Inventor · disambiguated record
Evgeni Gurevich
Also filed as: GUREVICH EVGENI
8 granted patents·3 pending applications·30 citations·filing 2016–2024
82Inventor score
Top patents by PatentIndex Score
11 records- 0198US11164307B1Misregistration metrology by using fringe Moiré and optical Moiré effectsKLA CORP·Filed 2020·Granted Nov 2, 2021·18 cites·35 claims
- 0295US12105433B2Imaging overlay targets using moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2022·Granted Oct 1, 2024·2 cites·6 claims
- 0384US10901325B2Determining the impacts of stochastic behavior on overlay metrology dataKLA TENCOR CORP·Filed 2018·Granted Jan 26, 2021·4 cites·28 claims
- 0484US2025021019A1Imaging overlay targets using moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2024·Application pending·0 cites
- 0581US10831108B2Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrologyKLA CORP·Filed 2016·Granted Nov 10, 2020·5 cites·77 claims
- 0680US12013634B2Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2022·Granted Jun 18, 2024·0 cites·11 claims
- 0780US11256177B2Imaging overlay targets using Moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2020·Granted Feb 22, 2022·1 cites·44 claims
- 0874US11537043B2Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2021·Granted Dec 27, 2022·0 cites·10 claims
- 0957US11862522B2Accuracy improvements in optical metrologyKLA TENCOR CORP·Filed 2021·Granted Jan 2, 2024·0 cites·9 claims
- 1056US2019250504A1Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2018·Application pending·0 cites
- 1143US2018047646A1Accuracy improvements in optical metrologyKLA TENCOR CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →