Inventor · disambiguated record
Erwin Slot
Also filed as: SLOT ERWIN
15 granted patents·10 pending applications·44 citations·filing 2006–2025
89Inventor score
Files withASML NETHERLANDS BV16MAPPER LITHOGRAPHY IP BV5KUIPER VINCENT SYLVESTER2DE BOER GUIDO1SLOT ERWIN1
Top patents by PatentIndex Score
25 records- 0194US7868300B2Lithography system, sensor and measuring methodMAPPER LITHOGRAPHY IP BV·Filed 2006·Granted Jan 11, 2011·30 cites·37 claims
- 0288US9575418B2Apparatus for transferring a substrate in a lithography systemMAPPER LITHOGRAPHY IP BV·Filed 2015·Granted Feb 21, 2017·4 cites·22 claims
- 0382US2025349504A1Charged particle device, detector, and methodsASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0479US9934943B2Beam grid layoutMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Apr 3, 2018·3 cites·33 claims
- 0578USRE48046ELithography system, sensor and measuring methodASML NETHERLANDS BV·Filed 2014·Granted Jun 9, 2020·2 cites·57 claims
- 0672US12394589B2Charged particle device, detector, and methodsASML NETHERLANDS BV·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 0772USRE49602ELithography system, sensor and measuring methodASML NETHERLANDS BV·Filed 2020·Granted Aug 8, 2023·0 cites·57 claims
- 0871US9665014B2Charged particle lithography system with alignment sensor and beam measurement sensorMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted May 30, 2017·2 cites·18 claims
- 0966US2024288389A1Charged particle assessment system and methodASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1066US2025253123A1Charged particle-optical apparatusASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1165US9176397B2Apparatus for transferring a substrate in a lithography systemKUIPER VINCENT SYLVESTER·Filed 2012·Granted Nov 3, 2015·1 cites·21 claims
- 1265USRE45206ELithography system, sensor and measuring methodMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Oct 28, 2014·1 cites·37 claims
- 1364US9244726B2Network architecture for lithography machine clusterSLOT ERWIN·Filed 2012·Granted Jan 26, 2016·1 cites·21 claims
- 1464US2025132122A1Assessment apparatus and methodsASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1563USRE48903EApparatus for transferring a substrate in a lithography systemASML NETHERLANDS BV·Filed 2019·Granted Jan 25, 2022·0 cites·22 claims
- 1661US2024234081A9Charged particle-optical device, charged particle apparatus and methodASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1761US2024128045A1Charged particle assessment system and method of aligning a sample in a charged particle assessment systemASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1858USRE49952EBeam grid layoutASML NETHERLANDS BV·Filed 2014·Granted Apr 30, 2024·0 cites·34 claims
- 1957US2023207259A1Alignment determination method and computer programASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2056US2025329511A1Electron-optical apparatus and method of obtaining topographical information about a sample surfaceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2154USRE49732ECharged particle lithography system with alignment sensor and beam measurement sensorASML NETHERLANDS BV·Filed 2013·Granted Nov 21, 2023·0 cites·30 claims
- 2254US2023324318A1Charged particle tool, calibration method, inspection methodASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2352US2024145208A1Charged particle apparatus and methodASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2451US8936994B2Method of processing a substrate in a lithography systemKUIPER VINCENT SYLVESTER·Filed 2012·Granted Jan 20, 2015·0 cites·16 claims
- 2548US8895943B2Lithography system and method of processing substrates in such a lithography systemDE BOER GUIDO·Filed 2011·Granted Nov 25, 2014·0 cites·28 claims
Join the waitlist — get patent alerts
Get an alert when Erwin Slot files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →