Inventor · disambiguated record
Edward L. Sill
Also filed as: SILL EDWARD L
12 granted patents·382 citations·filing 1987–2002
93Inventor score
Top patents by PatentIndex Score
12 records- 0196US6367413B1Apparatus for monitoring substrate biasing during plasma processing of a substrateTOKYO ELECTRON LTD·Filed 2000·Granted Apr 9, 2002·95 cites·16 claims
- 0294US6431112B1Apparatus and method for plasma processing of a substrate utilizing an electrostatic chuckTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·86 cites·11 claims
- 0390US6248251B1Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasmaTOKYO ELECTRON LTD·Filed 1999·Granted Jun 19, 2001·69 cites·27 claims
- 0477US7255774B2Process apparatus and method for improving plasma production of an inductively coupled plasmaTOKYO ELECTRON LTD·Filed 2002·Granted Aug 14, 2007·13 cites·12 claims
- 0576US4803173AMethod of fabrication of semiconductor device having a planar configurationNORTH AMERICAN PHILIPS CORP SI·Filed 1987·Granted Feb 7, 1989·55 cites·16 claims
- 0674US6577113B2Apparatus and method for measuring substrate biasing during plasma processing of a substrateTOKYO ELECTRON LTD·Filed 2001·Granted Jun 10, 2003·12 cites·18 claims
- 0772US6596550B2Method for monitoring substrate biasing during plasma processing of a substrateTOKYO ELECTRON LTD·Filed 2002·Granted Jul 22, 2003·9 cites·15 claims
- 0859US6395095B1Process apparatus and method for improved plasma processing of a substrateTOKYO ELECTRON LTD·Filed 1999·Granted May 28, 2002·14 cites·15 claims
- 0948US6214720B1Plasma process enhancement through reduction of gaseous contaminantsTOKYO ELECTRON LTD·Filed 1999·Granted Apr 10, 2001·13 cites·27 claims
- 1040US6284110B1Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge linesTOKYO ELECTRON LTD·Filed 1999·Granted Sep 4, 2001·4 cites·16 claims
- 1140US5963836AMethods for minimizing as-deposited stress in tungsten silicide filmsGENUS INC·Filed 1996·Granted Oct 5, 1999·9 cites·11 claims
- 1229US6130159AApparatus and methods for minimizing as-deposited stress in tungsten silicide filmsGENUS INC·Filed 1999·Granted Oct 10, 2000·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →