Inventor · disambiguated record
Edward P. Hammond, Iv
Also filed as: HAMMOND EDWARD · HAMMOND EDWARD P · HAMMOND EDWARD P IV · HAMMOND IV EDWARD P
34 granted patents·38 pending applications·496 citations·filing 1986–2024
97Inventor score
Files withAPPLIED MATERIALS INC52APPLIED DESIGN & ENG LTD4BELEN RODOLFO P3PROCTER & GAMBLE3HAMMOND IV EDWARD P2
Top patents by PatentIndex Score
72 records- 0197US7264688B1Plasma reactor apparatus with independent capacitive and toroidal plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Granted Sep 4, 2007·73 cites·16 claims
- 0296US7645357B2Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequencyAPPLIED MATERIALS INC·Filed 2006·Granted Jan 12, 2010·40 cites·12 claims
- 0394US5174658ASelf-expanding and reclosable flexible pouchPROCTER & GAMBLE·Filed 1991·Granted Dec 29, 1992·140 cites·16 claims
- 0493US7780864B2Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distributionAPPLIED MATERIALS INC·Filed 2006·Granted Aug 24, 2010·21 cites·17 claims
- 0592US7674394B2Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distributionAPPLIED MATERIALS INC·Filed 2007·Granted Mar 9, 2010·17 cites·21 claims
- 0690US7686926B2Multi-step process for forming a metal barrier in a sputter reactorAPPLIED MATERIALS INC·Filed 2005·Granted Mar 30, 2010·16 cites·11 claims
- 0789US8066895B2Method to control uniformity using tri-zone showerheadBELEN RODOLFO P·Filed 2008·Granted Nov 29, 2011·18 cites·23 claims
- 0887US5184896ASelf-expanding flexible pouch including improved extensible stay to maximize openingPROCTER & GAMBLE·Filed 1991·Granted Feb 9, 1993·90 cites·20 claims
- 0983US8236133B2Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension biasKATZ DAN·Filed 2008·Granted Aug 7, 2012·13 cites·9 claims
- 1080US10748797B2Plasma parameters and skew characterization by high speed imagingAPPLIED MATERIALS INC·Filed 2018·Granted Aug 18, 2020·2 cites·10 claims
- 1180US8871064B2Electromagnet array in a sputter reactorGUNG TZA-JING·Filed 2010·Granted Oct 28, 2014·6 cites·6 claims
- 1279US11699602B2Substrate support assemblies and componentsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·1 cites·5 claims
- 1379US7727413B2Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion densityAPPLIED MATERIALS INC·Filed 2006·Granted Jun 1, 2010·5 cites·14 claims
- 1473US9265359B2Refrigerated display appliancesWOOD IAN·Filed 2011·Granted Feb 23, 2016·10 cites·23 claims
- 1573US2022403520A1Ground path systems for providing a shorter and symmetrical ground pathAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1673US2025022709A1Plasma-enhanced chemical vapor deposition of carbon hard-maskAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1772US10109462B2Dual radio-frequency tuner for process control of a plasma processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 23, 2018·1 cites·20 claims
- 1871US4708630AApparatus for labeling blow-molded articles by placing label directly on the parisonPROCTER & GAMBLE·Filed 1986·Granted Nov 24, 1987·29 cites·12 claims
- 1971US2023170190A1Rf grounding configuration for pedestalsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2069US9788666B2Refrigerated display appliancesAPPLIED DESIGN & ENG LTD·Filed 2014·Granted Oct 17, 2017·6 cites·34 claims
- 2167US11545376B2Plasma parameters and skew characterization by high speed imagingAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·0 cites·20 claims
- 2267US9775448B2Refrigerated display appliancesAPPLIED DESIGN & ENG LTD·Filed 2016·Granted Oct 3, 2017·3 cites·28 claims
- 2366US2018119281A1Anti-arc zero field plateAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2464US10219638B2Refrigerated display appliancesAPPLIED DESIGN & ENG LTD·Filed 2014·Granted Mar 5, 2019·4 cites·29 claims
- 2562US10923334B2Selective deposition of hardmaskAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·0 cites·23 claims
- 2662US2025385075A1Splitter circuit for wafer processing systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2761US9850576B2Anti-arc zero field plateBAEK JONGHOON·Filed 2010·Granted Dec 26, 2017·0 cites·12 claims
- 2861US2025385074A1Radio frequency matching networkAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2961US2021296144A1Substrate support pedestal having plasma confinement featuresAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3060US11569072B2RF grounding configuration for pedestalsAPPLIED MATERIALS INC·Filed 2019·Granted Jan 31, 2023·0 cites·19 claims
- 3160US2025246470A1Semiconductor substrate chucking sensorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3259US2025201538A1Esc design with enhanced tunability for wafer far edge plasma profile controlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3358US12136549B2Plasma-enhanced chemical vapor deposition of carbon hard-maskAPPLIED MATERIALS INC·Filed 2019·Granted Nov 5, 2024·0 cites·20 claims
- 3458US12136536B2Electrostatic chuck with multiple radio frequency meshes to control plasma uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Nov 5, 2024·0 cites·24 claims
- 3558US10395893B2Dual-feed tunable plasma sourceAPPLIED MATERIALS INC·Filed 2017·Granted Aug 27, 2019·0 cites·18 claims
- 3658US2008193673A1Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrodeAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 3758US2008178805A1Mid-chamber gas distribution plate, tuned plasma flow control grid and electrodeAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 3858US2025308968A1Arc reduction using unreferenced floating power suppliesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3957US2025116001A1Arc reduction and rf control for electrostatic chucks in semiconductor processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4056US8017526B2Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch processAPPLIED MATERIALS INC·Filed 2007·Granted Sep 13, 2011·1 cites·17 claims
- 4155US2024249924A1Bipolar electrostatic chuck electrode designsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4254US11361940B2Push-pull power supply for multi-mesh processing chambersAPPLIED MATERIALS INC·Filed 2020·Granted Jun 14, 2022·0 cites·20 claims
- 4353US12094748B2Bipolar esc with balanced RF impedanceAPPLIED MATERIALS INC·Filed 2021·Granted Sep 17, 2024·0 cites·19 claims
- 4453US2009221150A1Etch rate and critical dimension uniformity by selection of focus ring materialAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4553US2019378696A1Apparatus for suppressing parasitic plasma in plasma enhanced chemical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4652US11908662B2Device and method for tuning plasma distribution using phase controlAPPLIED MATERIALS INC·Filed 2019·Granted Feb 20, 2024·0 cites·14 claims
- 4752US11776835B2Power supply signal conditioning for an electrostatic chuckAPPLIED MATERIALS INC·Filed 2020·Granted Oct 3, 2023·0 cites·20 claims
- 4852US11434569B2Ground path systems for providing a shorter and symmetrical ground pathAPPLIED MATERIALS INC·Filed 2019·Granted Sep 6, 2022·0 cites·20 claims
- 4951US2013273262A1Static deposition profile modulation for linear plasma sourceVELLAIKAL MANOJ·Filed 2012·Application pending·0 cites
- 5051US2009236447A1Method and apparatus for controlling gas injection in process chamberAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
Showing the top 50 of 72 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →