Inventor · disambiguated record
Gen You
Also filed as: YOU GEN · YOU GEN DA
17 granted patents·5 pending applications·489 citations·filing 2001–2022
91Inventor score
Top patents by PatentIndex Score
22 records- 0196US8084372B2Substrate processing method and computer storage mediumYOU GEN·Filed 2008·Granted Dec 27, 2011·464 cites·10 claims
- 0284US9662685B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted May 30, 2017·5 cites·5 claims
- 0383US10046370B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 14, 2018·3 cites·3 claims
- 0481US8372212B2Supercritical drying method and apparatus for semiconductor substratesTOSHIBA KK·Filed 2012·Granted Feb 12, 2013·5 cites·5 claims
- 0579US8771429B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusJI LINAN·Filed 2012·Granted Jul 8, 2014·5 cites·8 claims
- 0677US10418242B2Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymersTOKYO ELECTRON LTD·Filed 2015·Granted Sep 17, 2019·2 cites·3 claims
- 0773US9583330B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 28, 2017·2 cites·4 claims
- 0864US10207349B2High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure containerTOKYO ELECTRON LTD·Filed 2013·Granted Feb 19, 2019·1 cites·14 claims
- 0963US10096462B2Substrate processing method and storage mediumTOSHIBA KK·Filed 2013·Granted Oct 9, 2018·1 cites·7 claims
- 1062US10199240B2Substrate processing method, substrate processing apparatus, and storage mediumHAYASHI HIDEKAZU·Filed 2012·Granted Feb 5, 2019·1 cites·7 claims
- 1160US12272541B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Apr 8, 2025·0 cites·20 claims
- 1258US11574812B2Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymersTOKYO ELECTRON LTD·Filed 2019·Granted Feb 7, 2023·0 cites·3 claims
- 1355US2010040980A1Method and apparatus for reforming film and controlling slimming amount thereofTOKYO ELECTON LTD·Filed 2009·Application pending·0 cites
- 1454US12283489B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 1552US11764070B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Sep 19, 2023·0 cites·19 claims
- 1648US2005214683A1Method and apparatus for reforming film and controlling slimming amount thereofTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1744US2022068657A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1836US9741583B2Substrate treatment method, computer readable storage medium and substrate treatment systemTOKYO ELECTRON LTD·Filed 2015·Granted Aug 22, 2017·0 cites·9 claims
- 1935US10329144B2Substrate treatment method, computer storage medium and substrate treatment systemTOKYO ELECTRON LTD·Filed 2016·Granted Jun 25, 2019·0 cites·12 claims
- 2035US2002155721A1Method of forming shallow trench isolation structureMACRONIX INT CO LTD·Filed 2001·Application pending·0 cites
- 2134US2002162571A1Planar clean method applicable to shallow trench isolationFiled 2001·Application pending·0 cites
- 2232US9911621B2Method for processing target objectTOKYO ELECTRON LTD·Filed 2015·Granted Mar 6, 2018·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →