Inventor · disambiguated record
Gerhard Stengl
Also filed as: STENGL GERHARD
37 granted patents·2 pending applications·2,465 citations·filing 1980–2007
98Inventor score
Files withIMS IONEN MIKROFAB SYST18IMS NANOFABRICATION GMBH6ZEISS CARL SMS GMBH3IMS NANOFABRICATION AG2OESTERR INVESTITIONSKREDIT2
Top patents by PatentIndex Score
39 records- 0198US7388217B2Particle-optical projection systemIMS NANOFABRICATION GMBH·Filed 2007·Granted Jun 17, 2008·1.5k cites·9 claims
- 0297US6768125B2Maskless particle-beam system for exposing a pattern on a substrateIMS NANOFABRICATION GMBH·Filed 2003·Granted Jul 27, 2004·186 cites·21 claims
- 0397US4985634AIon beam lithographyOESTERR INVESTITIONSKREDIT·Filed 1988·Granted Jan 15, 1991·126 cites·51 claims
- 0494US7772574B2Pattern lock system for particle-beam exposure apparatusIMS NANOFABRICATION AG·Filed 2005·Granted Aug 10, 2010·32 cites·8 claims
- 0594US7214951B2Charged-particle multi-beam exposure apparatusIMS NANOFABRICATION GMBH·Filed 2004·Granted May 8, 2007·53 cites·23 claims
- 0694US4967088AMethod and apparatus for image alignment in ion lithographyOESTERR INVESTITIONSKREDIT·Filed 1988·Granted Oct 30, 1990·99 cites·49 claims
- 0793US6858118B2Apparatus for enhancing the lifetime of stencil masksIMS IONEN MIKROFAB SYST·Filed 2003·Granted Feb 22, 2005·52 cites·12 claims
- 0887US7737422B2Charged-particle exposure apparatusIMS NANOFABRICATION AG·Filed 2006·Granted Jun 15, 2010·11 cites·15 claims
- 0987US7033647B2Method of synthesising carbon nano tubesIMS IONEN MIKROFABRIKATIONAS S·Filed 2002·Granted Apr 25, 2006·37 cites·28 claims
- 1086US8368030B2Charged particle beam exposure system and beam manipulating arrangementZEISS CARL SMS GMBH·Filed 2006·Granted Feb 5, 2013·9 cites·18 claims
- 1186US7199373B2Particle-optic electrostatic lensIMS NANOFABRICATION GMBH·Filed 2004·Granted Apr 3, 2007·27 cites·10 claims
- 1280US4894549AApparatus for demagnification or full-size ion projection lithographyIMS IONEN MIKROFAB SYST·Filed 1988·Granted Jan 16, 1990·25 cites·18 claims
- 1379US8368015B2Particle-optical systemZEISS CARL SMS GMBH·Filed 2006·Granted Feb 5, 2013·10 cites·24 claims
- 1479US6989546B2Particle multibeam lithographyIMS INNENMIKROFABRIKATIONS SYS·Filed 1999·Granted Jan 24, 2006·40 cites·29 claims
- 1578US4780382AProcess for making a transmission maskIMS IONEN MIKROFAB SYST·Filed 1986·Granted Oct 25, 1988·28 cites·11 claims
- 1676US6909103B2Ion irradiation of a target at very high and very low kinetic ion energiesIMS IONEN MIKROFAB SYST·Filed 2004·Granted Jun 21, 2005·12 cites·11 claims
- 1771US7436120B2Compensation of magnetic fieldsIMS NANOFABRICATION GMBH·Filed 2005·Granted Oct 14, 2008·8 cites·22 claims
- 1870US4859857AIon-projection apparatus and method of operating sameIMS IONEN MIKROFAB SYST·Filed 1987·Granted Aug 22, 1989·16 cites·23 claims
- 1969US5350924AIon-optical imaging systemIMS IONEN MIKROFAB SYST·Filed 1992·Granted Sep 27, 1994·21 cites·12 claims
- 2069US4823011AIon-projection lithographic apparatus with means for aligning the mask image with the substrateIMS IONEN MIKROFAB SYST·Filed 1987·Granted Apr 18, 1989·16 cites·19 claims
- 2164US6661015B2Pattern lock systemIMS IONEN MIKROFAB SYST·Filed 2001·Granted Dec 9, 2003·6 cites·11 claims
- 2263US6326632B1Particle-optical imaging system for lithography purposesIMS IONEN MIKROFAB SYST·Filed 1999·Granted Dec 4, 2001·23 cites·7 claims
- 2363US5742062AArrangement for masked beam lithography by means of electrically charged particlesIMS MIKROFABRIKATIONS SYSTEME·Filed 1996·Granted Apr 21, 1998·20 cites·40 claims
- 2461US8049189B2Charged particle systemZEISS CARL SMS GMBH·Filed 2006·Granted Nov 1, 2011·1 cites·19 claims
- 2560US6194730B1Electrostatic lensIMS IONEN MIKROFAB SYST·Filed 1998·Granted Feb 27, 2001·14 cites·10 claims
- 2660US5801388AParticle beam, in particular ionic optic imaging systemIMS IONEN MIKROPFABRIKATIONS S·Filed 1995·Granted Sep 1, 1998·17 cites·11 claims
- 2760US5378917AParticle-beam imaging systemIMS IONEN MIKROFABRATIONS SYST·Filed 1993·Granted Jan 3, 1995·17 cites·15 claims
- 2858US4370556ASelf-supporting mask, method for production as well as use of sameRUDOLF SACHER GES M B H·Filed 1980·Granted Jan 25, 1983·16 cites·17 claims
- 2956US4835392AIon-projection apparatusIMS IONEN MIKROFAB SYST·Filed 1987·Granted May 30, 1989·9 cites·14 claims
- 3054US5317161AIon sourceIMS IONEN MIKROFAB SYST·Filed 1992·Granted May 31, 1994·13 cites·16 claims
- 3153US5436460AIon-optical imaging systemIMS IONEN MIKROFAB SYST·Filed 1993·Granted Jul 25, 1995·11 cites·10 claims
- 3252US4924104AIon beam apparatus and method of modifying substrateIMS IONEN MIKROFAB SYST·Filed 1988·Granted May 8, 1990·10 cites·11 claims
- 3352US4775797AMethod of stabilizing a maskIMS IONEN MIKROFAB SYST·Filed 1986·Granted Oct 4, 1988·10 cites·14 claims
- 3451US2005201246A1Particle-optical projection systemIMS NANOFABRICATION GMBH·Filed 2005·Application pending·0 cites
- 3550US5874739AArrangement for shadow-casting lithographyIMS IONEN MIKROFAB SYST·Filed 1997·Granted Feb 23, 1999·9 cites·12 claims
- 3646US5869838AField composable electrostatic lens systemADVANCED LITHOGRAPHY GROUP·Filed 1996·Granted Feb 9, 1999·9 cites·19 claims
- 3741US5693950AProjection system for charged particlesIMS IONEN MIKROFAB SYST·Filed 1995·Granted Dec 2, 1997·5 cites·12 claims
- 3838US2003122085A1Field ionization ion sourceFiled 2001·Application pending·0 cites
- 3934US4891547AParticle or radiation beam mask and process for making sameIMS IONEN MIKROFAB SYST·Filed 1988·Granted Jan 2, 1990·3 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →