Inventor · disambiguated record
Emir Gurer
Also filed as: GURER EMIR
20 granted patents·1 pending application·462 citations·filing 1995–2006
96Inventor score
Top patents by PatentIndex Score
21 records- 0190US6327793B1Method for two dimensional adaptive process control of critical dimensions during spin coating processSILICON VALLEY GROUP·Filed 2000·Granted Dec 11, 2001·28 cites·48 claims
- 0289US6662466B2Method for two dimensional adaptive process control of critical dimensions during spin coating processASML HOLDINGS N V·Filed 2001·Granted Dec 16, 2003·24 cites·48 claims
- 0388US5670210AMethod of uniformly coating a substrateSILICON VALLEY GROUP·Filed 1995·Granted Sep 23, 1997·91 cites·4 claims
- 0486US6027760APhotoresist coating process control with solvent vapor sensorFiled 1997·Granted Feb 22, 2000·64 cites·25 claims
- 0582US6669779B2Yield and line width performance for liquid polymers and other materialsASML HOLDING NV·Filed 2001·Granted Dec 30, 2003·14 cites·14 claims
- 0681US6468586B1Environment exchange control for material on a wafer surfaceSILICON VALLEY GROUP·Filed 2000·Granted Oct 22, 2002·15 cites·12 claims
- 0781US6177133B1Method and apparatus for adaptive process control of critical dimensions during spin coating processSILICON VALLEY GROUP·Filed 1997·Granted Jan 23, 2001·50 cites·5 claims
- 0880US6254936B1Environment exchange control for material on a wafer surfaceSILICON VALLEY GROUP·Filed 1998·Granted Jul 3, 2001·33 cites·22 claims
- 0979US6844027B1Environment exchange control for material on a wafer surfaceASML HOLDING NV·Filed 2000·Granted Jan 18, 2005·13 cites·7 claims
- 1076US6780461B2Environment exchange control for material on a wafer surfaceASML HOLDING NV·Filed 2001·Granted Aug 24, 2004·16 cites·5 claims
- 1175US6238735B1Method of uniformly coating a substrateSILICON VALLEY GROUP·Filed 1999·Granted May 29, 2001·38 cites·30 claims
- 1273US6977098B2Method of uniformly coating a substrateASML HOLDING NV·Filed 2001·Granted Dec 20, 2005·17 cites·5 claims
- 1369US7208262B2Yield and line width performance for liquid polymers and other materialsASML HOLDINGS N V·Filed 2004·Granted Apr 24, 2007·6 cites·5 claims
- 1466US7030039B2Method of uniformly coating a substrateASML HOLDING NV·Filed 2001·Granted Apr 18, 2006·11 cites·32 claims
- 1566US6911091B2Environment exchange control for material on a wafer surfaceASML NETHERLANDS BV·Filed 2002·Granted Jun 28, 2005·6 cites·35 claims
- 1666US6248171B1Yield and line width performance for liquid polymers and other materialsSILICON VALLEY GROUP·Filed 1998·Granted Jun 19, 2001·20 cites·4 claims
- 1757US7625692B2Yield and line width performance for liquid polymers and other materialsASML HOLDING NV·Filed 2006·Granted Dec 1, 2009·0 cites·6 claims
- 1855US7255975B2Yield and line width performance for liquid polymers and other materialsASML HOLDING NV·Filed 2003·Granted Aug 14, 2007·3 cites·20 claims
- 1952US2007089671A1Yield and line width performance for liquid polymers and other materialsGURER EMIR·Filed 2006·Application pending·0 cites
- 2050US6242364B1Plasma deposition of spin chucks to reduce contamination of silicon wafersSILICON VALLEY GROUP·Filed 1999·Granted Jun 5, 2001·11 cites·11 claims
- 2137US6955720B2Plasma deposition of spin chucks to reduce contamination of Silicon wafersASML HOLDING NV·Filed 2001·Granted Oct 18, 2005·2 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →