Inventor · disambiguated record
Glenn A. Roberson, Jr.
Also filed as: ROBERSON JR GLENN A
20 granted patents·1,157 citations·filing 1989–2004
97Inventor score
Files withSEMIFAB INC9LUCID TREATMENT SYSTEMS INC4APPLIED CHEMICAL SOLUTIONS2TOKYO ELECTRON LTD2AXIOM INTERNAT GROUP LLC1
Top patents by PatentIndex Score
20 records- 0195US6368411B2Molecular contamination control systemSEMIFAB INC·Filed 2001·Granted Apr 9, 2002·104 cites·3 claims
- 0294US5879458AMolecular contamination control systemSEMIFAB INC·Filed 1996·Granted Mar 9, 1999·168 cites·26 claims
- 0393US6537916B2Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide processTOKYO ELECTRON LTD·Filed 2001·Granted Mar 25, 2003·63 cites·3 claims
- 0493US6277753B1Removal of CMP residue from semiconductors using supercritical carbon dioxide processSUPERCRITICAL SYSTEMS INC·Filed 1999·Granted Aug 21, 2001·153 cites·17 claims
- 0590US6042651AMolecular contamination control systemSEMIFAB INC·Filed 1999·Granted Mar 28, 2000·82 cites·6 claims
- 0688US6221163B1Molecular contamination control systemSEMIFAB INC·Filed 1999·Granted Apr 24, 2001·70 cites·4 claims
- 0786US4977688AVapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcoholSEMIFAB INC·Filed 1989·Granted Dec 18, 1990·62 cites·30 claims
- 0882US5115576AVapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcoholSEMIFAB INC·Filed 1990·Granted May 26, 1992·81 cites·15 claims
- 0978US5315766AVapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcoholSEMIFAB INC·Filed 1992·Granted May 31, 1994·55 cites·20 claims
- 1077US5928492AMethod and apparatus for recovery of water and slurry abrasives used for chemical and mechanical planarizationLUCID TREATMENT SYSTEMS INC·Filed 1997·Granted Jul 27, 1999·39 cites·62 claims
- 1177US5490611AProcess for precise volumetrio diluting/mixing of chemicalsAPPLIED CHEMICAL SOLUTIONS·Filed 1994·Granted Feb 13, 1996·60 cites·13 claims
- 1274US7064070B2Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide processTOKYO ELECTRON LTD·Filed 2003·Granted Jun 20, 2006·17 cites·20 claims
- 1374US6096185AMethod and apparatus for recovery of water and slurry abrasives used for chemical and mechanical planarizationLUCID TREATMENT SYSTEMS INC·Filed 1999·Granted Aug 1, 2000·36 cites·17 claims
- 1472US7044520B2Vibrating scoop basketAXIOM INTERNAT GROUP LLC·Filed 2004·Granted May 16, 2006·28 cites·36 claims
- 1572US5370269AProcess and apparatus for precise volumetric diluting/mixing of chemicalsAPPLIED CHEMICAL SOLUTIONS·Filed 1993·Granted Dec 6, 1994·49 cites·24 claims
- 1667US5674123ADocking and environmental purging system for integrated circuit wafer transport assembliesSEMIFAB·Filed 1995·Granted Oct 7, 1997·33 cites·9 claims
- 1764US5848933ADocking and environmental purging system for integrated circuit wafer transport assembliesSEMIFAB INC·Filed 1997·Granted Dec 15, 1998·24 cites·6 claims
- 1852US6120371ADocking and environmental purging system for integrated circuit wafer transport assembliesSEMIFAB INC·Filed 1998·Granted Sep 19, 2000·14 cites·6 claims
- 1950US6059712AApparatus for continuous separation of fine solid particles from a liquid by centrifugal forceLUCID TREATMENT SYSTEMS INC·Filed 1999·Granted May 9, 2000·13 cites·28 claims
- 2036US5919124AApparatus for continuous separation of fine solid particles from a liquid by centrifugal forceLUCID TREATMENT SYSTEMS INC·Filed 1997·Granted Jul 6, 1999·6 cites·35 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →