Inventor · disambiguated record
Frank Everts
Also filed as: EVERTS FRANK
9 granted patents·14 citations·filing 2014–2021
82Inventor score
Top patents by PatentIndex Score
9 records- 0189US10451890B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2017·Granted Oct 22, 2019·3 cites·42 claims
- 0287US11054665B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2019·Granted Jul 6, 2021·3 cites·21 claims
- 0381US9762023B2Online calibration for repetition rate dependent performance variablesCymer LLC·Filed 2015·Granted Sep 12, 2017·3 cites·31 claims
- 0476US10627724B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Apr 21, 2020·2 cites·20 claims
- 0576US9645510B2Method of controlling a radiation source and lithographic apparatus comprising the radiation sourceASML NETHERLANDS BV·Filed 2014·Granted May 9, 2017·3 cites·20 claims
- 0675US11686951B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2021·Granted Jun 27, 2023·0 cites·20 claims
- 0768US11050213B2Online calibration for repetition rate dependent performance variablesCymer LLC·Filed 2020·Granted Jun 29, 2021·0 cites·20 claims
- 0856US10727642B2Online calibration for repetition rate dependent performance variablesCymer LLC·Filed 2017·Granted Jul 28, 2020·0 cites·31 claims
- 0948US11287743B2Control system and methodASML NETHERLANDS BV·Filed 2019·Granted Mar 29, 2022·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →