Inventor · disambiguated record
Frantisek Balon
Also filed as: BALON FRANTISEK
6 granted patents·4 pending applications·19 citations·filing 2008–2022
72Inventor score
Top patents by PatentIndex Score
10 records- 0193US8574409B2Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering sourceKADLEC STANISLAV·Filed 2012·Granted Nov 5, 2013·18 cites·6 claims
- 0265US8246794B2Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering sourceKADLEC STANISLAV·Filed 2008·Granted Aug 21, 2012·1 cites·12 claims
- 0348US2024279812A1Vacuum processing system and process controlVAT HOLDING AG·Filed 2022·Application pending·0 cites
- 0445US12154802B2Method for monitoring, determining the position of, and positioning a pin-lifting systemVAT HOLDING AG·Filed 2020·Granted Nov 26, 2024·0 cites·15 claims
- 0545US2024229967A9Vacuum valve with a wireless assemblyVAT HOLDING AG·Filed 2022·Application pending·0 cites
- 0642US12060951B2Adjustment device for a vacuum area with pressure measuring functionalityVAT HOLDING AG·Filed 2020·Granted Aug 13, 2024·0 cites·14 claims
- 0736US11145495B2Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrateEVATEC AG·Filed 2017·Granted Oct 12, 2021·0 cites·20 claims
- 0835US2021319984A1Method and aparatus for low particle plasma etchingEVATEC AG·Filed 2019·Application pending·0 cites
- 0929US2017250099A1Film stress uniformity control by rf coupling and wafer mount with adapted rf couplingEVATEC AG·Filed 2015·Application pending·0 cites
- 1028US11387079B2Plasma etch chamber and method of plasma etchingEVATEC AG·Filed 2017·Granted Jul 12, 2022·0 cites·34 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →