27 claims
- 2195US7253125B1Method to improve mechanical strength of low-k dielectric film using modulated UV exposureNOVELLUS SYSTEMS INC·Filed 2004·Granted Aug 7, 2007·82 cites·32 claims
- 2294US8673080B2Temperature controlled showerheadMEINHOLD HENNER·Filed 2008·Granted Mar 18, 2014·36 cites·18 claims
- 2393US10354909B2Wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2018·Granted Jul 16, 2019·5 cites·22 claims
- 2493US8043667B1Method to improve mechanical strength of low-K dielectric film using modulated UV exposureNOVELLUS SYSTEMS INC·Filed 2009·Granted Oct 25, 2011·18 cites·17 claims
- 2592US11183400B2Progressive heating of components of substrate processing systems using TCR element-based heatersLAM RES CORP·Filed 2018·Granted Nov 23, 2021·5 cites·10 claims
- 2689US10570515B2Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2018·Granted Feb 25, 2020·3 cites·20 claims
- 2788US7622400B1Method for improving mechanical properties of low dielectric constant materialsNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 24, 2009·42 cites·28 claims
- 2887US8715788B1Method to improve mechanical strength of low-K dielectric film using modulated UV exposureBANDYOPADHYAY ANANDA K·Filed 2011·Granted May 6, 2014·9 cites·18 claims
- 2986US10573549B2Pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2016·Granted Feb 25, 2020·3 cites·25 claims
- 3082US10872747B2Controlling showerhead heating via resistive thermal measurementsLAM RES CORP·Filed 2018·Granted Dec 22, 2020·4 cites·25 claims
- 3180US2024395569A1Progressive heating of components of substrate processing systems using tcr element-based heatersLAM RES CORP·Filed 2024·Application pending·0 cites
- 3277US11955366B2Pad raising mechanism in wafer positioning pedestal for semiconductor processingLAM RES CORP·Filed 2022·Granted Apr 9, 2024·0 cites·20 claims
- 3374US12062554B2Progressive heating of components of substrate processing systems using TCR element-based heatersLAM RES CORP·Filed 2021·Granted Aug 13, 2024·0 cites·7 claims
- 3473US7695765B1Methods for producing low-stress carbon-doped oxide films with improved integration propertiesNOVELLUS SYSTEMS INC·Filed 2004·Granted Apr 13, 2010·22 cites·45 claims
- 3565US2025096036A1Selective deposition of graphene on cobalt-capped copper dual damascene interconnectLAM RES CORP·Filed 2022·Application pending·0 cites
- 3663US2024213159A1Graphene-capped copper in dual damascene interconnectLAM RES CORP·Filed 2022·Application pending·0 cites
- 3755US2025069882A1Silicon nitride depositionLAM RES CORP·Filed 2022·Application pending·0 cites
- 3855US2024410053A1Conformal silicon oxide deposition using aminosilane and chlorosilane precursorsLAM RES CORP·Filed 2022·Application pending·0 cites
- 3954US2025285858A1Single wafer reactor, low temperature, thermal silicon nitride depositionLAM RES CORP·Filed 2023·Application pending·0 cites
- 4054US2009095218A1Temperature controlled showerheadNOVELLUS SYSTEMS INC·Filed 2007·Application pending·0 cites
- 4153US2025014890A1Conformal, carbon-doped silicon nitride films and methods thereofLAM RES CORP·Filed 2022·Application pending·0 cites
- 4251US2024387226A1Remote plasma deposition with electrostatic clampingLAM RES CORP·Filed 2022·Application pending·0 cites
- 4345US12209310B2Concentration control using a bubblerLAM RES CORP·Filed 2021·Granted Jan 28, 2025·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →