Inventor · disambiguated record
Eller Y. Juco
Also filed as: JUCO ELLER · JUCO ELLER Y
16 granted patents·6 pending applications·176 citations·filing 1997–2024
92Inventor score
Files withLAM RES CORP10APPLIED MATERIALS INC8JANAKIRAMAN KARTHIK2BALASUBRAMANIAN GANESH1JUCO ELLER Y1
Top patents by PatentIndex Score
22 records- 0198US10774423B2Tunable ground planes in plasma chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 15, 2020·41 cites·20 claims
- 0296US12136938B2Closed-loop multiple-output radio frequency (RF) matchingLAM RES CORP·Filed 2020·Granted Nov 5, 2024·4 cites·20 claims
- 0395US11984298B2Impedance transformation in radio-frequency-assisted plasma generationLAM RES CORP·Filed 2020·Granted May 14, 2024·5 cites·21 claims
- 0490US12394601B2Impedance transformation in radio-frequency-assisted plasma generationLAM RES CORP·Filed 2024·Granted Aug 19, 2025·1 cites·12 claims
- 0590US5994678AApparatus for ceramic pedestal and metal shaft assemblyAPPLIED MATERIALS INC·Filed 1997·Granted Nov 30, 1999·89 cites·22 claims
- 0689US10991550B2Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station systemLAM RES CORP·Filed 2018·Granted Apr 27, 2021·7 cites·7 claims
- 0780US2025015819A1Closed-loop multiple-output radio frequency (rf) matchingLAM RES CORP·Filed 2024·Application pending·0 cites
- 0875US7628863B2Heated gas box for PECVD applicationsAPPLIED MATERIALS INC·Filed 2004·Granted Dec 8, 2009·20 cites·10 claims
- 0968US10217610B2Arrangements for manipulating plasma confinement within a plasma processing system and methods thereofLAM RES CORP·Filed 2016·Granted Feb 26, 2019·1 cites·11 claims
- 1066US9337072B2Apparatus and method for substrate clamping in a plasma chamberBALASUBRAMANIAN GANESH·Filed 2010·Granted May 10, 2016·2 cites·12 claims
- 1165US11594397B2Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station systemLAM RES CORP·Filed 2021·Granted Feb 28, 2023·0 cites·13 claims
- 1265US2009236214A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2008·Application pending·0 cites
- 1364US2025118538A1Remote plasma sourceAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1460US9275838B2Arrangements for manipulating plasma confinement within a plasma processing system and methods thereofJUCO ELLER Y·Filed 2009·Granted Mar 1, 2016·1 cites·16 claims
- 1558US7094313B2Universal mid-frequency matching networkAPPLIED MATERIALS INC·Filed 2004·Granted Aug 22, 2006·3 cites·21 claims
- 1657US11557460B2Radio frequency (RF) signal source supplying RF plasma generator and remote plasma generatorLAM RES CORP·Filed 2019·Granted Jan 17, 2023·0 cites·22 claims
- 1756US12400833B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Aug 26, 2025·0 cites·16 claims
- 1855US2012205046A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2012·Application pending·0 cites
- 1952US2008084650A1Apparatus and method for substrate clamping in a plasma chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2039USD935424SSemiconductor wafer processing toolLAM RES CORP·Filed 2019·Granted Nov 9, 2021·2 cites·1 claims
- 2136US2005170104A1Stress-tuned, single-layer silicon nitride filmAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2229USD962881SSemiconductor wafer processing apparatusLAM RES CORP·Filed 2019·Granted Sep 6, 2022·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →