Inventor · disambiguated record
Eiji Hirose
Also filed as: HIROSE EIJI
10 granted patents·4 pending applications·247 citations·filing 1999–2012
90Inventor score
Top patents by PatentIndex Score
14 records- 0195US7265963B2Holding mechanism of object to be processedTOKYO ELECTRON LTD·Filed 2005·Granted Sep 4, 2007·52 cites·12 claims
- 0294US6849154B2Plasma etching apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Feb 1, 2005·99 cites·4 claims
- 0383US6878233B2Workpiece holding mechanismTOKYO ELECTRON LTD·Filed 2001·Granted Apr 12, 2005·28 cites·6 claims
- 0480US6485602B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Nov 26, 2002·21 cites·7 claims
- 0577US6746196B1Vacuum treatment deviceTOKYO ELECTRON LTD·Filed 2000·Granted Jun 8, 2004·21 cites·11 claims
- 0659US6305895B1Transfer system for vacuum process equipmentTOKYO ELECTRON LTD·Filed 1999·Granted Oct 23, 2001·22 cites·9 claims
- 0747US7156949B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Jan 2, 2007·1 cites·6 claims
- 0846US7553773B2Pressure control method and processing deviceTOKYO ELECTRON LTD·Filed 2005·Granted Jun 30, 2009·0 cites·14 claims
- 0946US2005115677A1Plasma etching apparatusTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1046US2008030315A1Tire condition monitoring systemYOKOHAMA RUBBER CO LTD·Filed 2007·Application pending·0 cites
- 1145US6908864B2Pressure control method and processing deviceTOKYO ELECTRON LTD·Filed 2000·Granted Jun 21, 2005·1 cites·16 claims
- 1240US2003041972A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 1340US2014232610A1Antenna deviceSHIGEMOTO YOKO·Filed 2012·Application pending·0 cites
- 1434USD459254SMulti-chamber processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 25, 2002·2 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →