Inventor · disambiguated record
Eric A. Hudson
Also filed as: HUDSON ERIC · HUDSON ERIC A · HUDSON ERIC ALLEN
154 granted patents·39 pending applications·3,133 citations·filing 1998–2025
99Inventor score
Top patents by PatentIndex Score
193 records- 0199US9997373B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2016·Granted Jun 12, 2018·434 cites·25 claims
- 0299US9396961B2Integrated etch/clean for dielectric etch applicationsLAM RES CORP·Filed 2015·Granted Jul 19, 2016·105 cites·26 claims
- 0399US8790067B2Blade clearance control using high-CTE and low-CTE ring membersMCCAFFREY MICHAEL G·Filed 2011·Granted Jul 29, 2014·116 cites·26 claims
- 0498US11313242B2Thin seal for an engineRAYTHEON TECH CORP·Filed 2019·Granted Apr 26, 2022·17 cites·17 claims
- 0598US10465545B2Thin seal for an engineUNITED TECHNOLOGIES CORP·Filed 2018·Granted Nov 5, 2019·17 cites·5 claims
- 0698US10012099B2Thin seal for an engineUNITED TECHNOLOGIES CORP·Filed 2016·Granted Jul 3, 2018·19 cites·9 claims
- 0798US9887097B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2016·Granted Feb 6, 2018·20 cites·21 claims
- 0898US9384998B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2015·Granted Jul 5, 2016·32 cites·17 claims
- 0998US9039911B2Plasma-enhanced etching in an augmented plasma processing systemLAM RES CORP·Filed 2012·Granted May 26, 2015·57 cites·23 claims
- 1098US8652298B2Triode reactor design with multiple radiofrequency powersDHINDSA RAJINDER·Filed 2011·Granted Feb 18, 2014·160 cites·20 claims
- 1198US8540844B2Plasma confinement structures in plasma processing systemsHUDSON ERIC·Filed 2009·Granted Sep 24, 2013·167 cites·19 claims
- 1297US11594400B2Multi zone gas injection upper electrode systemLAM RES CORP·Filed 2020·Granted Feb 28, 2023·6 cites·11 claims
- 1397US10504744B1Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2018·Granted Dec 10, 2019·25 cites·12 claims
- 1497US10300526B2Core assembly including studded spacerUNITED TECHNOLOGIES CORP·Filed 2015·Granted May 28, 2019·8 cites·18 claims
- 1597US9620377B2Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2015·Granted Apr 11, 2017·25 cites·21 claims
- 1697US9543158B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2015·Granted Jan 10, 2017·28 cites·28 claims
- 1797US9385021B2Electronic knob for tuning radial etch non-uniformity at VHF frequenciesLAM RES CORP·Filed 2014·Granted Jul 5, 2016·28 cites·18 claims
- 1897US9378971B1Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2014·Granted Jun 28, 2016·43 cites·22 claims
- 1997US8007229B2Variable area turbine vane arrangementUNITED TECHNOLOGIES CORP·Filed 2010·Granted Aug 30, 2011·38 cites·12 claims
- 2097US6972524B1Plasma processing system controlLAM RES CORP·Filed 2004·Granted Dec 6, 2005·87 cites·41 claims
- 2197US6255221B1Methods for running a high density plasma etcher to achieve reduced transistor device damageLAM RES CORP·Filed 1998·Granted Jul 3, 2001·369 cites·29 claims
- 2296US10344612B2Compact advanced passive tip clearance controlUNITED TECHNOLOGIES CORP·Filed 2017·Granted Jul 9, 2019·12 cites·20 claims
- 2396US10316686B2High response turbine tip clearance control systemUNITED TECHNOLOGIES CORP·Filed 2016·Granted Jun 11, 2019·12 cites·18 claims
- 2496US10170323B2Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2017·Granted Jan 1, 2019·11 cites·17 claims
- 2596US10094232B2Self crystalline orientation for increased complianceUNITED TECHNOLOGIES CORP·Filed 2015·Granted Oct 9, 2018·12 cites·21 claims
- 2696US9997372B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2016·Granted Jun 12, 2018·18 cites·11 claims
- 2796US9543148B1Mask shrink layer for high aspect ratio dielectric etchLAM RES CORP·Filed 2015·Granted Jan 10, 2017·56 cites·19 claims
- 2895US10361092B1Etching features using metal passivationLAM RES CORP·Filed 2018·Granted Jul 23, 2019·22 cites·19 claims
- 2995US10170324B2Technique to tune sidewall passivation deposition conformality for high aspect ratio cylinder etchLAM RES CORP·Filed 2017·Granted Jan 1, 2019·13 cites·23 claims
- 3095US9793126B2Ion to neutral control for wafer processing with dual plasma source reactorLAM RES CORP·Filed 2013·Granted Oct 17, 2017·18 cites·20 claims
- 3195US9673058B1Method for etching features in dielectric layersLAM RES CORP·Filed 2016·Granted Jun 6, 2017·24 cites·17 claims
- 3295US8105019B23D contoured vane endwall for variable area turbine vane arrangementMCCAFFREY MICHAEL G·Filed 2007·Granted Jan 31, 2012·44 cites·20 claims
- 3395US7753104B2Investment casting cores and methodsUNITED TECHNOLOGIES CORP·Filed 2006·Granted Jul 13, 2010·32 cites·20 claims
- 3495US7749353B2High aspect ratio etch using modulation of RF powers of various frequenciesLAM RES CORP·Filed 2006·Granted Jul 6, 2010·30 cites·16 claims
- 3595US7241683B2Stabilized photoresist structure for etching processLAM RES CORP·Filed 2005·Granted Jul 10, 2007·36 cites·17 claims
- 3695US6916746B1Method for plasma etching using periodic modulation of gas chemistryLAM RES CORP·Filed 2003·Granted Jul 12, 2005·77 cites·16 claims
- 3794US12217972B2Multi-state pulsing for achieving a balance between bow control and mask selectivityLAM RES CORP·Filed 2020·Granted Feb 4, 2025·3 cites·26 claims
- 3894US10325759B2Multiple control modesLAM RES CORP·Filed 2016·Granted Jun 18, 2019·11 cites·15 claims
- 3994US10304693B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2017·Granted May 28, 2019·7 cites·22 claims
- 4094US9735020B2System, method and apparatus for plasma etch having independent control of ion generation and dissociation of process gasLAM RES CORP·Filed 2015·Granted Aug 15, 2017·9 cites·19 claims
- 4194US7255536B2Turbine airfoil platform cooling circuitUNITED TECHNOLOGIES CORP·Filed 2005·Granted Aug 14, 2007·64 cites·16 claims
- 4293US7994794B2Methods for measuring a set of electrical characteristics in a plasmaLAM RES CORP·Filed 2010·Granted Aug 9, 2011·15 cites·34 claims
- 4393US7104756B2Temperature tolerant vane assemblyUNITED TECHNOLOGIES CORP·Filed 2004·Granted Sep 12, 2006·82 cites·15 claims
- 4492US10431458B2Mask shrink layer for high aspect ratio dielectric etchLAM RES CORP·Filed 2016·Granted Oct 1, 2019·11 cites·17 claims
- 4592US7578301B2Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing systemLAM RES CORP·Filed 2005·Granted Aug 25, 2009·14 cites·4 claims
- 4692US7479207B2Adjustable height PIF probeLAM RES CORP·Filed 2006·Granted Jan 20, 2009·17 cites·20 claims
- 4791US11670486B2Pulsed plasma chamber in dual chamber configurationLAM RES CORP·Filed 2020·Granted Jun 6, 2023·2 cites·11 claims
- 4891US10297459B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2016·Granted May 21, 2019·7 cites·11 claims
- 4991US9803559B2Variable vane and seal arrangementUNITED TECHNOLOGIES CORP·Filed 2015·Granted Oct 31, 2017·6 cites·18 claims
- 5091US7892445B1Wafer electrical discharge control using argon free dechucking gasLAM RES CORP·Filed 2007·Granted Feb 22, 2011·23 cites·20 claims
Showing the top 50 of 193 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →