Inventor · disambiguated record
Gentaro Goshi
Also filed as: GOSHI GENTARO
25 granted patents·15 pending applications·64 citations·filing 2003–2025
94Inventor score
Top patents by PatentIndex Score
40 records- 0195US11446588B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Sep 20, 2022·4 cites·17 claims
- 0288US10576493B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Mar 3, 2020·6 cites·9 claims
- 0387US12374565B2Substrate drying method and substrate drying apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 29, 2025·1 cites·13 claims
- 0486US10504718B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Dec 10, 2019·5 cites·10 claims
- 0585US10395950B2Substrate processing apparatus, substrate processing method, and recording mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 27, 2019·5 cites·10 claims
- 0684US9662685B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted May 30, 2017·5 cites·5 claims
- 0783US10046370B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 14, 2018·3 cites·3 claims
- 0882US10566182B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Feb 18, 2020·3 cites·14 claims
- 0981US10998186B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Granted May 4, 2021·2 cites·14 claims
- 1080US10950465B2Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 16, 2021·3 cites·7 claims
- 1176US10692739B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 23, 2020·2 cites·8 claims
- 1275US10619922B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·2 cites·13 claims
- 1374US2025285881A1Substrate drying method and substrate drying apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1467US2025326014A1Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1563US12142474B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2023·Granted Nov 12, 2024·0 cites·13 claims
- 1663US9865483B2Substrate liquid processing method, substrate liquid processing apparatus, and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 9, 2018·1 cites·12 claims
- 1762US2025149353A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1860US11862486B2Substrate liquid processing apparatus, substrate liquid processing method and recording mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jan 2, 2024·0 cites·5 claims
- 1960US7186093B2Method and apparatus for cooling motor bearings of a high pressure pumpTOKYO ELECTRON LTD·Filed 2004·Granted Mar 6, 2007·11 cites·20 claims
- 2059US2024194502A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2154US7491036B2Method and system for cooling a pumpTOKYO ELECTRON LTD·Filed 2004·Granted Feb 17, 2009·9 cites·14 claims
- 2253US2025087501A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2352US2022359233A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2449US11201050B2Substrate processing method, recording medium and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 14, 2021·0 cites·14 claims
- 2549US10770316B2Substrate liquid processing apparatus, substrate liquid processing method and recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Sep 8, 2020·0 cites·4 claims
- 2647US11594427B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 28, 2023·0 cites·6 claims
- 2747US11557492B2Substrate processing apparatus and control method thereofTOKYO ELECTRON LTD·Filed 2020·Granted Jan 17, 2023·0 cites·10 claims
- 2847US7211145B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2003·Granted May 1, 2007·2 cites·12 claims
- 2946US11344931B2Method of removing particles of substrate processing apparatus, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted May 31, 2022·0 cites·20 claims
- 3045US10062586B2Chemical fluid processing apparatus and chemical fluid processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 28, 2018·0 cites·13 claims
- 3144US11133176B2Substrate processing method, recording medium and substrate processing systemTOKYO ELECTRON LTD·Filed 2018·Granted Sep 28, 2021·0 cites·6 claims
- 3239US2006225769A1Isothermal control of a process chamberGOSHI GENTARO·Filed 2005·Application pending·0 cites
- 3338US2020020550A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 3438US2018254180A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 3537US2018096863A1Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3637US2018138058A1Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3737US2006102590A1Method for treating a substrate with a high pressure fluid using a preoxide-based process chemistryTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3836US2017092484A1Method and apparatus for drying semiconductor substrates using liquid carbon dioxideTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3936US2006065189A1Method and system for homogenization of supercritical fluid in a high pressure processing systemBABIC DARKO·Filed 2004·Application pending·0 cites
- 4036US2017011907A1Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Gentaro Goshi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →