Inventor · disambiguated record
Enrico Magni
Also filed as: MAGNI ENRICO
11 granted patents·5 pending applications·37 citations·filing 2003–2018
87Inventor score
Top patents by PatentIndex Score
16 records- 0185US9234775B2Methods for verifying gas flow rates from a gas supply system into a plasma processing chamberLAM RES CORP·Filed 2013·Granted Jan 12, 2016·6 cites·25 claims
- 0272US8813764B2Method and apparatus for physical confinement of a liquid meniscus over a semiconductor waferMAGNI ENRICO·Filed 2009·Granted Aug 26, 2014·3 cites·18 claims
- 0371US7442114B2Methods for silicon electrode assembly etch rate and etch uniformity recoveryLAM RES CORP·Filed 2004·Granted Oct 28, 2008·14 cites·19 claims
- 0467US8789493B2Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etchREN DAXING·Filed 2006·Granted Jul 29, 2014·6 cites·23 claims
- 0563US8997684B2Prevention of particle adders when contacting a liquid meniscus over a substrateMAGNI ENRICO·Filed 2011·Granted Apr 7, 2015·2 cites·14 claims
- 0656US9945736B2Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emissionLAM RES CORP·Filed 2014·Granted Apr 17, 2018·0 cites·15 claims
- 0756US9694453B2Method and apparatus for physical confinement of a liquid meniscus over a semiconductor waferLAM RES CORP·Filed 2013·Granted Jul 4, 2017·0 cites·20 claims
- 0852US7341673B2Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emissionLAM RES CORP·Filed 2003·Granted Mar 11, 2008·3 cites·56 claims
- 0951US8580045B2Method and apparatus for physical confinement of a liquid meniscus over a semiconductor waferMAGNI ENRICO·Filed 2011·Granted Nov 12, 2013·0 cites·9 claims
- 1051US2009025876A1Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emissionMAGNI ENRICO·Filed 2008·Application pending·0 cites
- 1146US7291286B2Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatusesLAM RES CORP·Filed 2004·Granted Nov 6, 2007·2 cites·22 claims
- 1246US2010294742A1Modifications to Surface Topography of Proximity HeadMAGNI ENRICO·Filed 2009·Application pending·0 cites
- 1345US2013042891A1Method for Removing Bubbles from a Fluid Flowing Down Through a PlenumMAGNI ENRICO·Filed 2012·Application pending·0 cites
- 1442US7226869B2Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processingLAM RES CORP·Filed 2004·Granted Jun 5, 2007·1 cites·38 claims
- 1541US2007021935A1Methods for verifying gas flow rates from a gas supply system into a plasma processing chamberLARSON DEAN J·Filed 2005·Application pending·0 cites
- 1640US2018200297A1Composition comprising carnitine, sodium cholate, sodium acetate and optionally silver for use in the treatment of psoriasis, vitiligo and rosaceaGK PHARMA CONSULTANTS SA·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →